EP0740334 - Isotropic silicon etch process that is highly selective to tungsten [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 19.01.2004 Database last updated on 08.10.2024 | Most recent event Tooltip | 05.06.2009 | Change - representative | published on 08.07.2009 [2009/28] | Applicant(s) | For all designated states Infineon Technologies AG St.-Martin-Strasse 53 81669 München / DE | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
Former [2003/11] | For all designated states Infineon Technologies AG St.-Martin-Strasse 53 81669 München / DE | ||
For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | |||
Former [2003/02] | For all designated states Infineon Technologies AG St.-Martin-Strasse 53 81669 München / DE | ||
For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | |||
Former [1996/44] | For all designated states SIEMENS AKTIENGESELLSCHAFT Wittelsbacherplatz 2 80333 München / DE | ||
For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Eckstein, Elke 20 rue Cassette 75006 Paris / FR | 02 /
Hoffman, Birgit # Deceased / DE | 03 /
Kiewra, Edward W. Schuetzenmattstr. 27-B 8802 Kilchberg / CH | 04 /
Kocon, Waldemar Walter 25 Valley Road Wappingers Falls, NY 12590 / US | 05 /
Weiss, Mark Jay 1675 York Avenue, Apt. 28D New York, NY 10128 / US | [1996/44] | Representative(s) | Vigars, Christopher Ian, et al Haseltine Lake LLP Redcliff Quay 120 Redcliff Street Bristol BS1 6HU / GB | [2009/28] |
Former [2000/47] | Vigars, Christopher Ian, et al Haseltine Lake & Co. Redcliff Quay 120 Redcliff Street Bristol BS1 6HU / GB | ||
Former [1998/27] | Epping, Wilhelm, Dr.-Ing., et al Patentanwalt Postfach 22 13 17 80503 München / DE | ||
Former [1996/44] | Fuchs, Franz-Josef, Dr.-Ing. Postfach 22 13 17 80503 München / DE | Application number, filing date | 96105741.1 | 11.04.1996 | [1996/44] | Priority number, date | US19950430011 | 27.04.1995 Original published format: US 430011 | [1996/44] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0740334 | Date: | 30.10.1996 | Language: | EN | [1996/44] | Type: | A3 Search report | No.: | EP0740334 | Date: | 28.05.1997 | [1997/22] | Type: | B1 Patent specification | No.: | EP0740334 | Date: | 12.03.2003 | Language: | EN | [2003/11] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 14.04.1997 | Classification | IPC: | H01L21/321, H01L21/311 | [1997/19] | CPC: |
H01L21/32137 (EP,US);
H01L21/306 (KR);
Y10S438/963 (EP,US)
|
Former IPC [1996/44] | H01L21/321 | Designated contracting states | AT, DE, FR, GB, IE, IT, NL [1996/44] | Title | German: | Verfahren zum isotropen Ätzen von Silizium, das hochselektiv gegenüber Wolfram ist | [1996/44] | English: | Isotropic silicon etch process that is highly selective to tungsten | [1996/44] | French: | Procédé de gravure isotrope - hautement sélectif par rapport au tungstène - de silicium | [1996/44] | Examination procedure | 22.10.1997 | Examination requested [1997/51] | 30.07.1999 | Despatch of a communication from the examining division (Time limit: M04) | 26.10.1999 | Reply to a communication from the examining division | 28.03.2000 | Despatch of a communication from the examining division (Time limit: M06) | 02.10.2000 | Reply to a communication from the examining division | 30.07.2002 | Communication of intention to grant the patent | 23.12.2002 | Fee for grant paid | 23.12.2002 | Fee for publishing/printing paid | Opposition(s) | 15.12.2003 | No opposition filed within time limit [2004/10] | Fees paid | Renewal fee | 20.04.1998 | Renewal fee patent year 03 | 19.04.1999 | Renewal fee patent year 04 | 26.04.2000 | Renewal fee patent year 05 | 23.04.2001 | Renewal fee patent year 06 | 24.04.2002 | Renewal fee patent year 07 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | AT | 12.03.2003 | FR | 12.03.2003 | IT | 12.03.2003 | NL | 12.03.2003 | [2008/06] |
Former [2006/14] | AT | 12.03.2003 | |
FR | 12.03.2003 | ||
NL | 12.03.2003 | ||
Former [2003/47] | AT | 12.03.2003 | |
NL | 12.03.2003 | ||
Former [2003/41] | NL | 12.03.2003 | Documents cited: | Search | [Y]EP0030798 (HUGHES AIRCRAFT CO [US]); | [Y]EP0350997 (KONINKL PHILIPS ELECTRONICS NV [NL]); | [Y]WO9110261 (IBM [US]); | [Y]US5094712 (BECKER DAVID S [US], et al); | [A]EP0553961 (APPLIED MATERIALS INC [US]) | Examination | EP0354717 |