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Extract from the Register of European Patents

EP About this file: EP1079253

EP1079253 - PROJECTION EXPOSURE APPARATUS AND METHOD, AND REFLECTION REFRACTION OPTICAL SYSTEM [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  17.03.2006
Database last updated on 19.10.2024
Most recent event   Tooltip17.03.2006Application deemed to be withdrawnpublished on 03.05.2006  [2006/18]
Applicant(s)For all designated states
NIKON CORPORATION
Fuji Building
2-3 Marunouchi 3-chome
Chiyoda-ku
Tokyo 100-0005 / JP
[N/P]
Former [2001/09]For all designated states
NIKON CORPORATION
Fuji Building, 2-3 Marunouchi 3-chome, Chiyoda-ku
Tokyo 100-0005 / JP
Inventor(s)01 / TAKAHASHI, Tomowaki, Nikon Corporation
2-3, Marunouchi 3-chome, Chiyoda-ku
Tokyo 100-0005 / JP
02 / TSUKAMOTO, Hiroyuki, Nikon Corporation
2-3, Marunouchi 3-chome, Chiyoda-ku
Tokyo 100-0005 / JP
 [2001/09]
Representative(s)Burke, Steven David, et al
R.G.C. Jenkins & Co 26 Caxton Street
London SW1H 0RJ / GB
[N/P]
Former [2001/09]Burke, Steven David, et al
R.G.C. Jenkins & Co. 26 Caxton Street
London SW1H 0RJ / GB
Application number, filing date99912115.506.04.1999
[2001/09]
WO1999JP01807
Priority number, dateJP1998011150607.04.1998         Original published format: JP 11150698
JP1998036923325.12.1998         Original published format: JP 36923398
[2001/09]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO9952004
Date:14.10.1999
Language:EN
[1999/41]
Type: A1 Application with search report 
No.:EP1079253
Date:28.02.2001
Language:EN
The application published by WIPO in one of the EPO official languages on 14.10.1999 takes the place of the publication of the European patent application.
[2001/09]
Search report(s)International search report - published on:JP14.10.1999
(Supplementary) European search report - dispatched on:EP20.07.2004
ClassificationIPC:G02B17/08, H01L21/027, G02B13/18, G02B13/14, G03F7/20
[2003/11]
CPC:
G02B17/0892 (EP,US); G02B17/08 (EP,US); G03F7/70225 (EP,US);
G03F7/70241 (EP,US); G03F7/70358 (EP,US); G03F7/70958 (EP,US)
Former IPC [2001/09]G02B17/08, H01L21/027
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2001/09]
TitleGerman:VORRICHTUNG UND VERFAHREN ZUR PROJEKTIONSBELICHTUNG, UND OPTISCHES SYSTEM MIT REFLEKTION UND BRECHUNG[2001/09]
English:PROJECTION EXPOSURE APPARATUS AND METHOD, AND REFLECTION REFRACTION OPTICAL SYSTEM[2001/09]
French:APPAREIL ET PROCEDE D'EXPOSITION A PROJECTION, ET SYSTEME OPTIQUE REFLECHISSANT A REFRACTION[2001/09]
Entry into regional phase17.10.2000Translation filed 
30.10.2000National basic fee paid 
30.10.2000Search fee paid 
30.10.2000Designation fee(s) paid 
30.10.2000Examination fee paid 
Examination procedure22.09.1999Request for preliminary examination filed
International Preliminary Examining Authority: JP
30.10.2000Examination requested  [2001/09]
15.12.2000Amendment by applicant (claims and/or description)
14.06.2005Despatch of a communication from the examining division (Time limit: M04)
25.10.2005Application deemed to be withdrawn, date of legal effect  [2006/18]
28.11.2005Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2006/18]
Fees paidRenewal fee
12.04.2001Renewal fee patent year 03
12.04.2002Renewal fee patent year 04
14.04.2003Renewal fee patent year 05
15.04.2004Renewal fee patent year 06
13.04.2005Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XY]US4688904  (HIROSE RYUSHO [JP], et al) [X] 1-5,10 * column 5, lines 33-49; figures 5,6A-6D,11,12; table 3 * * column 7, line 55 - column 8, line 40 * * column 10, line 53 - column 12, line 20 * [Y] 6-9,11,12;
 [X]US4861148  (SATO TAKEO [JP], et al) [X] 1-5,10 * column 3, line 45 - column 6, line 29; figure 5 * * column 7, lines 6-11 *;
 [Y]US4812028  (MATSUMOTO KOHICHI [JP]) [Y] 6-9,11,12 * column 2, line 21 - column 3, line 10; figures 4,5,8-11 * * column 12, line 23 - column 14, line 20 *;
 [A]US4060312  (LINKE WALTER R, et al) [A] 1-12 * column 1, lines 21-40; figures 1,2 * * column 2, line 56 - column 3, line 51; claim 1 *;
 [X]US5488229  (ELLIOTT DAVID J [US], et al) [X] 13-26,45-47 * column 1, line 37 - column 2, line 39; figures 1,2 * * column 3, lines 41-48 *;
 [X]US5717518  (SHAFER DAVID R [US], et al) [X] 13-26,45-47 * column 2, line 45 - column 3, line 41; figures 1,2 * * column 4, line 3 - column 6, line 17 *;
 [XY]EP0779528  (SVG LITHOGRAPHY SYSTEMS INC [US]) [X] 27-32,34-44,51-56 * page 7, line 27 - page 9, line 37; figure 3 * * page 7, lines 45,46 * [Y] 33;
 [X]US5559584  (MIYAJI AKIRA [JP], et al) [X] 27-31,36,39-44,51-56 * column 9, lines 55-63; figure 1 * * column 3, line 3 - column 4, line 51 *;
 [PX]EP0869383  (NIPPON KOGAKU KK [JP]) [PX] 48-50 * page 5, line 26 - page 6, line 38; figures 2,3,6,9,12,15 *;
 [XY]EP0816892  (NIPPON KOGAKU KK [JP]) [X] 48-50 * page 3, line 25 - page 8, line 27; figure 1 * * page 5, lines 9-11 * [Y] 33;
 [A]US5694241  (ISHIYAMA TOSHIRO [JP], et al) [A] 48-50 * column 9, line 10 - column 10, line 48; figures 5,9 * * column 14, lines 8-65 *;
 [A]EP0475020  (IBM [US]) [A] 48-50 * page 4, lines 28-58; figures 3,8 *;
 [X]US4685777  (HIROSE RYUSHO [JP]) [X] 55-70 * column 2, line 42 - column 4, line 60; figure 1 *;
 [X]US5668673  (SUENAGA YUTAKA [JP], et al) [X] 57-70 * column 21, lines 8-67; figures 11,17,19,21,23,25 * * column 26, line 44 - column 27, line 30 * * column 28, line 23 - column 35, line 58 *;
 [X]EP0604093  (NIPPON KOGAKU KK [JP]) [X] 57-70 * page 10, line 51 - page 13, line 4; figures 7,13,15 * * page 18, lines 19-49 * * page 21, lines 6-33 *;
 [X]US4747678  (SHAFER DAVID R [US], et al) [X] 57-70 * column 2, line 52 - column 6, line 2; figures 2,3 *
 [A]  - OWEN G ET AL, "A CATADIOPTRIC REDUCTION CAMERA FOR DEEP UV MICROLITHOGRAPHY", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, (19900401), vol. 11, no. 1 / 4, ISSN 0167-9317, pages 219 - 222, XP000134590 [A] 1-12 * the whole document *

DOI:   http://dx.doi.org/10.1016/0167-9317(90)90101-X
International search[YP]JPH11109244  (NIKON CORP);
 [YP]JPH10308345  (NIKON CORP);
 [Y]JPH1020197  (NIKON CORP);
 [Y]JPH1010431  (NIKON CORP);
 [Y]JPH1010429  (NIKON CORP);
 [Y]JPH103039  (NIKON CORP);
 [Y]JPH0982625  (NIKON CORP);
 [Y]JPH09246130  (HITACHI LTD, et al);
 [Y]JPH09134865  (NIKON CORP [JP]);
 [Y]JPH09162117  (NIKON CORP);
 [Y]JPH06260385  (NIKON CORP);
 [Y]JPH07209569  (ASM LITHOGRAPHY BV);
 [Y]JPH07321005  (NIKON CORP);
 [Y]JPH08279458  (NIKON CORP);
 [Y]JPH04251812  (IBM);
 [Y]JPS61129828  (CANON KK);
 [A]JPH0817720  (NIKON CORP)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.