-
EP0837315
European procedure
- EP About this file
- EP Legal status
- EP Federated register
- EP Event history
- EP Citations
- EP Patent family
- EP All documents
Extract from the Register of European Patents
EP About this file: EP0837315
| EP0837315 - In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipment [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 12.10.2001 Database last updated on 31.08.2024 | Most recent event Tooltip | 12.10.2001 | Application deemed to be withdrawn | published on 28.11.2001 [2001/48] | Applicant(s) | For all designated states Insitec, Inc. 2110 Omega Road, Suite D San Ramon, CA 94583 / US | [1998/17] | Inventor(s) | 01 /
Bonon, Michael P. 5195 Bianca Way Livermore, CA 94550 / US | 02 /
Holve, Donald J. 26 Bobbie Court Danville, CA 945260 / US | [1998/17] | Representative(s) | Isarpatent Patent- und Rechtsanwälte Barth Charles Hassa Peckmann & Partner mbB Friedrichstrasse 31 80801 München / DE | [N/P] |
| Former [1998/17] | Reinhard - Skuhra - Weise & Partner Friedrichstrasse 31 80801 München / DE | Application number, filing date | 97118147.4 | 20.10.1997 | [1998/17] | Priority number, date | US19960735383 | 21.10.1996 Original published format: US 735383 | [1998/17] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0837315 | Date: | 22.04.1998 | Language: | EN | [1998/17] | Type: | A3 Search report | No.: | EP0837315 | Date: | 27.09.2000 | [2000/39] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 05.06.2000 | Classification | IPC: | G01N15/02 | [1998/17] | CPC: |
G01N15/0205 (EP,US)
| Designated contracting states | [2001/24] |
| Former [1998/17] | AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | In situ Sensor zur Nahwaferteilchenüberwachung in Halbleitervorrichtungsproduktionsgerät | [1998/17] | English: | In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipment | [1998/17] | French: | Capteur in situ pour la surveillance des particules auprès d'une tranche semi-conductrice dans l'équipement d'usinage des dispositifs semi-conducteurs | [1998/17] | Examination procedure | 01.11.2000 | Application deemed to be withdrawn, date of legal effect [2001/48] | 13.06.2001 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2001/48] | Fees paid | Renewal fee | 04.10.1999 | Renewal fee patent year 03 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 17.05.2001 | DE M01 Not yet paid | 17.05.2001 | FR M01 Not yet paid | 17.05.2001 | GB M01 Not yet paid | Penalty fee Rule 85b EPC 1973 | 17.05.2001 | M01 Not yet paid | Additional fee for renewal fee | 31.10.2000 | 04 M06 Not yet paid |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]US5015094 (OKA KOICHI [JP], et al) [Y] 1,13 * column 1, lines 1-15 * * column 6, lines 26-53; figure 3 *; | [Y]US4927268 (CARR ROBERT [GB], et al) [Y] 1,13 * column 6, lines 14-20; figure 5 *; | [A]US5502561 (HUTCHINS DARRELL K [US], et al) [A] 1,13 * column 8, lines 14-53; figure 2B *; | [A]US5257087 (FURUYA YOSHIYUKI [JP]) [A] 18,25-27 * column 1, lines 5-16 * * column 2, line 66 - column 3, line 51 *; | [XA]US4827144 (ZAITSU YASUSHI [JP], et al) [X] 1-3,5,7,9,12-14,16 * column 5, line 30 - column 6, line 7; figure 6 * * column 6, line 50 - column 7, line 16 * [A] 18,25-27; | [XA]US4885473 (SHOFNER FREDERICK M [US], et al) [X] 1 * column 3, lines 9-58 * * column 4, line 64 - column 5, line 56; figure 5 * [A] 18,25; | [XA]US3858851 (OGLE HUGH MALCOLM) [X] 1 * column 1, lines 25-60 * [A] 18,25; | [X]US5255089 (DYBAS DAVID E [US], et al) [X] 18,19,22,25,32 * column 1, lines 14-19 * * column 4, lines 5-31 * * column 5, lines 27-36 *; | [A]US5294806 (BATCHELDER JOHN S [US], et al) [A] 18,22-25 * column 1, lines 10-38 * * column 2, lines 29-43 *; | [A]EP0316093 (KOWA CO [JP]) [A] 1,25,28,33 * abstract * |