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Extract from the Register of European Patents

EP About this file: EP0903774

EP0903774 - Substrate plating apparatus [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  05.12.2008
Database last updated on 03.10.2024
Most recent event   Tooltip05.12.2008No opposition filed within time limitpublished on 07.01.2009  [2009/02]
Applicant(s)For all designated states
EBARA CORPORATION
11-1, Haneda Asahi-cho Ohta-ku
Tokyo / JP
[2008/05]
Former [1999/12]For all designated states
EBARA CORPORATION
11-1, Haneda Asahi-cho
Ohta-ku, Tokyo / JP
Inventor(s)01 / Hongo, Akihisa
46-23 Zenbu-cho, Asahi-ku
Yokohama-shi, Kanagawa-ken / JP
02 / Ogure, Naoaki
5-32-2 Chuo, Nakano-ku
Tokyo / JP
03 / Inoue, Hiroaki
4-17-18 Tamagawagakuen
Machida-shi, Tokyo / JP
04 / Kimura, Norio
1-5-11-408 Kugenumashinmei
Fujisawa-shi, Kanagawa-ken / JP
05 / Kuriyama, Fumio
201, 2833-43 Totsuka-cho, Totsuka-ku
Yokohama-shi, Kanagawa-ken / JP
06 / Tsujimura, Manabu
4-44-8 Sakaechodori, Tsurumi-ku
Yokohama-shi, Kanagawa-ken / JP
07 / Suzuki, Kenichi
1-9-21-104 Inari
Fujisawa-shi, Kanagawa-ken / JP
08 / Chono, Atsushi
1-9-21-104 Inari
Fujisawa-shi, Kanagawa-ken / JP
[1999/12]
Representative(s)Geyer, Ulrich F.
Wagner & Geyer Partnerschaft mbB
Patent- und Rechtsanwälte
Gewürzmühlstrasse 5
80538 München / DE
[N/P]
Former [1999/12]Geyer, Ulrich F., Dr. Dipl.-Phys.
WAGNER & GEYER, Patentanwälte, Gewürzmühlstrasse 5
80538 München / DE
Application number, filing date98117633.217.09.1998
[1999/12]
Priority number, dateJP1997027049317.09.1997         Original published format: JP 27049397
JP1998007137005.03.1998         Original published format: JP 7137098
JP1998009697426.03.1998         Original published format: JP 9697498
JP1998020513821.07.1998         Original published format: JP 20513898
[1999/12]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0903774
Date:24.03.1999
Language:EN
[1999/12]
Type: A3 Search report 
No.:EP0903774
Date:21.01.2004
[2004/04]
Type: B1 Patent specification 
No.:EP0903774
Date:30.01.2008
Language:EN
[2008/05]
Search report(s)(Supplementary) European search report - dispatched on:EP10.12.2003
ClassificationIPC:H01L21/00
[1999/12]
CPC:
C25D17/001 (EP,US); H01L21/00 (KR); H01L21/2885 (EP,US);
H01L21/67051 (EP,US); H01L21/67161 (EP,US); H01L21/67167 (EP,US);
H01L21/67173 (EP,US); H01L21/6719 (EP,US); H01L21/67219 (EP,US);
H01L21/6723 (EP,US); H01L21/76849 (EP,US); H01L21/76877 (EP,US);
H01L21/67126 (EP,US); Y10S134/902 (EP,US) (-)
Designated contracting statesDE,   FR,   GB [2004/42]
Former [1999/12]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Vorrichtung zur Substratbeschichtung[1999/12]
English:Substrate plating apparatus[1999/12]
French:Dispositif de revêtement de substrat[1999/12]
Examination procedure20.07.2004Examination requested  [2004/38]
28.09.2005Despatch of a communication from the examining division (Time limit: M06)
10.04.2006Reply to a communication from the examining division
28.07.2006Despatch of a communication from the examining division (Time limit: M06)
25.01.2007Reply to a communication from the examining division
01.08.2007Communication of intention to grant the patent
11.12.2007Fee for grant paid
11.12.2007Fee for publishing/printing paid
Opposition(s)31.10.2008No opposition filed within time limit [2009/02]
Fees paidRenewal fee
28.09.2000Renewal fee patent year 03
01.10.2001Renewal fee patent year 04
25.09.2002Renewal fee patent year 05
29.09.2003Renewal fee patent year 06
29.09.2004Renewal fee patent year 07
28.09.2005Renewal fee patent year 08
27.09.2006Renewal fee patent year 09
26.09.2007Renewal fee patent year 10
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Documents cited:Search[X]JPH10163208  ;
 [A]US5415890  (KLOIBER ALLAN J [US], et al) [A] 1-10 * abstract * * column 5 *;
 [A]US5092975  (YAMAMURA TAKAYOSHI [JP], et al) [A] 1-10 * abstract *;
 [A]EP0773308  (SPUTTERED FILMS INC [US]) [A] 1-10 * abstract * * column 7 - column 8 *
 [X]  - PATENT ABSTRACTS OF JAPAN, (19980930), vol. 1998, no. 11, & JP10163208 A 19980619 (IND TECHNOL RES INST) [X] 1-10 * abstract * * page 19 - page 20; figures 2,5 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.