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Extract from the Register of European Patents

EP About this file: EP0701008

EP0701008 - Epitaxy for growing compound semiconductors and an InP substrate for epitaxial growth [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  20.11.1998
Database last updated on 05.10.2024
Most recent event   Tooltip20.11.1998No opposition filed within time limitpublished on 07.01.1999 [1999/01]
Applicant(s)For all designated states
SUMITOMO ELECTRIC INDUSTRIES, LIMITED
5-33, Kitahama 4-chome Chuo-ku
Osaka 541 / JP
[N/P]
Former [1996/11]For all designated states
SUMITOMO ELECTRIC INDUSTRIES, LIMITED
5-33, Kitahama 4-chome Chuo-ku
Osaka 541 / JP
Inventor(s)01 / Oida, Kazuhiko, c/o Itami Works of Sumitomo
Elec. Ind. Ltd., 1-1 Koyakita 1-chome
Itami-shi, Hyogo / JP
02 / Nakai, Ryusuke, c/o Itami Works of Sumitomo
Elec. Ind. Ltd., 1-1 Koyakita 1-chome
Itami-shi, Hyogo / JP
[1996/11]
Representative(s)Smith, Norman Ian, et al
Cleveland
40-43 Chancery Lane
London WC2A 1JQ / GB
[N/P]
Former [1996/11]Smith, Norman Ian, et al
F.J. CLEVELAND & COMPANY 40-43 Chancery Lane
London WC2A 1JQ / GB
Application number, filing date95306232.006.09.1995
[1996/11]
Priority number, dateJP1994024068008.09.1994         Original published format: JP 24068094
[1996/11]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0701008
Date:13.03.1996
Language:EN
[1996/11]
Type: A3 Search report 
No.:EP0701008
Date:26.06.1996
[1996/26]
Type: B1 Patent specification 
No.:EP0701008
Date:14.01.1998
Language:EN
[1998/03]
Search report(s)(Supplementary) European search report - dispatched on:EP08.05.1996
ClassificationIPC:C30B25/18
[1996/24]
CPC:
C30B23/02 (EP,US); C30B25/02 (EP,US); C30B29/40 (EP,US);
Y10S117/902 (EP)
Former IPC [1996/11]C30B29/40, C30B25/02
Designated contracting statesDE,   FR,   GB [1996/11]
TitleGerman:Epitaxie zur Züchtung von Verbindunghalbleitern und InP Substraten für das Epitaxiezüchten[1996/11]
English:Epitaxy for growing compound semiconductors and an InP substrate for epitaxial growth[1996/11]
French:Epitaxie pour la croissance de semi-conducteurs composés et un substrat de InP pour la croissance épitaxiale[1996/11]
Examination procedure24.05.1996Examination requested  [1996/30]
26.07.1996Despatch of a communication from the examining division (Time limit: M04)
15.09.1996Reply to a communication from the examining division
26.05.1997Despatch of communication of intention to grant (Approval: Yes)
11.07.1997Communication of intention to grant the patent
23.07.1997Fee for grant paid
23.07.1997Fee for publishing/printing paid
Opposition(s)15.10.1998No opposition filed within time limit [1999/01]
Fees paidRenewal fee
24.09.1997Renewal fee patent year 03
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Documents cited:Search[AD]JPS6415914  ;
 [AD]JPS6432686
 [AD]  - PATENT ABSTRACTS OF JAPAN, (19890510), vol. 013, no. 195, Database accession no. (E - 754), & JP01015914 A 19890119 (NEC CORP) [AD] 1-9 * abstract *
 [AD]  - PATENT ABSTRACTS OF JAPAN, (19890523), vol. 013, no. 220, Database accession no. (E - 762), & JP01032686 A 19890202 (NEC CORP) [AD] 1-9 * abstract *
by applicantJPH06240680
 JPH02239188
 JPH05301795
 JPS6432686
 JPS6415914
 JPH01270599
 JPH0473610
 JPH0316993
 JPH02288223
 JPH01128423
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.