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EP0644460
European procedure
Extract from the Register of European Patents
EP About this file: EP0644460
| EP0644460 - Positive working photoresist composition [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 06.10.2000 Database last updated on 15.05.2024 | Most recent event Tooltip | 06.10.2000 | No opposition filed within time limit | published on 22.11.2000 [2000/47] | Applicant(s) | For all designated states FUJI PHOTO FILM CO., LTD. 210 Nakanuma Minami-Ashigara-shi, Kanagawa 250-0123 / JP | [N/P] |
| Former [1995/12] | For all designated states FUJI PHOTO FILM CO., LTD. 210 Nakanuma Minami-Ashigara-shi Kanagawa 250-01 / JP | Inventor(s) | 01 /
Kawabe, Yasumasa, c/o Fuji Photo Film Co., Ltd. 4000, Kawashiri, Yoshida-cho Haibara-gun, Shizuoka / JP | 02 /
Satoh, Kenichiro, c/o Fuji Photo Film Co., Ltd. 4000, Kawashiri, Yoshida-cho Haibara-gun, Shizuoka / JP | 03 /
Aoai, Toshiaki, c/o Fuji Photo Film Co., Ltd. 4000, Kawashiri, Yoshida-cho Haibara-gun, Shizuoka / JP | [1995/12] | Representative(s) | Barz, Peter Meissner Bolte & Partner GbR Postfach 86 06 24 81633 München / DE | [N/P] |
| Former [1995/25] | Barz, Peter, Dr. Patentanwalt Kaiserplatz 2 D-80803 München / DE | ||
| Former [1995/12] | Barz, Peter, Dr. Patentanwälte Dipl.-Ing. G. Dannenberg Dr. P. Weinhold, Dr. D. Gudel Dipl.-Ing. S. Schubert, Dr. P. Barz Siegfriedstrasse 8 D-80803 München / DE | Application number, filing date | 94114717.5 | 19.09.1994 | [1995/12] | Priority number, date | JP19930233537 | 20.09.1993 Original published format: JP 23353793 | JP19930233538 | 20.09.1993 Original published format: JP 23353893 | JP19930251780 | 07.10.1993 Original published format: JP 25178093 | JP19930251781 | 07.10.1993 Original published format: JP 25178193 | [1995/12] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0644460 | Date: | 22.03.1995 | Language: | EN | [1995/12] | Type: | B1 Patent specification | No.: | EP0644460 | Date: | 08.12.1999 | Language: | EN | [1999/49] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 10.01.1995 | Classification | IPC: | G03F7/022 | [1995/12] | CPC: |
C08G8/20 (EP);
G03F7/022 (EP);
G03F7/023 (EP)
| Designated contracting states | BE, DE, FR [1995/12] | Title | German: | Positiv arbeitende Photoresistzusammensetzung | [1995/12] | English: | Positive working photoresist composition | [1995/12] | French: | Composition pour photoréserve de type positif | [1995/12] | Examination procedure | 21.09.1995 | Examination requested [1995/46] | 22.04.1998 | Despatch of a communication from the examining division (Time limit: M06) | 30.10.1998 | Reply to a communication from the examining division | 21.01.1999 | Despatch of communication of intention to grant (Approval: Yes) | 20.04.1999 | Communication of intention to grant the patent | 16.06.1999 | Fee for grant paid | 16.06.1999 | Fee for publishing/printing paid | Opposition(s) | 09.09.2000 | No opposition filed within time limit [2000/47] | Fees paid | Renewal fee | 27.09.1996 | Renewal fee patent year 03 | 29.09.1997 | Renewal fee patent year 04 | 30.09.1998 | Renewal fee patent year 05 | 29.09.1999 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0395049 (FUJI PHOTO FILM CO.) [A] 1-10 * page 18, line 26 - line 51; claim - *; | [A]EP0443533 (FUJI PHOTO FILM CO.) [A] 1-10 * claim 3 *; | [AD]EP0440238 (FUJI PHOTO FILM CO.) [AD] 1-10 * page 52, line 5 - line 10 * | Examination | JPH02296248 |