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Extract from the Register of European Patents

EP About this file: EP0881265

EP0881265 - Mildew resistant organopolysiloxane compositions [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  06.08.2004
Database last updated on 15.06.2024
Most recent event   Tooltip06.08.2004No opposition filed within time limitpublished on 22.09.2004  [2004/39]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Otemachi 2-chome Chiyoda-ku
Tokyo / JP
[N/P]
Former [1998/49]For all designated states
SHIN-ETSU CHEMICAL CO., LTD.
6-1, Ohtemachi 2-chome
Chiyoda-ku Tokyo / JP
Inventor(s)01 / Sakamoto, Takafumi, c/o Silicone Denshi Zairyo
Cijutsu Kenkyusho Shin-Etsu Ch.Co.Ltd. 1-10 Hitomi
Ohaza Matsuida-machi Usui-gun, Gunma-ken / JP
02 / Sato, Tokuo, c/o Silicone Denshi Zairyo
Cijutsu Kenkyusho Shin-Etsu Ch.Co.Ltd. 1-10 Hitomi
Ohaza Matsuida-machi Usui-gun, Gunma-ken / JP
[1998/49]
Representative(s)Tönhardt, Marion
Boehmert & Boehmert
Anwaltspartnerschaft mbB
Patentanwälte Rechtsanwälte
Pettenkoferstrasse 20-22
80336 München / DE
[N/P]
Former [2001/27]Tönhardt, Marion, Dr.
Forrester & Boehmert, Franz-Joseph-Strasse 38
80801 München / DE
Former [1998/49]Klöpsch, Gerald, Dr.-Ing. Patentanwalt
Boehmert & Boehmert Anwaltssozietät, Benrather Schlossallee 53
40597 Düsseldorf / DE
Application number, filing date98109923.729.05.1998
[1998/49]
Priority number, dateJP1997015787330.05.1997         Original published format: JP 15787397
[1998/49]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0881265
Date:02.12.1998
Language:EN
[1998/49]
Type: A3 Search report 
No.:EP0881265
Date:16.06.1999
[1999/24]
Type: B1 Patent specification 
No.:EP0881265
Date:01.10.2003
Language:EN
[2003/40]
Search report(s)(Supplementary) European search report - dispatched on:EP07.05.1999
ClassificationIPC:C08L83/04, C08K13/00, C08K5/3472
[1999/24]
CPC:
C08K5/3472 (EP,US); C08K5/0058 (EP,US); C08K5/378 (EP,US)
C-Set:
C08K5/0058, C08L83/04 (EP,US);
C08K5/3472, C08L83/04 (US,EP);
C08K5/378, C08L83/04 (US,EP)
Former IPC [1998/49]C08L83/04, C08K13/00
Designated contracting statesDE,   FR,   GB [2000/08]
Former [1998/49]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Gegen Schimmel beständige Organopolysiloxanzusammensetzungen[1998/49]
English:Mildew resistant organopolysiloxane compositions[1998/49]
French:Compositions d'organopolysiloxane résistant aux moisissures[1998/49]
Examination procedure18.11.1999Examination requested  [2000/03]
20.12.2001Despatch of a communication from the examining division (Time limit: M06)
18.06.2002Reply to a communication from the examining division
20.01.2003Communication of intention to grant the patent
14.05.2003Fee for grant paid
14.05.2003Fee for publishing/printing paid
Opposition(s)02.07.2004No opposition filed within time limit [2004/39]
Fees paidRenewal fee
15.05.2000Renewal fee patent year 03
14.05.2001Renewal fee patent year 04
14.05.2002Renewal fee patent year 05
13.05.2003Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:SearchJPH02306907  [ ] (HOKKO CHEM IND CO, et al);
 [D]JPH0640821  (TOSHIBA SILICONE);
 [Y]EP0585587  (TOSHIBA SILICONE [JP]) [Y] 1-12 * page 3, line 3 - line 6 * * page 3, line 43 - line 46 * * page 4, line 39 - page 5, line 11 * * page 5, line 15 - line 16 * * page 5, line 47 * * page 7, line 34 - page 8, line 11 * * examples 1,3 * * claim 1 *;
 JPH0925410  [ ] (SHINETSU CHEMICAL CO);
 [Y]  - CHEMICAL ABSTRACTS, (19970421), vol. 126, no. 16, Database accession no. 212841, XP002100460 [Y] 1-12 * abstract *
 [Y]  - CHEMICAL ABSTRACTS, (19910708), vol. 115, no. 1, Database accession no. 3163, XP002100918 [Y] 1-12 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.