EP0938595 - PROCESS AND DEVICE FOR COATING SUBSTRATES BY GAS FLOW SPUTTERING [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 10.10.2003 Database last updated on 05.07.2024 | Most recent event Tooltip | 22.08.2008 | Change - representative | published on 24.09.2008 [2008/39] | Applicant(s) | For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27c 80686 München / DE | [N/P] |
Former [2003/47] | For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hansastrasse 27 c 80686 München / DE | ||
Former [1999/35] | For all designated states FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. Leonrodstrasse 54 80636 München / DE | Inventor(s) | 01 /
JUNG, Thomas Hondelager Strasse 6 a D-38110 Braunschweig / DE | 02 /
MEYER, Rolf Am Alten Petritore 7 D-38100 Braunschweig / DE | [1999/35] | Representative(s) | Einsel, Martin Patentanwälte Einsel & Kollegen Jasperallee 1a 38102 Braunschweig / DE | [2008/39] |
Former [1999/35] | Einsel, Martin, Dipl.-Phys. Patentanwalt, Jasperallee 1A 38102 Braunschweig / DE | Application number, filing date | 97942905.7 | 02.09.1997 | [1999/35] | WO1997EP04777 | Priority number, date | DE19961035669 | 03.09.1996 Original published format: DE 19635669 | [1999/35] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | WO9810114 | Date: | 12.03.1998 | Language: | DE | [1998/10] | Type: | A1 Application with search report | No.: | EP0938595 | Date: | 01.09.1999 | Language: | DE | The application published by WIPO in one of the EPO official languages on 12.03.1998 takes the place of the publication of the European patent application. | [1999/35] | Type: | B1 Patent specification | No.: | EP0938595 | Date: | 04.12.2002 | Language: | DE | [2002/49] | Search report(s) | International search report - published on: | EP | 12.03.1998 | Classification | IPC: | C23C14/34, H01J37/34 | [1999/35] | CPC: |
C23C14/228 (EP);
C23C14/34 (EP);
H01J37/34 (EP);
H01J37/342 (EP)
| Designated contracting states | DE, FR, GB, NL [1999/35] | Title | German: | VERFAHREN UND VORRICHTUNG ZUR BESCHICHTUNG VON SUBSTRATEN MITTELS GASFLUSSSPUTTERN | [1999/35] | English: | PROCESS AND DEVICE FOR COATING SUBSTRATES BY GAS FLOW SPUTTERING | [1999/35] | French: | PROCEDE ET DISPOSITIF POUR L'ENDUCTION DE SUBSTRATS PAR PULVERISATION D'UN FLUX GAZEUX | [1999/35] | Entry into regional phase | 04.03.1999 | National basic fee paid | 04.03.1999 | Designation fee(s) paid | 04.03.1999 | Examination fee paid | Examination procedure | 28.03.1998 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 04.03.1999 | Examination requested [1999/35] | 27.02.2002 | Despatch of communication of intention to grant (Approval: Yes) | 03.07.2002 | Communication of intention to grant the patent | 12.09.2002 | Fee for grant paid | 12.09.2002 | Fee for publishing/printing paid | Opposition(s) | 05.09.2003 | No opposition filed within time limit [2003/48] | Fees paid | Renewal fee | 04.03.1999 | Renewal fee patent year 03 | 21.11.2000 | Renewal fee patent year 04 | 26.09.2001 | Renewal fee patent year 05 | 20.09.2002 | Renewal fee patent year 06 | Penalty fee | Additional fee for renewal fee | 30.09.2000 | 04   M06   Fee paid on   21.11.2000 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [AD]DD294511 (AKAD WISSENSCHAFTEN DDR [DE]) [AD] 1-21 * page 3, line 41 - page 4, line 9 *; | [AD]DE4210125 (FRAUNHOFER GES FORSCHUNG [DE]) [AD] 1-21 * column 1, line 61 - column 2, line 5 *; | [A]US4716340 (LEE KON J [US], et al) [A] 1-21 * column 3, line 23 - line 37 *; | [A]US3922214 (VAN CAKENBERGHE JEAN L) [A] 1-21 * the whole document *; | [A]US5490910 (NELSON CARL W [US], et al) [A] 9 * column 8, line 19 - column 10, line 14; figure 5 * | [X] - MATSUOKA M ET AL, "OXIDE FILM DEPOSITION BY RADIO FREQUENCY SPUTTERING WITH ELECTRON CYCLOTRON RESONANCE PLASMA STIMULATION", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A, (19950901), vol. 13, no. 5, pages 2427 - 2434, XP000550440 [X] 1,6-8 * paragraph [00II] * DOI: http://dx.doi.org/10.1116/1.579484 |