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Extract from the Register of European Patents

EP About this file: EP0734073

EP0734073 - Bipolar transistor and method for forming the same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  22.08.2003
Database last updated on 08.06.2024
Most recent event   Tooltip26.06.2009Change - representativepublished on 29.07.2009  [2009/31]
Applicant(s)For all designated states
Texas Instruments Incorporated
13500 North Central Expressway
Dallas, Texas 75265 / US
[N/P]
Former [1996/39]For all designated states
TEXAS INSTRUMENTS INCORPORATED
13500 North Central Expressway
Dallas Texas 75265 / US
Inventor(s)01 / Johnson, Scott F.
P.O. Box 743484
Dallas, TX 75374 / US
[1996/39]
Representative(s)Degwert, Hartmut, et al
Prinz & Partner
Rundfunkplatz 2
80335 München / DE
[N/P]
Former [2009/31]Degwert, Hartmut, et al
Prinz & Partner GbR Rundfunkplatz 2
80335 München / DE
Former [2003/12]Degwert, Hartmut, Dipl.-Phys., et al
Prinz & Partner GbR, Manzingerweg 7
81241 München / DE
Former [1996/39]Schwepfinger, Karl-Heinz, Dipl.-Ing.
Prinz & Partner, Manzingerweg 7
81241 München / DE
Application number, filing date96104338.719.03.1996
[1996/39]
Priority number, dateUS1995040955823.03.1995         Original published format: US 409558
[1996/39]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0734073
Date:25.09.1996
Language:EN
[1996/39]
Type: A3 Search report 
No.:EP0734073
Date:04.12.1996
[1996/49]
Type: B1 Patent specification 
No.:EP0734073
Date:16.10.2002
Language:EN
[2002/42]
Search report(s)(Supplementary) European search report - dispatched on:EP16.10.1996
ClassificationIPC:H01L29/732, H01L21/331
[1996/39]
CPC:
H01L29/66272 (EP,US); H01L29/73 (KR)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1996/39]
TitleGerman:Bipolartransistor und Verfahren zur Herstellung[1996/39]
English:Bipolar transistor and method for forming the same[1996/39]
French:Transistor bipolaire et procédé de fabrication[1996/39]
Examination procedure04.06.1997Examination requested  [1997/32]
06.08.2001Despatch of a communication from the examining division (Time limit: M04)
14.12.2001Reply to a communication from the examining division
27.02.2002Despatch of communication of intention to grant (Approval: No)
16.04.2002Despatch of communication of intention to grant (Approval: later approval)
03.05.2002Communication of intention to grant the patent
06.08.2002Fee for grant paid
06.08.2002Fee for publishing/printing paid
Opposition(s)17.07.2003No opposition filed within time limit [2003/41]
Fees paidRenewal fee
25.03.1998Renewal fee patent year 03
29.03.1999Renewal fee patent year 04
30.03.2000Renewal fee patent year 05
27.03.2001Renewal fee patent year 06
25.03.2002Renewal fee patent year 07
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipIT16.10.2002
NL16.10.2002
[2008/06]
Former [2003/30]NL16.10.2002
Documents cited:Search[X]US4892837  (KUDO SATOSHI [JP]) [X] 1,3,4,8,10,13-15 * column W *;
 [X]EP0606001  (NEC CORP [JP]) [X] 1,3,4,8,10,13-15 * column W *;
 [X]JPS62183558  ;
 [A]US4460417  (MURASE KATSUMI [JP], et al) [A] 1-3,10,11 * column W *;
 [A]US5242847  (OZTURK MEHMET C [US], et al) [A] 2,11 * column W *;
 [A]EP0189136  (TOSHIBA KK [JP]) [A] 1 * column W *
 [X]  - PATENT ABSTRACTS OF JAPAN, (19880126), vol. 12, no. 26, Database accession no. (E - 577), & JP62183558 A 19870811 (FUJITSU LTD) [X] 1,10 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.