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EP1018139
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EP About this file: EP1018139
| EP1018139 - ADJUSTMENT OF DEPOSITION UNIFORMITY IN AN INDUCTIVELY COUPLED PLASMA SOURCE [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 16.11.2001 Database last updated on 04.06.2024 | Most recent event Tooltip | 16.11.2001 | Application deemed to be withdrawn | published on 02.01.2002 [2002/01] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue M/S 2061 Santa Clara, California 95054-3299 / US | [N/P] |
| Former [2000/28] | For all designated states APPLIED MATERIALS, INC. 3050 Bowers Avenue, M/S 2061 Santa Clara, California 95054-3299 / US | Inventor(s) | 01 /
GOPALRAJA, Praburam Apartment 277, 1235 Wildwood Avenue Sunnyvale, CA 94089 / US | 02 /
NARASHIMHAN, Murali 1771 Valhalla Court San Jose, CA 95132 / US | [2000/28] | Representative(s) | Kirschner, Klaus Dieter Puschmann Borchert Bardehle Patentanwälte Partnerschaft Postfach 10 12 31 80086 München / DE | [N/P] |
| Former [2000/28] | Kirschner, Klaus Dieter, Dipl.-Phys. Schneiders & Behrendt Rechtsanwälte - Patentanwälte Sollner Strasse 38 81479 München / DE | Application number, filing date | 98944839.4 | 09.09.1998 | [2000/28] | WO1998US18898 | Priority number, date | US19970929829 | 15.09.1997 Original published format: US 929829 | [2000/28] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO9914792 | Date: | 25.03.1999 | Language: | EN | [1999/12] | Type: | A1 Application with search report | No.: | EP1018139 | Date: | 12.07.2000 | Language: | EN | The application published by WIPO in one of the EPO official languages on 25.03.1999 takes the place of the publication of the European patent application. | [2000/28] | Search report(s) | International search report - published on: | EP | 25.03.1999 | Classification | IPC: | H01J37/34, H01J37/32, C23C14/38, C23C14/40 | [2000/28] | CPC: |
C23C14/345 (EP,US);
C23C14/35 (EP,KR,US);
C23C14/046 (EP,US);
C23C14/3407 (KR);
C23C14/358 (EP,US);
H01J37/321 (EP,US);
| Designated contracting states | DE, FR, GB [2000/28] | Title | German: | EINSTELLUNG EINER GLEICHMÄSSIGEN ABSCHEIDUNG IN EINER INDUKTIV GEKOPPELTEN PLASMAQUELLE | [2000/28] | English: | ADJUSTMENT OF DEPOSITION UNIFORMITY IN AN INDUCTIVELY COUPLED PLASMA SOURCE | [2000/28] | French: | REGLAGE DE L'UNIFORMITE DU DEPOT DANS UNE SOURCE DE PLASMA INDUCTIF | [2000/28] | Entry into regional phase | 14.04.2000 | National basic fee paid | 14.04.2000 | Designation fee(s) paid | 14.04.2000 | Examination fee paid | Examination procedure | 07.04.1999 | Request for preliminary examination filed International Preliminary Examining Authority: US | 14.04.2000 | Examination requested [2000/28] | 31.01.2001 | Despatch of a communication from the examining division (Time limit: M04) | 12.06.2001 | Application deemed to be withdrawn, date of legal effect [2002/01] | 19.07.2001 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2002/01] | Fees paid | Renewal fee | 28.09.2000 | Renewal fee patent year 03 | Penalty fee | Additional fee for renewal fee | 30.09.2001 | 04 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [X]US4692230 (NIHEI MASAYASU [JP], et al) [X] 1-3 * column 3, lines 22-63; figures 1,2 *; | [XP]EP0807954 (APPLIED MATERIALS INC [US]) [XP] 11,12,14-18,27 * column 4, lines 9-53; figure 2 * * column 12, line 12 - column 13, line 9; figure 12 * * column 6, line 51 - column 7, line 4 *; | [XP]EP0836219 (APPLIED MATERIALS INC [US]) [XP] 11,12,14-18,27 * column 2, lines 40-58; figures 3,4 * * column 3, line 40 - column 4, line 7 * * column 10, lines 36-48 ** column 12, lines 41-52 * |