blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News flashes

New version of the European Patent Register - SPC information for Unitary Patents.

2024-03-06

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP0720211

EP0720211 - Novel tungsten deposition process [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  07.11.1997
Database last updated on 16.07.2024
Most recent event   Tooltip07.11.1997Withdrawal of applicationpublished on 29.12.1997 [1997/52]
Applicant(s)For all designated states
AT&T Corp.
32 Avenue of the Americas
New York, NY 10013-2412 / US
[1996/27]
Inventor(s)01 / Merchant, Sailesh Mansinh
8214 Vineland Oaks Boulevard
Orlando, Florida 32835 / US
02 / Nanda, Arun Kumar
9400 Caracas Drive
Austin, Texas 78733 / US
03 / Roy, Pradip Kumar
7706 Hidden Ivey Court
Orlando, Florida 32819 / US
[1996/27]
Representative(s)Johnston, Kenneth Graham, et al
Lucent Technologies EUR-IP UK Ltd Unit 18, Core 3 Workzone Innova Business Park Electric Avenue
Enfield, EN3 7XB / GB
[N/P]
Former [1996/27]Johnston, Kenneth Graham, et al
Lucent Technologies (UK) Ltd, 5 Mornington Road
Woodford Green Essex, IG8 OTU / GB
Application number, filing date95309093.313.12.1995
[1996/27]
Priority number, dateUS1994036652930.12.1994         Original published format: US 366529
[1996/27]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0720211
Date:03.07.1996
Language:EN
[1996/27]
Type: A3 Search report 
No.:EP0720211
Date:05.03.1997
[1997/10]
Search report(s)(Supplementary) European search report - dispatched on:EP21.01.1997
ClassificationIPC:H01L21/768, H01L23/522
[1997/09]
CPC:
H01L21/28556 (EP,KR,US); H01L21/76843 (EP,US); H01L21/76876 (EP,US);
H01L21/76877 (KR); H01L21/76879 (EP,US); H01L21/76897 (KR);
H01L23/53266 (EP,US); H01L23/53209 (KR) (-)
Former IPC [1996/27]H01L21/285
Designated contracting statesDE,   ES,   FR,   GB,   IT,   NL [1996/27]
TitleGerman:Verfahren zur Abscheidung von Wolfram[1996/27]
English:Novel tungsten deposition process[1996/27]
French:Procédé de débit de tungstène[1996/27]
Examination procedure21.08.1997Examination requested  [1997/43]
03.11.1997Application withdrawn by applicant  [1997/52]
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]JPH05152292  ;
 [A]DE4018801  (SAMSUNG ELECTRONICS CO LTD [KR]) [A] 1,6,19,21 * column 1, line 45 - column 2, line 7; figure 3; claim 1 *;
 [A]EP0488264  (TOSHIBA KK [JP]) [A] 1* column 3, line 9 - column 3, line 52; figures 2,11,12; claim 1 *;
 [A]EP0587401  (INMOS LTD [GB]) [A] 1,2,6,8,11,15,19,21 * column 2, line 47 - column 4, line 58 *;
 [A]  - TSAI N S ET AL, LAYER-TUNGSTEN AND ITS APPLICATIONS FOR VLSI INTERCONNECTS, INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, INTERNATIONAL ELECTRON DEVICES MEETING, SAN FRANCISCO, DECEMBER 11 - 14, 1988, NR. 1988, PAGE(S) 462 - 465, (19881211), XP000013962 [A] 1,4,6,7,19,21 * page 462 - page 463; figures 3,8 *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19930928), vol. 017, no. 538, Database accession no. (E - 1440), & JP05152292 A 19930618 (SONY CORP) [A] 1,2,6,8,11,15,19,21 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.