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Extract from the Register of European Patents

EP About this file: EP0557219

EP0557219 - Micro-capacitive sensor with reduced parasitic capacitance and manufacturing method [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  19.03.1999
Database last updated on 03.09.2024
Most recent event   Tooltip19.03.1999No opposition filed within time limitpublished on 06.05.1999 [1999/18]
Applicant(s)For all designated states
SEXTANT AVIONIQUE S.A.
5/7 rue Jeanne Braconnier Parc Tertiaire
92366 Meudon la Forêt Cédex / FR
[1998/20]
Former [1993/34]For all designated states
SEXTANT AVIONIQUE S.A.
5/7 rue Jeanne Braconnier Parc Tertiaire
F-92366 Meudon la Forêt Cédex / FR
Inventor(s)01 / Thomas, Isabelle
2, Rue Flaubert
F-26000 Valence / FR
02 / Lefort, Pierre-Olivier
2, Rue Flaubert
F-26000 Valence / FR
03 / Legoux, Christophe
120, Rue des Moulins
F-26000 Valence / FR
[1993/34]
Representative(s)de Beaumont, Michel
1bis, rue Champollion
38000 Grenoble / FR
[N/P]
Former [1993/34]de Beaumont, Michel
1bis, rue Champollion
F-38000 Grenoble / FR
Application number, filing date93420073.416.02.1993
[1993/34]
Priority number, dateFR1992000219120.02.1992         Original published format: FR 9202191
[1993/34]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report 
No.:EP0557219
Date:25.08.1993
Language:FR
[1993/34]
Type: B1 Patent specification 
No.:EP0557219
Date:13.05.1998
Language:FR
[1998/20]
Search report(s)(Supplementary) European search report - dispatched on:EP14.05.1993
ClassificationIPC:G01P15/08, G01P15/125, G01L9/00
[1993/34]
CPC:
G01L9/0073 (EP,US); G01P15/0802 (EP,US); G01P15/125 (EP,US);
G01P2015/0828 (EP,US)
Designated contracting statesCH,   DE,   GB,   IT,   LI,   SE [1993/34]
TitleGerman:Kapazitiver Mikrosensor mit reduzierter parasitärer Kapazität und Verfahren zur Herstellung[1993/34]
English:Micro-capacitive sensor with reduced parasitic capacitance and manufacturing method[1993/34]
French:Micro-capteur capacitif à capacité parasite réduite et procédé de fabrication[1993/34]
Examination procedure28.01.1994Examination requested  [1994/15]
18.10.1996Despatch of a communication from the examining division (Time limit: M04)
16.01.1997Reply to a communication from the examining division
29.04.1997Despatch of communication of intention to grant (Approval: Yes)
20.08.1997Communication of intention to grant the patent
07.10.1997Fee for grant paid
07.10.1997Fee for publishing/printing paid
Opposition(s)16.02.1999No opposition filed within time limit [1999/18]
Fees paidRenewal fee
22.02.1995Renewal fee patent year 03
21.02.1996Renewal fee patent year 04
19.02.1997Renewal fee patent year 05
19.02.1998Renewal fee patent year 06
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Documents cited:Search[A]EP0369352  (HITACHI LTD [JP])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.