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Extract from the Register of European Patents

EP About this file: EP0597603

EP0597603 - Trench isolation planarization using a hard mask [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  08.10.1999
Database last updated on 03.10.2024
Most recent event   Tooltip08.10.1999Application deemed to be withdrawnpublished on 24.11.1999 [1999/47]
Applicant(s)For all designated states
DIGITAL EQUIPMENT CORPORATION
146 Main Street Maynard
Massachusetts 01745 / US
[N/P]
Former [1994/20]For all designated states
DIGITAL EQUIPMENT CORPORATION
146 Main Street
Maynard, Massachusetts 01745 / US
Inventor(s)01 / Grula, Gregory Joseph
170 Brookfield Road
Charlton, Massachusetts 01507 / US
02 / Wang, Ching-Tai Sherman
94 Bjorklund Avenue
Worcester, Massachusetts 01605 / US
[1994/20]
Representative(s)Goodman, Christopher, et al
Eric Potter Clarkson, Park View House, 58 The Ropewalk
Nottingham NG1 5DD / GB
[1998/22]
Former [1994/20]Goodman, Christopher, et al
Eric Potter & Clarkson 1 St. Mary's Court St Mary's Gate
Nottingham NG1 1LE / GB
Application number, filing date93308495.625.10.1993
[1994/20]
Priority number, dateUS1992097587113.11.1992         Original published format: US 975871
[1994/20]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0597603
Date:18.05.1994
Language:EN
[1994/20]
Type: A3 Search report 
No.:EP0597603
Date:11.03.1998
[1998/11]
Search report(s)(Supplementary) European search report - dispatched on:EP27.01.1998
ClassificationIPC:H01L21/76, H01L21/321, H01L21/3105
[1998/07]
CPC:
H01L21/76229 (EP); H01L21/31055 (EP)
Former IPC [1994/20]H01L21/76, H01L21/321
Designated contracting statesDE,   FR,   GB,   IT [1994/20]
TitleGerman:Planarization eines Isolationsgrabens mittels einer harten Maske[1994/20]
English:Trench isolation planarization using a hard mask[1994/20]
French:Planarisation d'une ramure d'isolation utilisant un masque dur[1994/20]
Examination procedure28.03.1998Examination requested  [1998/22]
13.11.1998Despatch of a communication from the examining division (Time limit: M06)
26.05.1999Application deemed to be withdrawn, date of legal effect  [1999/47]
24.06.1999Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [1999/47]
Fees paidRenewal fee
25.09.1995Renewal fee patent year 03
16.09.1996Renewal fee patent year 04
26.09.1997Renewal fee patent year 05
05.10.1998Renewal fee patent year 06
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Documents cited:Search[X]EP0424608  (IBM) [X] 1,2,5-8,10,11 * abstract * * column 3, line 32 - column 5, line 20 *;
 [X]EP0341898  (ADVANCED MICRO DEVICES INC) [X] 1,2,5-8,10,11 * column 7, line 22 - line 31 * * column 8, line 9 - line 50 * * column 9, line 2 - line 41 * * column 11, line 7 - column 12, line 16 *;
 [A]EP0386337  (APPLIED MATERIALS INC) [A] 3,4 * column 4, line 10 - line 19 * * column 8, line 30 - line 39 *
 [A]  - DAVARI B ET AL, "A VARIABLE-SIZE SHALLOW TRENCH ISOLATION (STI) TECHNOLOGY WITH DIFFUSED SIDEWALL DOPING FOR SUBMICRON CMOS", INTERNATIONAL ELECTRON DEVICES MEETING, SAN FRANCISCO, DEC. 11 - 14, 1988, INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, (19890101), no. -, pages 92 - 95, XP000566409 [A] 9 * the whole document *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.