EP0690111 - Anti-reflective coating composition [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 23.03.2001 Database last updated on 19.10.2024 | Most recent event Tooltip | 23.03.2001 | No opposition filed within time limit | published on 09.05.2001 [2001/19] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 6-1, Otemachi 2-chome Chiyoda-ku Tokyo / JP | [N/P] |
Former [1996/01] | For all designated states SHIN-ETSU CHEMICAL CO., LTD. 6-1, Ohtemachi 2-chome Chiyoda-ku Tokyo / JP | Inventor(s) | 01 /
Watanabe, Satoshi, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | 02 /
Ishihara, Toshinobu, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | 03 /
Kaneko, Ichiro, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | 04 /
Oikawa, Katsuyuki, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | 05 /
Takeda, Yoshihumi, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | [1996/01] | Representative(s) | Ter Meer Steinmeister & Partner Patentanwälte mbB Nymphenburger Strasse 4 80335 München / DE | [N/P] |
Former [1996/01] | TER MEER - MÜLLER - STEINMEISTER & PARTNER Mauerkircherstrasse 45 D-81679 München / DE | Application number, filing date | 95110110.4 | 28.06.1995 | [1996/01] | Priority number, date | JP19940169971 | 29.06.1994 Original published format: JP 16997194 | [1996/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0690111 | Date: | 03.01.1996 | Language: | EN | [1996/01] | Type: | B1 Patent specification | No.: | EP0690111 | Date: | 17.05.2000 | Language: | EN | [2000/20] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 01.09.1995 | Classification | IPC: | C09D179/08, G02B1/10, C08G73/10 | [1996/01] | CPC: |
C08G73/105 (EP,US);
C09D179/08 (EP,KR,US);
C08G73/10 (KR);
C08G73/101 (EP,US);
C08G73/1039 (EP,US);
C08G73/1064 (EP,US);
C08G73/1067 (EP,US);
C08G73/1082 (EP,US);
G02B1/111 (EP,US);
G03F7/11 (KR)
(-)
| Designated contracting states | CH, DE, FR, LI, NL [1996/01] | Title | German: | Entspiegelte Beschichtungszusammensetzung | [1996/01] | English: | Anti-reflective coating composition | [1996/01] | French: | Composition anti-réfléchissante de recouvrement | [1996/01] | Examination procedure | 28.06.1996 | Examination requested [1996/35] | 11.05.1998 | Despatch of a communication from the examining division (Time limit: M04) | 21.09.1998 | Reply to a communication from the examining division | 02.11.1998 | Despatch of a communication from the examining division (Time limit: M04) | 11.03.1999 | Reply to a communication from the examining division | 16.08.1999 | Despatch of communication of intention to grant (Approval: Yes) | 18.11.1999 | Communication of intention to grant the patent | 15.02.2000 | Fee for grant paid | 15.02.2000 | Fee for publishing/printing paid | Opposition(s) | 20.02.2001 | No opposition filed within time limit [2001/19] | Fees paid | Renewal fee | 17.06.1997 | Renewal fee patent year 03 | 10.06.1998 | Renewal fee patent year 04 | 16.06.1999 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]EP0159428 (BREWER SCIENCE INC [US]) [X] 1 * claims 1,5,7 *; | [A] - ANONYMOUS, "USE OD POLY:ANILINE AS A HIGH TEMPERATURE DYE - FOR ANTI-REFLECTIVE COAT DURING OPTICAL LITHOGRAPHY", CHEMICAL PATENTS INDEX, DOCUMENTATION ABSTRACTS JOURNAL, 7, Derwent World Patents Index, vol. 92, no. 33, Database accession no. 92-274794, XP000667279 [A] 1-4 * abstract * | [ ] - RESEARCH DISCLOSURE, EMSWORTH, GB., (19920710), vol. 339, no. 046 | by applicant | US4491628 | JPS6327829 | JPH0227660B | US5234990 | JPH0612452B | US5310619 | JPH06169971 | - USUJIMA ET AL., Preprint of Spring Meeting of Japan Applied Physics Society, (1994), page 566 | - FUKUSHIMA ET AL., Preprint of Spring Meeting of Japan Applied Physics Society, (1994), page 566 | - B.W. DUDLEY ET AL., Advances in Resist Technology and Processing, SPIE, (1992), vol. 1672, page 638 | - TANI ET AL., Preprint of Spring Meeting of Japan Applied Physics Society, (1994), page 567 |