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Extract from the Register of European Patents

EP About this file: EP1057206

EP1057206 - LOW PRESSURE INDUCTIVELY COUPLED HIGH DENSITY PLASMA REACTOR [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  16.03.2012
Database last updated on 15.06.2024
Most recent event   Tooltip04.05.2012Lapse of the patent in a contracting state
New state(s): IT		published on 06.06.2012  [2012/23]
Applicant(s)For all designated states
Micron Technology, Inc.
8000 South Federal Way
Boise, ID 83716-9632 / US
[2011/19]
Former [2000/49]For all designated states
MICRON TECHNOLOGY, INC.
8000 South Federal Way
Boise, Idaho 83716-9632 / US
Inventor(s)01 / BLALOCK, Guy, T.
8101 Silkwood Court
Boise, ID 83704 / US
02 / DONOHOE, Kevin, G.
719 W. Ridgeline Drive
Boise, ID 83707 / US
[2000/49]
Representative(s)Beresford, Keith Denis Lewis, et al
Beresford Crump LLP
16 High Holborn
London WC1V 6BX / GB
[N/P]
Former [2008/40]Beresford, Keith Denis Lewis, et al
BERESFORD & Co. 16 High Holborn London
WC1V 6BX / GB
Former [2000/49]Beresford, Keith Denis Lewis, et al
2-5 Warwick Court High Holborn
London WC1R 5DJ / GB
Application number, filing date99908542.626.02.1999
[2000/49]
WO1999US04325
Priority number, dateUS1998003140026.02.1998         Original published format: US 31400
[2000/49]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO9944219
Date:02.09.1999
Language:EN
[1999/35]
Type: A1 Application with search report 
No.:EP1057206
Date:06.12.2000
Language:EN
The application published by WIPO in one of the EPO official languages on 02.09.1999 takes the place of the publication of the European patent application.
[2000/49]
Type: B1 Patent specification 
No.:EP1057206
Date:11.05.2011
Language:EN
[2011/19]
Search report(s)International search report - published on:EP02.09.1999
ClassificationIPC:H01J37/32, H05H1/46
[2000/49]
CPC:
H01J37/32091 (EP,US); H01J37/32 (KR); H01J37/321 (EP,US);
H01J37/32183 (EP,US); H05H1/46 (EP,US)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2000/49]
TitleGerman:INDUKTIV GEKOPPELTER NIEDERDRUCK-PLASMAREAKTOR FÜR PLASMEN HOHER DICHTE[2009/47]
English:LOW PRESSURE INDUCTIVELY COUPLED HIGH DENSITY PLASMA REACTOR[2000/49]
French:REACTEUR A PLASMA HAUTE DENSITE BASSE PRESSION COUPLE PAR INDUCTION[2000/49]
Former [2000/49]NIEDERDRUCK INDUKTIV-GEKOPPELTER HOHE-DICHTIGKEIT PLASMAREAKTOR
Entry into regional phase21.09.2000National basic fee paid 
21.09.2000Designation fee(s) paid 
21.09.2000Examination fee paid 
Examination procedure21.09.1999Request for preliminary examination filed
International Preliminary Examining Authority: EP
21.09.2000Examination requested  [2000/49]
04.11.2003Despatch of a communication from the examining division (Time limit: M06)
22.06.2004Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
01.07.2004Reply to a communication from the examining division
26.08.2009Despatch of a communication from the examining division (Time limit: M04)
05.10.2009Reply to a communication from the examining division
04.11.2009Communication of intention to grant the patent
05.03.2010Fee for grant paid
05.03.2010Fee for publishing/printing paid
Opposition(s)14.02.2012No opposition filed within time limit [2012/16]
Request for further processing for:01.07.2004Request for further processing filed
01.07.2004Full payment received (date of receipt of payment)
Request granted
19.07.2004Decision despatched
Fees paidRenewal fee
02.02.2001Renewal fee patent year 03
25.02.2002Renewal fee patent year 04
25.02.2003Renewal fee patent year 05
23.02.2004Renewal fee patent year 06
22.02.2005Renewal fee patent year 07
27.02.2006Renewal fee patent year 08
27.02.2007Renewal fee patent year 09
25.02.2008Renewal fee patent year 10
26.02.2009Renewal fee patent year 11
24.02.2010Renewal fee patent year 12
29.03.2011Renewal fee patent year 13
Penalty fee
Additional fee for renewal fee
28.02.201113   M06   Fee paid on   29.03.2011
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT11.05.2011
BE11.05.2011
CY11.05.2011
DK11.05.2011
FI11.05.2011
IT11.05.2011
NL11.05.2011
SE11.05.2011
GR12.08.2011
ES22.08.2011
PT12.09.2011
[2012/23]
Former [2012/10]AT11.05.2011
BE11.05.2011
CY11.05.2011
DK11.05.2011
FI11.05.2011
NL11.05.2011
SE11.05.2011
GR12.08.2011
ES22.08.2011
PT12.09.2011
Former [2012/01]AT11.05.2011
BE11.05.2011
CY11.05.2011
FI11.05.2011
NL11.05.2011
SE11.05.2011
GR12.08.2011
ES22.08.2011
PT12.09.2011
Former [2011/49]CY11.05.2011
FI11.05.2011
SE11.05.2011
GR12.08.2011
ES22.08.2011
PT12.09.2011
Former [2011/47]PT12.09.2011
Cited inInternational search[XAY]EP0607797  (IBM [US]) [X] 1-4,6,8,9,34,35 * column 3, line 55 - column 4, line 14 * * column 7, line 24 - line 29 * * figure 1 * [A] 11,12,14,16,17 [Y] 5,7,18,23,24;
 [YA]US5540800  (QIAN XUEYU [US]) [Y] 5,7,23 * column 1, line 8 - line 12 * * column 3, line 3 - line 23 * * figures 1,2 * [A] 13;
 [YA]US5685941  (FORSTER JOHN [US], et al) [Y] 18,23,24 * column 3, line 50 - column 4, line 55 * * figure 3 * [A] 26,31,32;
 [A]EP0810816  (APPLIED MATERIALS INC [US]) [A] 4,8,10,16,18,26 * column 1, line 3 - line 7 * * column 3, line 32 - column 4, line 6 * * column 5, line 32 - column 6, line 28 * * figure 2 *;
 [PA]EP0845800  (HITACHI LTD [JP]) [PA] 4,10 * column 4, line 15 - line 28 * * column 8, line 36 - column 9, line 17 ** figures 1-4 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.