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Extract from the Register of European Patents

EP About this file: EP0855454

EP0855454 - Microetching composition for copper or copper alloy [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  02.08.2003
Database last updated on 15.06.2024
Most recent event   Tooltip02.08.2003No opposition filed within time limitpublished on 17.09.2003  [2003/38]
Applicant(s)For all designated states
MEC CO., Ltd.
No. 1, Higashihatsushima-cho Amagasaki-shi
Hyogo-ken / JP
[N/P]
Former [1998/31]For all designated states
MEC CO., Ltd.
No. 1, Higashihatsushima-cho
Amagasaki-shi, Hyogo-ken / JP
Inventor(s)01 / Maki, Yoshiro
c/o Mec Co., Ltd., No. 1, Higashihatsushima-cho
Amagasaki-shi, Hyogo-ken / JP
02 / Nakagawa, Toshiko
c/o Mec Co., Ltd., No. 1, Higashihatsushima-cho
Amagasaki-shi, Hyogo-ken / JP
03 / Yamada, Yasushi
c/o Mec Co., Ltd., No. 1, Higashihatsushima-cho
Amagasaki-shi, Hyogo-ken / JP
04 / Haruta, Takashi
c/o Mec Co., Ltd., No. 1, Higashihatsushima-cho
Amagasaki-shi, Hyogo-ken / JP
05 / Arimura, Maki
c/o Mec Co., Ltd., No. 1, Higashihatsushima-cho
Amagasaki-shi, Hyogo-ken / JP
[1998/31]
Representative(s)Wächtershäuser, Günter
Wächtershäuser & Hartz
Patentanwälte
Ottostrasse 4
80333 München / DE
[N/P]
Former [1998/31]Wächtershäuser, Günter, Prof. Dr.
Patentanwalt, Tal 29
80331 München / DE
Application number, filing date97101218.227.01.1997
[1998/31]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0855454
Date:29.07.1998
Language:EN
[1998/31]
Type: B1 Patent specification 
No.:EP0855454
Date:25.09.2002
Language:EN
[2002/39]
Search report(s)(Supplementary) European search report - dispatched on:EP01.07.1997
ClassificationIPC:C23F1/18
[1998/31]
CPC:
H05K3/383 (EP,US); C23F1/18 (EP,US); H05K2203/121 (EP,US);
H05K2203/125 (EP,US); H05K3/064 (EP,US); H05K3/28 (EP,US);
H05K3/382 (EP,US); H05K3/4611 (EP,US) (-)
Designated contracting statesBE,   DE,   FR,   GB,   IT,   NL [1998/31]
TitleGerman:Zusammensetzung zum Mikroätzen von Kupfer und Kupferlegierungen[1998/31]
English:Microetching composition for copper or copper alloy[1998/31]
French:Composition pour la micro-gravure du cuivre ou ses alliages[1998/31]
Examination procedure23.12.1998Examination requested  [1999/09]
10.12.1999Despatch of a communication from the examining division (Time limit: M06)
16.06.2000Reply to a communication from the examining division
31.01.2002Despatch of communication of intention to grant (Approval: Yes)
18.04.2002Communication of intention to grant the patent
18.06.2002Fee for grant paid
18.06.2002Fee for publishing/printing paid
Opposition(s)26.06.2003No opposition filed within time limit [2003/38]
Fees paidRenewal fee
29.01.1999Renewal fee patent year 03
28.01.2000Renewal fee patent year 04
05.01.2001Renewal fee patent year 05
18.12.2001Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]JPH0677095  ;
 [A]JPS6379983  ;
 [X]US4695348  (BATTEY JAMES F [US], et al) [X] 1 * column 3, line 1 - line 8 * * column 4, line 51 - line 55 * * column 6; claims 9,11 *
 [X]  - PATENT ABSTRACTS OF JAPAN, (19940620), vol. 018, no. 324, Database accession no. (E - 1564), & JP06077095 A 19940318 (ASAHI GLASS CO LTD;OTHERS: 01) [X] 1,6 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19880819), vol. 012, no. 306, Database accession no. (C - 522), & JP63079983 A 19880409 (SUMITOMO SPECIAL METALS CO LTD;OTHERS: 01) [A] 1,4,5 * abstract *
by applicantUS4956035
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.