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EP0841561
European procedure
Extract from the Register of European Patents
EP About this file: EP0841561
| EP0841561 - Method for the production of a sensor with a metal electrode in a MOS device [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 04.01.2002 Database last updated on 03.06.2024 | Most recent event Tooltip | 04.01.2002 | No opposition filed within time limit | published on 20.02.2002 [2002/08] | Applicant(s) | For all designated states Micronas GmbH Hans-Bunte-Strasse 19 79108 Freiburg i. Br. / DE | [N/P] |
| Former [2000/27] | For all designated states Micronas GmbH Hans-Bunte-Strasse 19 79108 Freiburg / DE | ||
| Former [1998/20] | For all designated states Micronas Intermetall GmbH Hans-Bunte-Strasse 19 79108 Freiburg / DE | Inventor(s) | 01 /
Igel, Günter, Dipl.-Ing. Scharnhorst-Strasse 32 79331 Teningen / DE | 02 /
Gahle, Günter, Dr.-Ing. Panorama-Strasse 13 79312 Emmendingen / DE | [1998/20] | Application number, filing date | 97117232.5 | 06.10.1997 | [1998/20] | Priority number, date | DE1996141777 | 10.10.1996 Original published format: DE 19641777 | [1998/20] | Filing language | DE | Procedural language | DE | Publication | Type: | A2 Application without search report | No.: | EP0841561 | Date: | 13.05.1998 | Language: | DE | [1998/20] | Type: | A3 Search report | No.: | EP0841561 | Date: | 25.11.1998 | [1998/48] | Type: | B1 Patent specification | No.: | EP0841561 | Date: | 28.02.2001 | Language: | DE | [2001/09] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 12.10.1998 | Classification | IPC: | G01N27/12, G01N27/414 | [1998/48] | CPC: |
G01N27/414 (EP,US)
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| Former IPC [1998/20] | G01N27/12 | Designated contracting states | DE, FR, GB, IT, NL [1999/31] |
| Former [1998/20] | AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Verfahren zum Herstellen eines Sensors mit einer Metallelektrode in einer MOS-Anordnung | [1998/20] | English: | Method for the production of a sensor with a metal electrode in a MOS device | [1998/20] | French: | Méthode pour la fabrication d'un capteur avec une électrode en métal dans un dispositif MOS | [1998/20] | Examination procedure | 25.05.1999 | Examination requested [1999/29] | 09.12.1999 | Request for accelerated examination filed | 16.08.2000 | Despatch of communication of intention to grant (Approval: Yes) | 16.08.2000 | Decision about request for accelerated examination - accepted: Yes | 01.09.2000 | Communication of intention to grant the patent | 11.12.2000 | Fee for grant paid | 11.12.2000 | Fee for publishing/printing paid | Opposition(s) | 29.11.2001 | No opposition filed within time limit [2002/08] | Fees paid | Renewal fee | 02.11.1999 | Renewal fee patent year 03 | 31.10.2000 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US4209796 (SENTURIA STEPHEN D [US]) [A] 1-10 * abstract ** column 4, line 34 - column 5, line 30; figure 1 *; | [A]US4936956 (WRIGHTON MARK S [US]) [A] 1-10 * abstract * * column 3, line 26 - column 4, line 10; figure 1 *; | [A]US5393401 (KNOLL MEINHARD [DE]) [A] 1-10 * abstract * * column 5, line 52 - column 7, line 13; figures 1,4 * |