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Extract from the Register of European Patents

EP About this file: EP0805481

EP0805481 - Operating method for vacuum processing apparatus [Right-click to bookmark this link]
Former [1997/45]Vacuum processing apparatus and operating method therefor
[2005/29]
StatusNo opposition filed within time limit
Status updated on  27.04.2007
Database last updated on 11.05.2024
Most recent event   Tooltip27.04.2007No opposition filed within time limitpublished on 30.05.2007  [2007/22]
Applicant(s)For all designated states
Hitachi, Ltd.
6, Kanda Surugadai 4-chome
Chiyoda-ku
Tokyo 101 / JP
[N/P]
Former [2006/25]For all designated states
Hitachi, Ltd.
6, Kanda Surugadai 4-chome Chiyoda-ku
Tokyo 101 / JP
Former [1997/45]For all designated states
HITACHI, LTD.
6, Kanda Surugadai 4-chome
Chiyoda-ku, Tokyo 101 / JP
Inventor(s)01 / Kato, Shigekazu
12-4 3-chome, Toyo
Kudamatsu-shi, Yamaguchi-Ken / JP
02 / Nishihata, Kouji
6-37, 3-chome, Toishi
Tokuyama-Ken / JP
03 / Tsubone, Tsunehiko
1-47, Iwagari-Cho
Hikari-Shi, Yamaguchi-Ken / JP
04 / Itou, Atsushi
499-3, Ikunoya
Kudamatsu-Shi, Yamaguchi-Ken / JP
[1997/45]
Representative(s)Paget, Hugh Charles Edward, et al
Mewburn Ellis LLP
City Tower
40 Basinghall Street
London EC2V 5DE / GB
[N/P]
Former [1997/45]Paget, Hugh Charles Edward, et al
MEWBURN ELLIS York House 23 Kingsway
London WC2B 6HP / GB
Application number, filing date97111628.019.08.1991
[1997/45]
Priority number, dateJP1990022532129.08.1990         Original published format: JP 22532190
[1997/45]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0805481
Date:05.11.1997
Language:EN
[1997/45]
Type: A3 Search report 
No.:EP0805481
Date:20.05.1998
[1998/21]
Type: B1 Patent specification 
No.:EP0805481
Date:21.06.2006
Language:EN
[2006/25]
Search report(s)(Supplementary) European search report - dispatched on:EP06.04.1998
ClassificationIPC:H01L21/00, C23C14/56
[1997/45]
CPC:
H01L21/67748 (EP,US); H01L21/304 (KR); B01J3/006 (EP,US);
B41J2/36 (EP,US); B41J2/365 (EP,US); C23C14/564 (EP,US);
H01L21/67028 (EP,US); H01L21/67167 (EP,US); H01L21/67253 (EP,US);
H01L21/67736 (EP,US); Y10S134/902 (EP,US); Y10S414/137 (EP,US);
Y10S414/139 (EP,US); Y10S414/14 (EP,US) (-)
Designated contracting statesDE,   FR,   GB [1997/45]
TitleGerman:Arbeitsverfahren für Vakuumbehandlungsvorrichtung[2005/29]
English:Operating method for vacuum processing apparatus[2005/29]
French:Méthode d'opération d'un dispositif de traitement sous vide[2005/29]
Former [1997/45]Vakuumbehandlungsvorrichtung und Arbeitsverfahren dafür
Former [1997/45]Vacuum processing apparatus and operating method therefor
Former [1997/45]Dispositif de traitement sous vide et sa méthode d'opération
Examination procedure28.07.1997Examination requested  [1997/45]
20.12.1999Despatch of a communication from the examining division (Time limit: M06)
24.05.2000Reply to a communication from the examining division
15.11.2000Despatch of a communication from the examining division (Time limit: M06)
03.05.2001Reply to a communication from the examining division
11.06.2001Despatch of a communication from the examining division (Time limit: M04)
19.10.2001Reply to a communication from the examining division
10.04.2002Despatch of communication that the application is refused, reason: substantive examination {1}
14.07.2004Despatch of a communication from the examining division (Time limit: M06)
20.12.2004Reply to a communication from the examining division
07.07.2005Communication of intention to grant the patent
06.10.2005Fee for grant paid
06.10.2005Fee for publishing/printing paid
Appeal following examination24.05.2002Appeal received No.  T0642/02
24.05.2002Statement of grounds filed
24.06.2004Interlocutory revision of appeal
24.06.2004Result of appeal procedure: continuation of examination procedure
Parent application(s)   TooltipEP91307625.3  / EP0475604
Divisional application(s)EP00121401.4  / EP1079418
EP00121402.2  / EP1076354
EP02022861.5   Application deemed to be withdrawn  : 15.11.2002
EP98106162.5  / EP0856875
Opposition(s)22.03.2007No opposition filed within time limit [2007/22]
Fees paidRenewal fee
28.07.1997Renewal fee patent year 03
28.07.1997Renewal fee patent year 04
28.07.1997Renewal fee patent year 05
28.07.1997Renewal fee patent year 06
28.07.1997Renewal fee patent year 07
21.08.1998Renewal fee patent year 08
23.08.1999Renewal fee patent year 09
22.08.2000Renewal fee patent year 10
22.08.2001Renewal fee patent year 11
22.08.2002Renewal fee patent year 12
22.08.2003Renewal fee patent year 13
24.08.2004Renewal fee patent year 14
23.08.2005Renewal fee patent year 15
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Documents cited:Search[X]US4836905  (DAVIS CECIL J [US], et al) [X] 1 * column 23, line 65 - column 24, line 35; figure 9 *;
 [A]WO8707309  (NOVELLUS SYSTEMS INC [US]) [A] 1,5 * page 3, line 6 - page 4, line 14; figure 2 *;
 [A]JPS61250185
 [A]  - PATENT ABSTRACTS OF JAPAN, (19870331), vol. 11, no. 101, Database accession no. (C - 413), & JP61250185 A 19861107 (ANELVA CORP) [A] 1 * abstract *
ExaminationJPH0226229U
 EP0367423
 JPH0265252
 JPS63127125U
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.