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Extract from the Register of European Patents

EP About this file: EP0839930

EP0839930 - Apparatus for vacuum line cleaning in substrate processing equipment [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  13.02.2004
Database last updated on 03.10.2024
Most recent event   Tooltip11.01.2008Lapse of the patent in a contracting state
New state(s): IT		published on 13.02.2008  [2008/07]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
M/S 2061
Santa Clara, California 95054-3299 / US
[N/P]
Former [1998/19]For all designated states
APPLIED MATERIALS, INC.
3050 Bowers Avenue, M/S 2061
Santa Clara, California 95054-3299 / US
Inventor(s)01 / Pang, Ben
6211 Mathieu Avenue
Oakland, California 94618 / US
02 / Cheung, David
235 Billingsgate Lane
Foster City, California 94404 / US
03 / Taylor, William N., Jr.
6977 Maple Drive
Dublin, California 94568 / US
04 / Raoux, Sebastien
18 Lansing Street No. 304
San Francisco, California 94105 / US
05 / Fodor, Mark
107 Oak Rim Court No. 29
Los Gatos, California 95032 / US
[1998/19]
Representative(s)Kirschner, Klaus Dieter, et al
Puschmann Borchert Bardehle
Patentanwälte Partnerschaft
Postfach 10 12 31
80086 München / DE
[N/P]
Former [2000/35]Kirschner, Klaus Dieter, Dipl.-Phys., et al
Schneiders & Behrendt Rechtsanwälte - Patentanwälte Sollner Strasse 38
81479 München / DE
Former [1998/19]Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT, 27 Furnival Street
London EC4A 1PQ / GB
Application number, filing date97308660.629.10.1997
[1998/19]
Priority number, dateUS1996074123030.10.1996         Original published format: US 741230
[1998/19]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0839930
Date:06.05.1998
Language:EN
[1998/19]
Type: B1 Patent specification 
No.:EP0839930
Date:09.04.2003
Language:EN
[2003/15]
Search report(s)(Supplementary) European search report - dispatched on:EP11.03.1998
ClassificationIPC:C23C16/44, B01D45/06, B01D53/46, B01D53/32
[1998/19]
CPC:
B01J19/08 (EP,US); H01L21/304 (KR); B01D45/06 (EP,US);
B01D53/32 (EP,US); B01D53/46 (EP,US); B01J19/088 (EP,US);
B01J19/126 (EP,US); B01J19/249 (EP,US); C23C16/4405 (EP,US);
C23C16/4412 (EP,US); H01J37/3244 (EP,US); H01J37/32844 (EP,US);
H05H1/46 (EP,US); H05H1/4622 (EP,US); H05H1/4652 (EP,US);
B01D2257/206 (EP,US); B01D2259/818 (EP,US); B01J2219/2453 (EP,US);
B01J2219/2458 (EP,US); B01J2219/2461 (EP,US); B01J2219/2467 (EP,US);
B01J2219/247 (EP,US); B01J2219/2474 (EP,US); B01J2219/2475 (EP,US);
B01J2219/2487 (EP,US); B01J2219/2493 (EP,US); B01J2219/2496 (EP,US);
H01J2237/022 (EP,US); H05H2245/17 (EP,US); Y02C20/30 (EP,US);
Y02P70/50 (EP,US) (-)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1999/03]
Former [1998/19]AT,  BE,  CH,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Reinigungsvorrichtung für Vakuumleitung in einer Substrat-Bearbeitungsvorrichtung[1998/19]
English:Apparatus for vacuum line cleaning in substrate processing equipment[1998/19]
French:Appareil de nettoyage d'un tube à vide dans un dispositif de traitement de substrate[1998/19]
Examination procedure04.11.1998Examination requested  [1998/53]
16.11.1999Despatch of a communication from the examining division (Time limit: M06)
20.06.2000Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
24.08.2000Reply to a communication from the examining division
20.06.2001Despatch of a communication from the examining division (Time limit: M06)
12.11.2001Reply to a communication from the examining division
18.02.2002Despatch of communication of intention to grant (Approval: No)
18.06.2002Despatch of communication of intention to grant (Approval: later approval)
18.06.2002Fee for grant paid
18.06.2002Fee for publishing/printing paid
27.09.2002Communication of intention to grant the patent
Opposition(s)12.01.2004No opposition filed within time limit [2004/14]
Request for further processing for:24.08.2000Request for further processing filed
24.08.2000Full payment received (date of receipt of payment)
Request granted
11.09.2000Decision despatched
Fees paidRenewal fee
09.08.1999Renewal fee patent year 03
25.09.2000Renewal fee patent year 04
30.11.2001Renewal fee patent year 05
31.10.2002Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
31.10.200105   M06   Fee paid on   30.11.2001
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipFR09.04.2003
IT09.04.2003
NL09.04.2003
[2008/07]
Former [2006/14]FR09.04.2003
NL09.04.2003
Former [2004/01]NL09.04.2003
Documents cited:Search[X]EP0289858  (ULVAC CORP [JP]) [X] 1-6 * column 1, line 17 - column 2, line 51 * * column 4, line 43 - column 6, line 17 * * column 11, line 39 - column 13, line 46; figures 1,3-17 *;
 [X]JPH01288355  ;
 [X]US5211729  (SHERMAN ROBERT C [US]) [X] 1,7,8 * column 1, line 11 - line 46 * * column 3, line 50 - column 6, line 39; figures 2-6 *;
 [X]JPH05202474  ;
 [PX]EP0781599  (APPLIED MATERIALS INC [US]) [PX] 1-10 * the whole document *;
 [PX]EP0767254  (APPLIED MATERIALS INC [US]) [PX] 1-3 * the whole document *;
 [PX]DE19601436  (STRAEMKE SIEGFRIED DR ING [DE]) [PX] 1-3 * column 1, line 59 - column 4, line 41; figure .; claims 1-22 *;
 [PX]JPH0910544  ;
 [A]EP0296720  (CHIU KIN CHUNG RAY) [A] 4-6 * page 3, line 19 - line 56; figures 1-5; claims 1-10 *;
 [A]JPH02125876  ;
 [A]DE4319118  (BREITBARTH FRIEDRICH WILHELM D [DE], et al) [A] 4-6 * the whole document *
 [X]  - DATABASE WPI, 1, Derwent World Patents Index, vol. 90, no. 01, Database accession no. 90-004633, XP002055384 & JPH01288355 A 19891120 (MASUDA S) [X] 1,2 * abstract *
 [X]  - PATENT ABSTRACTS OF JAPAN, (19931130), vol. 017, no. 644, Database accession no. (C - 1134), & JP05202474 A 19930810 (HITACHI ELECTRON ENG CO LTD) [X] 1,2 * abstract *
 [PX]  - DATABASE WPI, 1, Derwent World Patents Index, vol. 97, no. 12, Database accession no. 97-126931, XP002055385 & JPH0910544 A 19970114 (APLHATECH KK) [PX] 1-8 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19900724), vol. 014, no. 342, Database accession no. (C - 0743), & JP02125876 A 19900514 (FUJITSU LTD) [A] 4-6 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.