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Extract from the Register of European Patents

EP About this file: EP1016134

EP1016134 - PLASMA REACTOR FOR PASSIVATING A SUBSTRATE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  15.12.2006
Database last updated on 23.04.2024
Most recent event   Tooltip25.09.2009Change - representativepublished on 28.10.2009  [2009/44]
Applicant(s)For all designated states
LAM RESEARCH CORPORATION
4650 Cushing Parkway
Fremont, CA 94538 / US
[2000/27]
Inventor(s)01 / LEE, Changhun
10100 Torre Avenue, #127
Cupertino, CA 95014 / US
02 / SINGH, Vikram
530 Mission Court 110
Santa Clara, CA 95054 / US
03 / YANG, Yun-Yen, Jack
4378 Silver Berry Drive
San Jose, CA 95136 / US
[2000/35]
Former [2000/27]01 / LEE, Changhun
37139 Denning Terrace 197
Fremont, CA 94536 / US
02 / SINGH, Vikram
530 Mission Court 110
Santa Clara, CA 95054 / US
03 / YANG, Yun-Yen, Jack
4378 Silver Berry Drive
San Jose, CA 95136 / US
Representative(s)Browne, Robin Forsythe, et al
Hepworth Browne
15 St Paul's Street
Leeds LS1 2JG / GB
[N/P]
Former [2009/44]Browne, Robin Forsythe, et al
Leaman Browne Limited Pearl Chambers 22 East Parade
Leeds, Yorkshire LS1 5BY / GB
Former [2006/50]Browne, Robin Forsythe, et al
Leaman Browne 5 South Parade
Leeds, LS1 5QX / GB
Former [2006/31]Browne, Robin Forsythe, et al
HLBBshaw 1200 Century Way Thorpe Park Business Park, Colton
Leeds LS15 8ZA / GB
Former [2000/27]Browne, Robin Forsythe, Dr.
Urquhart-Dykes & Lord Tower House Merrion Way
Leeds LS2 8PA West Yorkshire / GB
Application number, filing date98931533.824.06.1998
[2000/27]
WO1998US13081
Priority number, dateUS1997088222225.06.1997         Original published format: US 882222
[2000/27]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO9859367
Date:30.12.1998
Language:EN
[1998/52]
Type: A1 Application with search report 
No.:EP1016134
Date:05.07.2000
Language:EN
The application published by WIPO in one of the EPO official languages on 30.12.1998 takes the place of the publication of the European patent application.
[2000/27]
Type: B1 Patent specification 
No.:EP1016134
Date:08.02.2006
Language:EN
[2006/06]
Search report(s)International search report - published on:EP30.12.1998
ClassificationIPC:H01L21/3213, H01J37/32
[2000/27]
CPC:
H01L21/02071 (EP,US); H01L21/3213 (KR); H01J37/32633 (EP,US);
H01L21/31138 (EP,US)
Designated contracting statesAT,   DE,   FR,   IE,   IT,   NL [2000/27]
TitleGerman:PLASMAREAKTOR FÜR DIE PASSIVIERUNG EINES SUBSTRATES[2000/27]
English:PLASMA REACTOR FOR PASSIVATING A SUBSTRATE[2000/27]
French:REACTEUR A PLASMA PERMETTANT DE PASSIVER UN SUBSTRAT[2000/27]
Entry into regional phase11.01.2000National basic fee paid 
11.01.2000Designation fee(s) paid 
11.01.2000Examination fee paid 
Examination procedure28.12.1998Request for preliminary examination filed
International Preliminary Examining Authority: EP
11.01.2000Examination requested  [2000/27]
20.07.2001Despatch of a communication from the examining division (Time limit: M04)
23.11.2001Reply to a communication from the examining division
01.04.2003Despatch of communication that the application is refused, reason: substantive examination {1}
31.01.2005Communication of intention to grant the patent
12.05.2005Fee for grant paid
12.05.2005Fee for publishing/printing paid
Appeal following examination25.04.2003Appeal received No.  T0761/03
09.06.2003Statement of grounds filed
06.12.2004Result of appeal procedure: remittal for grant
06.12.2004Date of oral proceedings
13.12.2004Minutes of oral proceedings despatched
Opposition(s)09.11.2006No opposition filed within time limit [2007/03]
Fees paidRenewal fee
05.06.2000Renewal fee patent year 03
05.06.2001Renewal fee patent year 04
07.06.2002Renewal fee patent year 05
07.04.2003Renewal fee patent year 06
04.06.2004Renewal fee patent year 07
06.06.2005Renewal fee patent year 08
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT08.02.2006
[2006/43]
Cited inInternational search[A]JPH0831803  ;
 [A]US4534816  (CHEN LEE [US], et al) [A] 1,11,20,23 * figure 2 *;
 [A]US4836902  (KALNITSKY ALEXANDER [CA], et al) [A] 1,11,20,23 * the whole document *;
 [A]US5545289  (CHEN JIAN [US], et al) [A] * the whole document *;
 [A]  - PATENT ABSTRACTS OF JAPAN, (19960628), vol. 096, no. 006, & JP08031803 A 19960202 (PLASMA SYST:KK) [A] 1,3,5,11,13,14,20,23,25 * abstract *
 [A]  - SINGH V ET AL, "Application of plasma and flow modeling to the design of optimized aluminum equipment", INSPEC, INSTITUTE OF ELECTRICAL ENGINEERS, STEVENAGE, GB, XP002079763 [A] * abstract *
    [ ] - PROCEEDINGS OF THE SECOND INTERNATIONAL SYMPOSIUM ON PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANUFACTURING, PROCEEDINGS OF THE SECOND INTERNATIONAL SYMPOSIUM ON PROCESS CONTROL, DIAGNOSTICS, AND MODELLING IN SEMICONDUCTOR MANUFACT, ISBN 1-56677-136-6, 1997, Pennington, NJ, USA, Electrochem. Soc, USA, pages 251 - 259
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.