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Extract from the Register of European Patents

EP About this file: EP1026732

EP1026732 - A method of forming a high voltage semiconductor device [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  17.03.2001
Database last updated on 19.10.2024
Most recent event   Tooltip17.03.2001Withdrawal of applicationpublished on 02.05.2001 [2001/18]
Applicant(s)For all designated states
MOTOROLA, INC.
1303 East Algonquin Road
Schaumburg, IL 60196 / US
[2000/32]
Inventor(s)01 / Jaume, Denis
31 Allée de Noirmoutier
31770 Colomiers / FR
02 / Martinez, Christian
3 Allée des Bouleaux
31520 Ramonville / FR
03 / Roche, Hervé
1 Impasse de l'Abbee Lestrade
31300 Toulouse / FR
04 / Viale, Eric
55 rue des Sports Apt No 7
31200 Toulouse / FR
[2000/32]
Representative(s)Hudson, Peter David, et al
Motorola
European Intellectual Property
Midpoint
Alencon Link, Basingstoke
Hampshire RG21 7PL / GB
[N/P]
Former [2000/32]Hudson, Peter David, et al
Motorola, European Intellectual Property Operations, Midpoint Alencon Link
Basingstoke, Hampshire RG21 7PL / GB
Application number, filing date99400264.005.02.1999
[2000/32]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1026732
Date:09.08.2000
Language:EN
[2000/32]
Search report(s)(Supplementary) European search report - dispatched on:EP15.07.1999
ClassificationIPC:H01L21/312, H01L29/06, H01L23/29
[2000/32]
CPC:
H01L21/02118 (EP,US); H01L21/022 (EP,US); H01L23/3192 (EP);
H01L2924/0002 (EP); H01L2924/13055 (EP)
C-Set:
H01L2924/0002, H01L2924/00 (EP)
Designated contracting states(deleted) [2001/17]
Former [2000/32]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Herstellungsmethode für eine Hochspannungshalbleiteranordnung[2000/32]
English:A method of forming a high voltage semiconductor device[2000/32]
French:Méthode de fabrication d'un dispositif semiconducteur à haute tension[2000/32]
Examination procedure05.03.2001Application withdrawn by applicant  [2001/18]
Fees paidRenewal fee
05.02.2001Renewal fee patent year 03
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Documents cited:Search[X]US5798562  (RABOVSKY JOHANNES [DE], et al) [X] 1,11,17 * column 2, line 61 - line 64 *;
 [XA]US5288989  (ISHAQUE A NADEEM [US], et al) [X] 11 * abstract * [A] 1,17;
 [XA]US5252844  (TAKAGI HIROSHI [JP]) [X] 11 * column 5, line 27 - line 31; figure 2 * [A] 1,17;
 [A]DE4033361  (LESAG LEISTUNGSELEKTRONIK STAH [DE]) [A] 1,8-11,14-17 * the whole document *;
 [A]US5861656  (KERI IMRE [SE]) [A] 1,2,6,11,17 * column 2, line 22 - line 28; figure 5 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.