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Extract from the Register of European Patents

EP About this file: EP0999597

EP0999597 - Ferroelectric nonvolatile transistor and method of making same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  08.12.2006
Database last updated on 19.10.2024
Most recent event   Tooltip08.12.2006No opposition filed within time limitpublished on 10.01.2007  [2007/02]
Applicant(s)For all designated states
Sharp Kabushiki Kaisha
22-22 Nagaike-cho
Abeno-ku
Osaka 545-8522 / JP
[N/P]
Former [2006/03]For all designated states
SHARP KABUSHIKI KAISHA
22-22 Nagaike-cho Abeno-ku
Osaka 545-8522 / JP
Former [2000/19]For all designated states
SHARP KABUSHIKI KAISHA
22-22 Nagaike-cho Abeno-ku
Osaka 545-8522 / JP
Inventor(s)01 / Hsu, Sheng Teng
2216 NW Trout Court
Camas, WA 98607 / US
02 / Zhang, Fengyang
16804 SE 32nd Street
Vancouver, WA 98683 / US
03 / Maa, Jer-shen
1511 SE Solomon Loop
Vancouver, WA 98683 / US
04 / Li, Tingkai
18701-27th Street
Vancouver, WA 98683 / US
[2000/19]
Representative(s)Brown, Kenneth Richard, et al
R.G.C. Jenkins & Co
26 Caxton Street
London SW1H 0RJ / GB
[N/P]
Former [2000/19]Brown, Kenneth Richard, et al
R.G.C. Jenkins & Co. 26 Caxton Street
London SW1H 0RJ / GB
Application number, filing date99307192.710.09.1999
[2000/19]
Priority number, dateUS1998018723805.11.1998         Original published format: US 187238
[2000/19]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0999597
Date:10.05.2000
Language:EN
[2000/19]
Type: B1 Patent specification 
No.:EP0999597
Date:18.01.2006
Language:EN
[2006/03]
Search report(s)(Supplementary) European search report - dispatched on:EP31.01.2000
ClassificationIPC:H01L29/51, H01L21/28
[2000/19]
CPC:
H01L29/6684 (EP,US); H01L29/78 (KR); H01L29/78391 (EP,US)
Designated contracting statesDE,   FR,   GB [2001/04]
Former [2000/19]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Ferroelektrischer nichtflüchtiger Transistor und dessen Herstellungsverfahren[2000/19]
English:Ferroelectric nonvolatile transistor and method of making same[2000/19]
French:Transistor ferro-électrique non-volatile et son procédé de fabrication[2000/19]
Examination procedure17.07.2000Examination requested  [2000/37]
13.11.2000Loss of particular rights, legal effect: designated state(s)
13.03.2001Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, GR, IE, IT, LI, LU, MC, NL, PT, SE
07.12.2004Despatch of a communication from the examining division (Time limit: M04)
14.04.2005Reply to a communication from the examining division
14.06.2005Communication of intention to grant the patent
24.10.2005Fee for grant paid
24.10.2005Fee for publishing/printing paid
Opposition(s)19.10.2006No opposition filed within time limit [2007/02]
Fees paidRenewal fee
12.09.2001Renewal fee patent year 03
12.09.2002Renewal fee patent year 04
12.09.2003Renewal fee patent year 05
14.09.2004Renewal fee patent year 06
14.09.2005Renewal fee patent year 07
Penalty fee
Penalty fee Rule 85a EPC 1973
15.12.2000AT   M01   Not yet paid
15.12.2000BE   M01   Not yet paid
15.12.2000CH   M01   Not yet paid
15.12.2000CY   M01   Not yet paid
15.12.2000DK   M01   Not yet paid
15.12.2000ES   M01   Not yet paid
15.12.2000FI   M01   Not yet paid
15.12.2000GR   M01   Not yet paid
15.12.2000IE   M01   Not yet paid
15.12.2000IT   M01   Not yet paid
15.12.2000LU   M01   Not yet paid
15.12.2000MC   M01   Not yet paid
15.12.2000NL   M01   Not yet paid
15.12.2000PT   M01   Not yet paid
15.12.2000SE   M01   Not yet paid
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Documents cited:Search[A]EP0540993  (RAMTRON INT CORP [US]);
 [XAY]US5384729  (SAMESHIMA KATSUMI [JP]);
 [A]US5744374  (MOON JONG [KR]);
 [Y]EP0869557  (SHARP KK [JP], et al);
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.