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Extract from the Register of European Patents

EP About this file: EP0995227

EP0995227 - A CONTROLLED CLEAVAGE PROCESS [Right-click to bookmark this link]
Status	The application is deemed to be withdrawn Status updated on 10.04.2015 Database last updated on 02.09.2024
Most recent event Tooltip	10.04.2015	Application deemed to be withdrawn	published on 13.05.2015 [2015/20]
Applicant(s)	For all designated states Silicon Genesis Corporation 590 Division Street Campbell, CA 95008 / US
	[2000/17]
Inventor(s)	01 / HENLEY, Francois, J. 24580 Skyland Road Los Gatos, CA 95030 / US
	02 / CHEUNG, Nathan, W. 1145 Stannage Avenue Albany, CA 94706 / US
	[2000/17]
Representative(s)	Clark, Jane Anne, et al Mathys & Squire The Shard 32 London Bridge Street London SE1 9SG / GB
	[N/P]
Former [2007/50]	Clark, Jane Anne, et al Mathys & Squire 120 Holborn London EC1N 2SQ / GB
Former [2000/17]	Kazi, Ilya, et al Mathys & Squire, 100 Gray's Inn Road London WC1X 8AL / GB
Application number, filing date	98924756.4	11.05.1998
	[2000/17]
	WO1998US09567
Priority number, date	US19970046276P	12.05.1997 Original published format: US 46276 P
	US19980026115	19.02.1998 Original published format: US 26115
	US19980026027	19.02.1998 Original published format: US 26027
	[2000/17]
Filing language	EN
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO9852216
	Date:	19.11.1998
	Language:	EN
	[1998/46]
	Type:	A1 Application with search report
	No.:	EP0995227
	Date:	26.04.2000
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 19.11.1998 takes the place of the publication of the European patent application.
	[2000/17]
Search report(s)	International search report - published on:	US	19.11.1998
	(Supplementary) European search report - dispatched on:	EP	18.05.2000
Classification	IPC:	H01L21/304, H01L21/20, H01L21/762, B26F3/00, B26D3/28, H01L21/425	[2000/27]
	CPC:	B26D3/28 (EP); B26F3/00 (EP); B26F3/002 (EP); H01L21/26506 (EP); H01L27/1203 (EP)
	Former IPC [2000/17]	H01L21/425
Designated contracting states	DE, FR, GB, IE, IT, NL [2000/17]
Title	German:	KONTROLLIERTES SPALTUNGSVERFAHREN	[2000/17]
	English:	A CONTROLLED CLEAVAGE PROCESS	[2000/17]
	French:	PROCEDE DE CLIVAGE CONTROLE	[2000/17]
Entry into regional phase	10.12.1999	National basic fee paid
	10.12.1999	Search fee paid
	10.12.1999	Designation fee(s) paid
	10.12.1999	Examination fee paid
Examination procedure	08.12.1998	Request for preliminary examination filed International Preliminary Examining Authority: US
	10.12.1999	Examination requested [2000/17]
	21.09.2007	Despatch of a communication from the examining division (Time limit: M06)
	31.03.2008	Reply to a communication from the examining division
	11.04.2013	Despatch of a communication from the examining division (Time limit: M04)
	21.08.2013	Reply to a communication from the examining division
	02.12.2014	Application deemed to be withdrawn, date of legal effect [2015/20]
	09.01.2015	Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2015/20]
Divisional application(s)	The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 21.09.2007
Fees paid	Renewal fee
	10.12.1999	Renewal fee patent year 03
	20.04.2001	Renewal fee patent year 04
	21.05.2002	Renewal fee patent year 05
	26.05.2003	Renewal fee patent year 06
	04.06.2004	Renewal fee patent year 07
	19.05.2005	Renewal fee patent year 08
	30.05.2006	Renewal fee patent year 09
	30.05.2007	Renewal fee patent year 10
	08.02.2008	Renewal fee patent year 11
	26.05.2009	Renewal fee patent year 12
	27.05.2010	Renewal fee patent year 13
	31.05.2011	Renewal fee patent year 14
	29.05.2012	Renewal fee patent year 15
	29.05.2013	Renewal fee patent year 16
	Penalty fee
	Additional fee for renewal fee
	31.05.2004	07 M06 Fee paid on 04.06.2004
	31.05.2014	17 M06 Not yet paid
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]US4466852 (BELTZ RICHARD K [US], et al) [A] 1,6,7,13,17-23 * column 1, line 6 - line 20 * * column 1, line 58 - column 2, line 33 * * column 3, line 6 - line 33 * * column 5, line 34 - column 6, line 59; figures 6-8 * * column 7, line 12 - line 27 * * column 8, line 27 - line 37 *;
		[YA]EP0397237 (PHILIPS NV [NL]) [Y] 8,9 * column 1, line 1 - line 9 * * column 3, line 47 - column 4, line 35; figures 1-4 * * column 5, line 5 - line 18; figure 6 * * column 5, line 28 - line 35 * [A] 1-7,13,17;
		[A]US5213451 (FRANK WALTER [DE], et al) [A] 1,6,7,13,17-23 * column 1, line 7 - line 12 * * column 2, line 13 - line 43 * * column 2, line 62 - column 3, line 43; figure 1 * * column 4, line 53 - column 5, line 46 *;
		[XY]EP0703609 (COMMISSARIAT ENERGIE ATOMIQUE [FR]) [X] 1-7,10-15,17,18 * column 1, line 5 - line 14 * * column 2, line 38 - column 3, line 24 * * column 3, line 46 - column 4, line 6 * * column 4, line 22 - line 30 * * column 5, line 6 - line 25 * * column 6, line 19 - line 23; figure 1 * * column 6, line 34 - line 56; figure 2 * * column 7, line 9 - line 43; figure 3 * [Y] 8,9;
		[PX]EP0793263 (CANON KK [JP]) [PX] 1-7,10-15,17 * column 1, line 7 - line 36 * * column 6, line 29 - column 7, line 23; figures 17-19 * * column 18, line 15 - column 19, line 36; figures 4-7 * * column 22, line 35 - column 23, line 6 * * column 30, line 50 - column 31, line 19 * * column 44, line 43 - column 45, line 6 *;
		[E]EP0843344 (CANON KK [JP]) [E] 1-7,10-15,17 * column 7, line 26 - column 8, line 27; figures 5A-5C * * column 8, line 36 - line 48 * * column 10, line 16 - line 43 * * column 12, line 10 - column 13, line 2 * * column 13, line 34 - column 14, line 24; figures 1A-1E *;
		[E]EP0867921 (CANON KK [JP]) [E] 1-7,10-15,17 * column 10, line 6 - column 11, line 16; figures 1A-1D * * column 12, line 48 - column 13, line 21 * * column 15, line 39 - column 16, line 13; figure 2D *;
		[A] - LU X ET AL, "SOI MATERIAL TECHNOLOGY USING PLASMA IMMERSION ION IMPLANTATION", PROCEEDINGS OF THE ANNUAL SOS/SOI TECHNOLOGY CONFERENCE. (FROM 1991 PROCEEDINGS OF THE INTERNATIONAL SOI CONFERENCE.) SILICON-ON-INSULATOR TECHNOLOGY AND DEVICES,US,NEW YORK, NY: IEEE, (1996), ISBN 0-7803-3316-0, pages 48 - 49, XP000736841 [A] 1-7,10-17 * the whole document *
	International search	[A]US4982090 (WITTMAACK KLAUS [DE]);
		[A]US5242861 (INABA TAKASHI [JP]);
		[A]US5269880 (JOLLY GURVINDER [CA], et al);
		[A] - INSPEC, (19000101), Database accession no. 73:481970, XP002910169
	by applicant	EP0703609

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