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Extract from the Register of European Patents

EP About this file: EP0690111

EP0690111 - Anti-reflective coating composition [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  23.03.2001
Database last updated on 19.10.2024
Most recent event   Tooltip23.03.2001No opposition filed within time limitpublished on 09.05.2001 [2001/19]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Otemachi 2-chome Chiyoda-ku
Tokyo / JP
[N/P]
Former [1996/01]For all designated states
SHIN-ETSU CHEMICAL CO., LTD.
6-1, Ohtemachi 2-chome
Chiyoda-ku Tokyo / JP
Inventor(s)01 / Watanabe, Satoshi, Shin-Etsu Chemical Co., Ltd.
28-1, Oaza Nishifukushima, Kubiki-mura
Nakakubiki-gun, Niigata-ken / JP
02 / Ishihara, Toshinobu, Shin-Etsu Chemical Co., Ltd.
28-1, Oaza Nishifukushima, Kubiki-mura
Nakakubiki-gun, Niigata-ken / JP
03 / Kaneko, Ichiro, Shin-Etsu Chemical Co., Ltd.
28-1, Oaza Nishifukushima, Kubiki-mura
Nakakubiki-gun, Niigata-ken / JP
04 / Oikawa, Katsuyuki, Shin-Etsu Chemical Co., Ltd.
28-1, Oaza Nishifukushima, Kubiki-mura
Nakakubiki-gun, Niigata-ken / JP
05 / Takeda, Yoshihumi, Shin-Etsu Chemical Co., Ltd.
28-1, Oaza Nishifukushima, Kubiki-mura
Nakakubiki-gun, Niigata-ken / JP
[1996/01]
Representative(s)Ter Meer Steinmeister & Partner
Patentanwälte mbB
Nymphenburger Strasse 4
80335 München / DE
[N/P]
Former [1996/01]TER MEER - MÜLLER - STEINMEISTER & PARTNER
Mauerkircherstrasse 45
D-81679 München / DE
Application number, filing date95110110.428.06.1995
[1996/01]
Priority number, dateJP1994016997129.06.1994         Original published format: JP 16997194
[1996/01]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0690111
Date:03.01.1996
Language:EN
[1996/01]
Type: B1 Patent specification 
No.:EP0690111
Date:17.05.2000
Language:EN
[2000/20]
Search report(s)(Supplementary) European search report - dispatched on:EP01.09.1995
ClassificationIPC:C09D179/08, G02B1/10, C08G73/10
[1996/01]
CPC:
C08G73/105 (EP,US); C09D179/08 (EP,KR,US); C08G73/10 (KR);
C08G73/101 (EP,US); C08G73/1039 (EP,US); C08G73/1064 (EP,US);
C08G73/1067 (EP,US); C08G73/1082 (EP,US); G02B1/111 (EP,US);
G03F7/11 (KR) (-)
Designated contracting statesCH,   DE,   FR,   LI,   NL [1996/01]
TitleGerman:Entspiegelte Beschichtungszusammensetzung[1996/01]
English:Anti-reflective coating composition[1996/01]
French:Composition anti-réfléchissante de recouvrement[1996/01]
Examination procedure28.06.1996Examination requested  [1996/35]
11.05.1998Despatch of a communication from the examining division (Time limit: M04)
21.09.1998Reply to a communication from the examining division
02.11.1998Despatch of a communication from the examining division (Time limit: M04)
11.03.1999Reply to a communication from the examining division
16.08.1999Despatch of communication of intention to grant (Approval: Yes)
18.11.1999Communication of intention to grant the patent
15.02.2000Fee for grant paid
15.02.2000Fee for publishing/printing paid
Opposition(s)20.02.2001No opposition filed within time limit [2001/19]
Fees paidRenewal fee
17.06.1997Renewal fee patent year 03
10.06.1998Renewal fee patent year 04
16.06.1999Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]EP0159428  (BREWER SCIENCE INC [US]) [X] 1 * claims 1,5,7 *;
 [A]  - ANONYMOUS, "USE OD POLY:ANILINE AS A HIGH TEMPERATURE DYE - FOR ANTI-REFLECTIVE COAT DURING OPTICAL LITHOGRAPHY", CHEMICAL PATENTS INDEX, DOCUMENTATION ABSTRACTS JOURNAL, 7, Derwent World Patents Index, vol. 92, no. 33, Database accession no. 92-274794, XP000667279 [A] 1-4 * abstract *
    [ ] - RESEARCH DISCLOSURE, EMSWORTH, GB., (19920710), vol. 339, no. 046
by applicantUS4491628
 JPS6327829
 JPH0227660B
 US5234990
 JPH0612452B
 US5310619
 JPH06169971
    - USUJIMA ET AL., Preprint of Spring Meeting of Japan Applied Physics Society, (1994), page 566
    - FUKUSHIMA ET AL., Preprint of Spring Meeting of Japan Applied Physics Society, (1994), page 566
    - B.W. DUDLEY ET AL., Advances in Resist Technology and Processing, SPIE, (1992), vol. 1672, page 638
    - TANI ET AL., Preprint of Spring Meeting of Japan Applied Physics Society, (1994), page 567
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.