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Extract from the Register of European Patents

EP About this file: EP1014446

EP1014446 - Semiconductor device protected against analysis [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  06.04.2007
Database last updated on 02.07.2024
Most recent event   Tooltip06.04.2007No opposition filed within time limitpublished on 09.05.2007  [2007/19]
Applicant(s)For all designated states
Sharp Kabushiki Kaisha
22-22 Nagaike-cho
Abeno-ku
Osaka 545-8522 / JP
[N/P]
Former [2006/22]For all designated states
SHARP KABUSHIKI KAISHA
22-22 Nagaike-cho Abeno-ku
Osaka 545-8522 / JP
Former [2000/26]For all designated states
SHARP KABUSHIKI KAISHA
22-22 Nagaike-cho Abeno-ku
Osaka 545-8522 / JP
Inventor(s)01 / Matsumoto, Hironori
1187-4 Tokujo-cho
Nara-shi, Nara / JP
[2000/26]
Representative(s)Brown, Kenneth Richard, et al
R.G.C. Jenkins & Co
26 Caxton Street
London SW1H 0RJ / GB
[N/P]
Former [2000/26]Brown, Kenneth Richard, et al
R.G.C. Jenkins & Co. 26 Caxton Street
London SW1H 0RJ / GB
Application number, filing date99310368.821.12.1999
[2000/26]
Priority number, dateJP1998036233521.12.1998         Original published format: JP 36233598
[2000/26]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1014446
Date:28.06.2000
Language:EN
[2000/26]
Type: B1 Patent specification 
No.:EP1014446
Date:31.05.2006
Language:EN
[2006/22]
Search report(s)(Supplementary) European search report - dispatched on:EP13.03.2000
ClassificationIPC:H01L23/58
[2000/26]
CPC:
H01L23/573 (EP,US); H01L27/08 (KR); H01L27/02 (EP,US);
H01L2924/0002 (EP,US); Y10S257/922 (EP,US)
C-Set:
H01L2924/0002, H01L2924/00 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [2001/11]
Former [2000/26]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Gegen Analyse geschützte Halbleiteranordnung[2000/26]
English:Semiconductor device protected against analysis[2000/26]
French:Dispositif semiconducteur protégé contre l'analyse[2000/26]
Examination procedure24.07.2000Examination requested  [2000/38]
29.12.2000Loss of particular rights, legal effect: designated state(s)
26.04.2001Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, GR, IE, IT, LI, LU, MC, PT, SE
29.07.2004Despatch of a communication from the examining division (Time limit: M06)
08.02.2005Reply to a communication from the examining division
14.11.2005Communication of intention to grant the patent
22.03.2006Fee for grant paid
22.03.2006Fee for publishing/printing paid
Opposition(s)01.03.2007No opposition filed within time limit [2007/19]
Fees paidRenewal fee
13.12.2001Renewal fee patent year 03
12.12.2002Renewal fee patent year 04
12.12.2003Renewal fee patent year 05
14.12.2004Renewal fee patent year 06
15.12.2005Renewal fee patent year 07
Penalty fee
Penalty fee Rule 85a EPC 1973
02.02.2001AT   M01   Not yet paid
02.02.2001BE   M01   Not yet paid
02.02.2001CH   M01   Not yet paid
02.02.2001CY   M01   Not yet paid
02.02.2001DK   M01   Not yet paid
02.02.2001ES   M01   Not yet paid
02.02.2001FI   M01   Not yet paid
02.02.2001GR   M01   Not yet paid
02.02.2001IE   M01   Not yet paid
02.02.2001IT   M01   Not yet paid
02.02.2001LU   M01   Not yet paid
02.02.2001MC   M01   Not yet paid
02.02.2001PT   M01   Not yet paid
02.02.2001SE   M01   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[DA]JPH01165129  ;
 [XA]US5369299  (BYRNE ROBERT C [US]) [X] 1,2 * column 3, line 3 - column 4, line 52; figure 1 * [A] 6-8,11,12,15
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19890929), vol. 013, no. 437, Database accession no. (E - 826), & JP01165129 A 19890629 (SHARP CORP) [DA] 1,5 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.