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Extract from the Register of European Patents

EP About this file: EP0958195

EP0958195 - METHOD FOR COATING SURFACES USING AN INSTALLATION WITH SPUTTER ELECTRODES [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  15.11.2002
Database last updated on 01.10.2024
Most recent event   Tooltip15.11.2002No opposition filed within time limitpublished on 02.01.2003  [2003/01]
Applicant(s)For all designated states
ROBERT BOSCH GMBH
Postfach 30 02 20
70442 Stuttgart / DE
[1999/47]
Inventor(s)01 / WEBER, Thomas
Rossbühlstrasse 1
D-70825 Korntal-Münchingen / DE
02 / VOIGT, Johannes
Stoeckhofstrasse 47
D-71229 Leonberg / DE
03 / LUCAS, Susanne
Belaustrasse 9
D-70195 Stuttgart / DE
[1999/47]
Representative(s)Gleiss & Grosse
Patentanwälte Rechtsanwälte
Leitzstrasse 45
70469 Stuttgart / DE
[N/P]
Former [2000/45]Gleiss & Grosse
Maybachstrasse 6 A
70469 Stuttgart / DE
Application number, filing date98955326.815.09.1998
[1999/47]
WO1998DE02726
Priority number, dateDE1997104079317.09.1997         Original published format: DE 19740793
[1999/47]
Filing languageDE
Procedural languageDE
PublicationType: A2 Application without search report
No.:WO9914390
Date:25.03.1999
Language:DE
[1999/12]
Type: A2 Application without search report 
No.:EP0958195
Date:24.11.1999
Language:DE
The application published by WIPO in one of the EPO official languages on 25.03.1999 takes the place of the publication of the European patent application.
[1999/47]
Type: B1 Patent specification 
No.:EP0958195
Date:02.01.2002
Language:DE
[2002/01]
Search report(s)International search report - published on:EP27.05.1999
ClassificationIPC:B65D81/05
[1999/47]
CPC:
C23C16/517 (EP,US); C23C14/0036 (EP,US); C23C14/0057 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT [1999/47]
TitleGerman:VERFAHREN ZUR SPUTTERBESCHICHTUNG VON OBERFLÄCHEN[1999/47]
English:METHOD FOR COATING SURFACES USING AN INSTALLATION WITH SPUTTER ELECTRODES[1999/47]
French:PROCEDE DE REVETEMENT DE SURFACES AU MOYEN D'UNE INSTALLATION DOTEE D'ELECTRODES DE DEPOT PAR PULVERISATION[1999/47]
Entry into regional phase17.06.1999National basic fee paid 
17.06.1999Designation fee(s) paid 
17.06.1999Examination fee paid 
Examination procedure17.06.1999Examination requested  [1999/47]
02.05.2000Despatch of a communication from the examining division (Time limit: M04)
31.08.2000Reply to a communication from the examining division
01.06.2001Despatch of communication of intention to grant (Approval: Yes)
04.07.2001Communication of intention to grant the patent
15.10.2001Fee for grant paid
15.10.2001Fee for publishing/printing paid
Opposition(s)03.10.2002No opposition filed within time limit [2003/01]
Fees paidRenewal fee
02.10.2000Renewal fee patent year 03
01.10.2001Renewal fee patent year 04
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[X]DE4343042  (FRAUNHOFER GES FORSCHUNG [DE]) [X] 1,2,4-6,8,9,12,18-20,27,29 * column 4, line 36 - line 47 * * column 5, line 14 - line 61 *;
 [A]DE19506515  (FRAUNHOFER GES FORSCHUNG [DE]) [A] 1-29 * the whole document *;
 [A]DE19537263  (FRAUNHOFER GES FORSCHUNG [DE]) [A] 1-29 * column 3, line 23 - line 55 * * column 4, line 49 - line 63 *;
 [A]EP0736612  (OELHAFEN PETER [CH], et al) [A] 22,24-26 * claims 1-10 *;
 [A]EP0583736  (HUGHES AIRCRAFT CO [US]) [A] 25 * column 12, line 37 - line 48 *;
 [A]JPS5655564  ;
 [XA]  - FRACH P ET AL, "The double ring magnetron process module-a tool for stationary deposition of metals, insulators and reactive sputtered compounds", SURFACE AND COATINGS TECHNOLOGY, 15 MARCH 1997, ELSEVIER, SWITZERLAND, ISSN 0257-8972, vol. 90, no. 1-2, pages 75 - 81, XP002094930 [X] 1,2 * paragraph [04.4] * [A] 3-29

DOI:   http://dx.doi.org/10.1016/S0257-8972(96)03096-4
 [A]  - SCHOLL R A, "ASYMMETRIC BIPOLAR PULSED POWER. A NEW POWER TECHNOLOGY", LE VIDE: SCIENCE, TECHNIQUE ET APPLICATIONS, (19960401), vol. 52, no. 280, pages 237 - 243, XP000599220 [A] 1-29 * page 241, line 1 - line 23 *
 [A]  - KUSAKA K ET AL, "EFFECT OF NITROGEN GAS PRESSURE ON RESIDUAL STRESS IN AIN FILMS DEPOSITED BY THE PLANAR MAGNETRON SPUTTERING SYSTEM", THIN SOLID FILMS, (19960801), vol. 281/282, no. 1/02, pages 340 - 343, XP000643420 [A] 11,16 * paragraph [0003] *

DOI:   http://dx.doi.org/10.1016/0040-6090(96)08633-6
 [A]  - YOSHIO MANABE ET AL, "ZINC OXIDE THIN FILMS PREPARED BY THE ELECTRON-CYCLOTRON-RESONANCE PLASMA SPUTTERING METHOD", JAPANESE JOURNAL OF APPLIED PHYSICS, (19900201), vol. 29, no. 2, PART 01, pages 334 - 339, XP000116850 [A] 14,28 * paragraph [0002] *

DOI:   http://dx.doi.org/10.1143/JJAP.29.334
 [A]  - SHEW B -Y ET AL, "Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiAlN films", THIN SOLID FILMS, (19970130), vol. 293, no. 1-2, page 212-219, XP004080859 [A] 24,26 * figure 1 *

DOI:   http://dx.doi.org/10.1016/S0040-6090(96)09038-4
 [A]  - PATENT ABSTRACTS OF JAPAN, (19810804), vol. 005, no. 120, Database accession no. (C - 065), & JP56055564 A 19810516 (MITSUBISHI METAL CORP) [A] 21,22 * abstract *
 [A]  - SMITH P.H., "Method of Varying Composition of Multi Component. Sputtered Films. November 1981.", IBM TECHNICAL DISCLOSURE BULLETIN, New York, US, (198111), vol. 24, no. 6, pages 2962 - 2963, XP002094096 [A] 23 * the whole document *
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