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EP0856594
European procedure
Extract from the Register of European Patents
EP About this file: EP0856594
| EP0856594 - Apparatus for plasma treatment of substrates [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 19.04.2002 Database last updated on 24.08.2024 | Most recent event Tooltip | 17.05.2002 | Lapse of the patent in a contracting state | published on 03.07.2002 [2002/27] | Applicant(s) | For all designated states Strämke, Siegfried, Dr. Fichtenhain 6 D-52538 Selfkant / DE | [1998/32] | Inventor(s) | 01 /
see applicant ... | [1998/32] | Representative(s) | dompatent von Kreisler Selting Werner - Partnerschaft von Patent- und Rechtsanwälten mbB Deichmannhaus am Dom Bahnhofsvorplatz 1 50667 Köln / DE | [N/P] |
| Former [1998/32] | Selting, Günther, Dipl.-Ing., et al Patentanwälte von Kreisler, Selting, Werner Postfach 10 22 41 50462 Köln / DE | Application number, filing date | 97123034.7 | 31.12.1997 | [1998/32] | Priority number, date | DE1997200113U | 07.01.1997 Original published format: DE 29700113 U | DE1997212960U | 22.07.1997 Original published format: DE 29712960 U | [1998/32] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0856594 | Date: | 05.08.1998 | Language: | DE | [1998/32] | Type: | B1 Patent specification | No.: | EP0856594 | Date: | 13.06.2001 | Language: | DE | [2001/24] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 27.04.1998 | Classification | IPC: | C23C16/02, C23C14/02, C23C16/56, C23C14/58, C23C16/44, C23C14/22 | [1998/32] | CPC: |
C23C14/5886 (EP,US);
C23C14/02 (EP,US);
C23C14/566 (EP,US);
C23C16/0254 (EP,US);
C23C16/56 (EP,US);
C23C8/36 (EP,US);
H01L21/67017 (EP,US)
(-)
| Designated contracting states | DE, ES, FR, GB, IT, PT [1999/16] |
| Former [1998/32] | AT, BE, CH, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Vorrichtung zur Plasma-Oberflächenbehandlung von Werkstücken | [1998/32] | English: | Apparatus for plasma treatment of substrates | [1998/32] | French: | Appareil de traitement de substrats par plasma | [1998/32] | Examination procedure | 04.02.1999 | Examination requested [1999/14] | 06.02.1999 | Loss of particular rights, legal effect: designated state(s) | 01.07.1999 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, DK, FI, GR, IE, LI, LU, MC, NL, SE | 01.12.1999 | Despatch of a communication from the examining division (Time limit: M04) | 01.04.2000 | Reply to a communication from the examining division | 01.08.2000 | Despatch of communication of intention to grant (Approval: Yes) | 06.12.2000 | Communication of intention to grant the patent | 23.01.2001 | Fee for grant paid | 23.01.2001 | Fee for publishing/printing paid | Opposition(s) | 14.03.2002 | No opposition filed within time limit [2002/23] | Fees paid | Renewal fee | 23.12.1999 | Renewal fee patent year 03 | 21.12.2000 | Renewal fee patent year 04 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 30.03.1999 | AT M01 Not yet paid | 30.03.1999 | BE M01 Not yet paid | 30.03.1999 | CH M01 Not yet paid | 30.03.1999 | DK M01 Not yet paid | 30.03.1999 | FI M01 Not yet paid | 30.03.1999 | GR M01 Not yet paid | 30.03.1999 | IE M01 Not yet paid | 30.03.1999 | LU M01 Not yet paid | 30.03.1999 | MC M01 Not yet paid | 30.03.1999 | NL M01 Not yet paid | 30.03.1999 | SE M01 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | PT | 17.09.2001 | [2002/27] | Documents cited: | Search | [XA]JPH0353063 ; | [A]DE2900724 (SIEMENS AG) [A] 1-7* page 8, line 8 - page 9, line 10 *; | [A]DE4336919 (ANLIKER MARKUS [DE]) [A] 1-7 * claims 1-6 * | [XA] - PATENT ABSTRACTS OF JAPAN, (19910521), vol. 015, no. 197, Database accession no. (C - 0833), & JP03053063 A 19910307 (DAINIPPON PRINTING CO LTD) [X] 1,2 * abstract * [A] 3-7 |