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Extract from the Register of European Patents

EP About this file: EP0790633

EP0790633 - Method of operating an electron source [Right-click to bookmark this link]
Former [1997/34]Electron source and electron beam-emitting apparatus equipped therewith
[2001/18]
StatusNo opposition filed within time limit
Status updated on  22.11.2002
Database last updated on 23.09.2024
Most recent event   Tooltip22.11.2002No opposition filed within time limitpublished on 08.01.2003  [2003/02]
Applicant(s)For all designated states
Hitachi, Ltd.
6, Kanda Surugadai 4-chome
Chiyoda-ku
Tokyo 101 / JP
[N/P]
Former [2002/03]For all designated states
Hitachi, Ltd.
6, Kanda Surugadai 4-chome
Chiyoda-ku, Tokyo 101 / JP
Former [1997/34]For all designated states
HITACHI, LTD.
6, Kanda Surugadai 4-chome
Chiyoda-ku, Tokyo 101 / JP
Inventor(s)01 / Fukuhara, Satoru
397-12, Inada
Hitachinaka-shi, Ibaraki 312 / JP
[1997/34]
Representative(s)Strehl Schübel-Hopf & Partner
Maximilianstrasse 54
80538 München / DE
[N/P]
Former [1997/34]Strehl Schübel-Hopf Groening & Partner
Maximilianstrasse 54
80538 München / DE
Application number, filing date97101980.707.02.1997
[1997/34]
Priority number, dateJP1996004966614.02.1996         Original published format: JP 4966696
[1997/34]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0790633
Date:20.08.1997
Language:EN
[1997/34]
Type: A3 Search report 
No.:EP0790633
Date:08.07.1998
[1998/28]
Type: B1 Patent specification 
No.:EP0790633
Date:16.01.2002
Language:EN
[2002/03]
Search report(s)(Supplementary) European search report - dispatched on:EP22.05.1998
ClassificationIPC:H01J37/073, H01J1/30
[1997/34]
CPC:
H01J37/06 (EP,US); H01J2237/06316 (EP,US)
Designated contracting statesDE,   FR,   GB [1997/34]
TitleGerman:Verfahren zum Betreiben einer Elektronenquelle[2001/18]
English:Method of operating an electron source[2001/18]
French:Procédé de mise en oeuvre d'une source d'électrons[2001/18]
Former [1997/34]Elektronenquelle und Elektronenstrahlgerät mit einer solchen Elektronenquelle
Former [1997/34]Electron source and electron beam-emitting apparatus equipped therewith
Former [1997/34]Source d'électrons et dispositif à faisceau d'électrons utilisant une telle source
Examination procedure28.12.1998Examination requested  [1999/09]
08.07.1999Despatch of a communication from the examining division (Time limit: M06)
10.01.2000Reply to a communication from the examining division
03.01.2001Despatch of a communication from the examining division (Time limit: M04)
26.02.2001Reply to a communication from the examining division
29.03.2001Despatch of communication of intention to grant (Approval: Yes)
19.07.2001Communication of intention to grant the patent
18.10.2001Fee for grant paid
18.10.2001Fee for publishing/printing paid
Opposition(s)17.10.2002No opposition filed within time limit [2003/02]
Fees paidRenewal fee
23.02.1999Renewal fee patent year 03
17.02.2000Renewal fee patent year 04
20.02.2001Renewal fee patent year 05
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Documents cited:Search[XA]US5449968  (TERUI YOSINORI [JP], et al) [X] 1,2 * column 1, lines 12-38; figures 1-3 * * claims 1,3,4 * [A] 3;
 [A]EP0696043  (HITACHI LTD [JP]) [A] 1-3 * the whole document *;
 [A]US3846663  (KOMODA T) [A] 1,2 * column W *;
 [DA]US4324999  (WOLFE JOHN E) [DA] 1,2 * column W *;
 [A]JPH0836981  ;
 [PA]JPH08171879
 [A]  - PATENT ABSTRACTS OF JAPAN, (19960206), vol. 096, no. 006, & JP08036981 A 00000000 (DENKI KAGAKU KOGYO KK) [A] 1,2 * abstract *
 [PA]  - PATENT ABSTRACTS OF JAPAN, (19960702), vol. 096, no. 011, & JP08171879 A 00000000 (HITACHI LTD) [PA] * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.