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EP0686876

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Extract from the Register of European Patents

EP About this file: EP0686876

EP0686876 - Attenuated phase shift mask and process for fabricating such a mask [Right-click to bookmark this link]
Status	No opposition filed within time limit Status updated on 18.08.2000 Database last updated on 15.08.2024
Most recent event Tooltip	01.08.2008	Change - applicant	published on 03.09.2008 [2008/36]
Applicant(s)	For all designated states ADVANCED MICRO DEVICES, INC. One AMD Place Mail Stop 68 P.O. Box 3453 Sunnyvale CA 94088-3453 / US
	[2008/36]
Former [1995/50]	For all designated states ADVANCED MICRO DEVICES INC. One AMD Place, P.O. Box 3453 Sunnyvale, California 94088-3453 / US
Inventor(s)	01 / Krivokapic, Zoran 23321 de Varona Place Santa Clara, California 95050 / US
	02 / Spence, Christopher A. 1145 Andover Drive Sunnyvale, California 94087 / US
	[1995/50]
Representative(s)	Brookes IP Windsor House 6-10 Mount Ephraim Road Tunbridge Wells, Kent TN1 1EE / GB
	[N/P]
Former [1996/40]	BROOKES & MARTIN High Holborn House 52/54 High Holborn London, WC1V 6SE / GB
Former [1995/50]	Wright, Hugh Ronald, et al Brookes & Martin 52/54 High Holborn London WC1V 6SE / GB
Application number, filing date	95302403.1	11.04.1995
	[1995/50]
Priority number, date	US19940250898	31.05.1994 Original published format: US 250898
	[1995/50]
Filing language	EN
Procedural language	EN
Publication	Type:	A2 Application without search report
	No.:	EP0686876
	Date:	13.12.1995
	Language:	EN
	[1995/50]
	Type:	A3 Search report
	No.:	EP0686876
	Date:	20.03.1996
	[1996/12]
	Type:	B1 Patent specification
	No.:	EP0686876
	Date:	20.10.1999
	Language:	EN
	[1999/42]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	26.01.1996
Classification	IPC:	G03F1/00	[1995/50]
	CPC:	G03F1/32 (EP,US); G03F1/26 (KR)
Designated contracting states	AT, BE, DE, DK, ES, FR, GB, GR, IE, IT, LU, NL, PT, SE [1995/50]
Title	German:	Bedämpfte Phasenschiebemaske und Verfahren zu ihrer Herstellung	[1995/50]
	English:	Attenuated phase shift mask and process for fabricating such a mask	[1995/50]
	French:	Masque déphaseur atténué et procédé pour fabriquer ce masque	[1995/50]
Examination procedure	26.08.1996	Examination requested [1996/43]
	25.05.1998	Despatch of a communication from the examining division (Time limit: M06)
	11.11.1998	Reply to a communication from the examining division
	03.02.1999	Despatch of communication of intention to grant (Approval: Yes)
	22.04.1999	Communication of intention to grant the patent
	09.07.1999	Fee for grant paid
	09.07.1999	Fee for publishing/printing paid
Opposition(s)	21.07.2000	No opposition filed within time limit [2000/40]
Fees paid	Renewal fee
	07.04.1997	Renewal fee patent year 03
	17.04.1998	Renewal fee patent year 04
	15.04.1999	Renewal fee patent year 05
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition Tooltip	AT	20.10.1999
	BE	20.10.1999
	ES	20.10.1999
	GR	20.10.1999
	IT	20.10.1999
	SE	20.10.1999
	DK	20.01.2000
	PT	20.01.2000
	IE	11.04.2000
	LU	11.04.2000
	[2008/06]
Former [2004/39]	AT	20.10.1999
	BE	20.10.1999
	ES	20.10.1999
	GR	20.10.1999
	SE	20.10.1999
	DK	20.01.2000
	PT	20.01.2000
	IE	11.04.2000
	LU	11.04.2000
Former [2004/07]	AT	20.10.1999
	BE	20.10.1999
	ES	20.10.1999
	GR	20.10.1999
	SE	20.10.1999
	DK	20.01.2000
	PT	20.01.2000
	IE	11.04.2000
Former [2003/45]	AT	20.10.1999
	BE	20.10.1999
	ES	20.10.1999
	SE	20.10.1999
	DK	20.01.2000
	PT	20.01.2000
	IE	11.04.2000
Former [2002/26]	AT	20.10.1999
	BE	20.10.1999
	ES	20.10.1999
	SE	20.10.1999
	PT	20.01.2000
	IE	11.04.2000
Former [2002/23]	AT	20.10.1999
	BE	20.10.1999
	SE	20.10.1999
	PT	20.01.2000
	IE	11.04.2000
Former [2001/50]	AT	20.10.1999
	BE	20.10.1999
	PT	20.01.2000
	IE	11.04.2000
Former [2000/51]	AT	20.10.1999
	BE	20.10.1999
	PT	20.01.2000
Former [2000/43]	BE	20.10.1999
	PT	20.01.2000
Documents cited:	Search	[A]EP0401795 (OKI ELECTRIC IND CO LTD [JP]) [A] 1-20;
		[XA]EP0475694 (FUJITSU LTD [JP]) [X] 1-13,18 [A] 14-17,19,20;
		[XA]DE4238441 (GOLD STAR ELECTRONICS [KR]) [X] 1,2,5-7,9,10,13-20 [A] 8,11;
		[XA]EP0565473 (IBM [US]) [X] 1-3,5-7 [A] 8-10,13-15,18;
		[PA]JPH06180497 (TOPPAN PRINTING CO LTD)[PA] 9,18-20;
		[PXA]JPH06242592 (MITSUBISHI ELECTRIC CORP) [PX] 1,8,13 [PA] 5,9,18
		[A] - PATENT ABSTRACTS OF JAPAN [A] 1-3,5,8-11,13,14
	Examination	EP0643331

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