EP0686876 - Attenuated phase shift mask and process for fabricating such a mask [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 18.08.2000 Database last updated on 15.08.2024 | Most recent event Tooltip | 01.08.2008 | Change - applicant | published on 03.09.2008 [2008/36] | Applicant(s) | For all designated states ADVANCED MICRO DEVICES, INC. One AMD Place Mail Stop 68 P.O. Box 3453 Sunnyvale CA 94088-3453 / US | [2008/36] |
Former [1995/50] | For all designated states ADVANCED MICRO DEVICES INC. One AMD Place, P.O. Box 3453 Sunnyvale, California 94088-3453 / US | Inventor(s) | 01 /
Krivokapic, Zoran 23321 de Varona Place Santa Clara, California 95050 / US | 02 /
Spence, Christopher A. 1145 Andover Drive Sunnyvale, California 94087 / US | [1995/50] | Representative(s) | Brookes IP Windsor House 6-10 Mount Ephraim Road Tunbridge Wells, Kent TN1 1EE / GB | [N/P] |
Former [1996/40] | BROOKES & MARTIN High Holborn House 52/54 High Holborn London, WC1V 6SE / GB | ||
Former [1995/50] | Wright, Hugh Ronald, et al Brookes & Martin 52/54 High Holborn London WC1V 6SE / GB | Application number, filing date | 95302403.1 | 11.04.1995 | [1995/50] | Priority number, date | US19940250898 | 31.05.1994 Original published format: US 250898 | [1995/50] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0686876 | Date: | 13.12.1995 | Language: | EN | [1995/50] | Type: | A3 Search report | No.: | EP0686876 | Date: | 20.03.1996 | [1996/12] | Type: | B1 Patent specification | No.: | EP0686876 | Date: | 20.10.1999 | Language: | EN | [1999/42] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 26.01.1996 | Classification | IPC: | G03F1/00 | [1995/50] | CPC: |
G03F1/32 (EP,US);
G03F1/26 (KR)
| Designated contracting states | AT, BE, DE, DK, ES, FR, GB, GR, IE, IT, LU, NL, PT, SE [1995/50] | Title | German: | Bedämpfte Phasenschiebemaske und Verfahren zu ihrer Herstellung | [1995/50] | English: | Attenuated phase shift mask and process for fabricating such a mask | [1995/50] | French: | Masque déphaseur atténué et procédé pour fabriquer ce masque | [1995/50] | Examination procedure | 26.08.1996 | Examination requested [1996/43] | 25.05.1998 | Despatch of a communication from the examining division (Time limit: M06) | 11.11.1998 | Reply to a communication from the examining division | 03.02.1999 | Despatch of communication of intention to grant (Approval: Yes) | 22.04.1999 | Communication of intention to grant the patent | 09.07.1999 | Fee for grant paid | 09.07.1999 | Fee for publishing/printing paid | Opposition(s) | 21.07.2000 | No opposition filed within time limit [2000/40] | Fees paid | Renewal fee | 07.04.1997 | Renewal fee patent year 03 | 17.04.1998 | Renewal fee patent year 04 | 15.04.1999 | Renewal fee patent year 05 |
Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | AT | 20.10.1999 | BE | 20.10.1999 | ES | 20.10.1999 | GR | 20.10.1999 | IT | 20.10.1999 | SE | 20.10.1999 | DK | 20.01.2000 | PT | 20.01.2000 | IE | 11.04.2000 | LU | 11.04.2000 | [2008/06] |
Former [2004/39] | AT | 20.10.1999 | |
BE | 20.10.1999 | ||
ES | 20.10.1999 | ||
GR | 20.10.1999 | ||
SE | 20.10.1999 | ||
DK | 20.01.2000 | ||
PT | 20.01.2000 | ||
IE | 11.04.2000 | ||
LU | 11.04.2000 | ||
Former [2004/07] | AT | 20.10.1999 | |
BE | 20.10.1999 | ||
ES | 20.10.1999 | ||
GR | 20.10.1999 | ||
SE | 20.10.1999 | ||
DK | 20.01.2000 | ||
PT | 20.01.2000 | ||
IE | 11.04.2000 | ||
Former [2003/45] | AT | 20.10.1999 | |
BE | 20.10.1999 | ||
ES | 20.10.1999 | ||
SE | 20.10.1999 | ||
DK | 20.01.2000 | ||
PT | 20.01.2000 | ||
IE | 11.04.2000 | ||
Former [2002/26] | AT | 20.10.1999 | |
BE | 20.10.1999 | ||
ES | 20.10.1999 | ||
SE | 20.10.1999 | ||
PT | 20.01.2000 | ||
IE | 11.04.2000 | ||
Former [2002/23] | AT | 20.10.1999 | |
BE | 20.10.1999 | ||
SE | 20.10.1999 | ||
PT | 20.01.2000 | ||
IE | 11.04.2000 | ||
Former [2001/50] | AT | 20.10.1999 | |
BE | 20.10.1999 | ||
PT | 20.01.2000 | ||
IE | 11.04.2000 | ||
Former [2000/51] | AT | 20.10.1999 | |
BE | 20.10.1999 | ||
PT | 20.01.2000 | ||
Former [2000/43] | BE | 20.10.1999 | |
PT | 20.01.2000 | Documents cited: | Search | [A]EP0401795 (OKI ELECTRIC IND CO LTD [JP]) [A] 1-20; | [XA]EP0475694 (FUJITSU LTD [JP]) [X] 1-13,18 [A] 14-17,19,20; | [XA]DE4238441 (GOLD STAR ELECTRONICS [KR]) [X] 1,2,5-7,9,10,13-20 [A] 8,11; | [XA]EP0565473 (IBM [US]) [X] 1-3,5-7 [A] 8-10,13-15,18; | [PA]JPH06180497 (TOPPAN PRINTING CO LTD)[PA] 9,18-20; | [PXA]JPH06242592 (MITSUBISHI ELECTRIC CORP) [PX] 1,8,13 [PA] 5,9,18 | [A] - PATENT ABSTRACTS OF JAPAN [A] 1-3,5,8-11,13,14 | Examination | EP0643331 |