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EP0932183
European procedure
Extract from the Register of European Patents
EP About this file: EP0932183
| EP0932183 - Linear microwave plasma source with permanent magnets [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 06.08.2004 Database last updated on 19.10.2024 | Most recent event Tooltip | 06.08.2004 | No opposition filed within time limit | published on 22.09.2004 [2004/39] | Applicant(s) | For all designated states COMMISSARIAT A L'ENERGIE ATOMIQUE 31/33, rue de la Fédération 75015 Paris Cédex 15 / FR | [1999/30] | Inventor(s) | 01 /
Delaunay, Marc 17, Allée des Eyminées 38240 Meylan / FR | [1999/30] | Representative(s) | Audier, Philippe André, et al BREVALEX 95 rue d'Amsterdam 75378 Paris Cedex 8 / FR | [N/P] |
| Former [2003/02] | Audier, Philippe André, et al Brevalex, 3, rue du Docteur Lancereaux 75008 Paris / FR | ||
| Former [1999/30] | Des Termes, Monique Société Brevatome 25, rue de Ponthieu 75008 Paris / FR | Application number, filing date | 99400164.2 | 25.01.1999 | [1999/30] | Priority number, date | FR19980000777 | 26.01.1998 Original published format: FR 9800777 | [1999/30] | Filing language | FR | Procedural language | FR | Publication | Type: | A1 Application with search report | No.: | EP0932183 | Date: | 28.07.1999 | Language: | FR | [1999/30] | Type: | B1 Patent specification | No.: | EP0932183 | Date: | 01.10.2003 | Language: | FR | [2003/40] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 04.05.1999 | Classification | IPC: | H01J37/32 | [1999/30] | CPC: |
H01J37/32229 (EP,US);
H01J37/32192 (EP,US);
H01J37/32678 (EP,US)
| Designated contracting states | CH, DE, FR, GB, IT, LI, NL [2000/14] |
| Former [1999/30] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Lineare Mikrowellenplasmaquelle mit Permanentmagneten | [1999/30] | English: | Linear microwave plasma source with permanent magnets | [1999/30] | French: | Source à plasma micro-onde linéaire en aimants permanents | [1999/30] | Examination procedure | 20.01.2000 | Examination requested [2000/12] | 29.01.2000 | Loss of particular rights, legal effect: designated state(s) | 20.02.2003 | Communication of intention to grant the patent | 29.04.2003 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, CY, DK, ES, FI, GR, IE, LU, MC, PT, SE | 27.05.2003 | Fee for grant paid | 27.05.2003 | Fee for publishing/printing paid | Opposition(s) | 02.07.2004 | No opposition filed within time limit [2004/39] | Fees paid | Renewal fee | 17.01.2001 | Renewal fee patent year 03 | 18.01.2002 | Renewal fee patent year 04 | 22.01.2003 | Renewal fee patent year 05 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 12.02.2003 | AT M01 Not yet paid | 12.02.2003 | BE M01 Not yet paid | 12.02.2003 | CY M01 Not yet paid | 12.02.2003 | DK M01 Not yet paid | 12.02.2003 | ES M01 Not yet paid | 12.02.2003 | FI M01 Not yet paid | 12.02.2003 | GR M01 Not yet paid | 12.02.2003 | IE M01 Not yet paid | 12.02.2003 | LU M01 Not yet paid | 12.02.2003 | MC M01 Not yet paid | 12.02.2003 | PT M01 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JPH05266993 ; | [A]JPS63162865 ; | [A]DE4230291 (LEYBOLD AG [DE]) [A] 4 * column 2, line 39 - line 60 * * figure 1 *; | [A]US5302266 (GRABARZ HENRY J [US], et al) [A] 1,6 * column 5, line 26 - line 36 * * figures 5,9B * | [A] - PATENT ABSTRACTS OF JAPAN, (19940118), vol. 018, no. 033, Database accession no. (E - 1493), & JP05266993 A 19931015 (HITACHI LTD) [A] 1 * abstract * | [DA] - MARITO MATSUOKA ET AL, "A FEW TECHNIWUES FOR PREPARING CONDUCTIVE MATERIAL FILMS FOR SPUTTERING-TYPE ELECTRON CYCLOTRON RESONANCE MICROWAVE PLASMA", JAPANESE JOURNAL OF APPLIED PHYSICS, (19890301), vol. 28, no. 3, pages L503 - 506, XP000118423 [DA] 1,5 * page 505, column L, paragraph 1 * * figure 4 * DOI: http://dx.doi.org/10.1143/JJAP.28.L503 | [DA] - BERRY L A ET AL, "PERMANENT MAGNET ELECTRON CYCLOTRON RESONANCE PLASMA SOURCE WITH REMOTE WINDOW", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A, (19950301), vol. 13, no. 2, pages 343 - 348, XP000498541 [DA] 1 * page 343, column R, paragraph 3 - page 344, column L, paragraph 2 * * figure 1 * DOI: http://dx.doi.org/10.1116/1.579420 | [A] - PATENT ABSTRACTS OF JAPAN, (19881117), vol. 012, no. 438, Database accession no. (C - 544), & JP63162865 A 19880706 (MATSUSHITA ELECTRIC IND CO LTD) [A] 2,4 * abstract * |