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Extract from the Register of European Patents

EP About this file: EP0980541

EP0980541 - METHOD AND APPARATUS FOR DIRECT WRITING OF SEMICONDUCTOR DIE USING MICROCOLUMN ARRAY [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  28.02.2003
Database last updated on 15.07.2024
Most recent event   Tooltip28.02.2003Application deemed to be withdrawnpublished on 16.04.2003  [2003/16]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[N/P]
Former [2002/20]For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, California 95054 / US
Former [2000/08]For all designated states
Etec Systems, Inc.
26460 Corporate Avenue
Hayward, CA 94545 / US
Inventor(s)01 / BERGLUND, C., Neil
15361 S. Clackamas River Drive
Oregon City, OR 97045 / US
02 / CHANG, Tai-Hon, Philip
1105 Nimitz Lane
Foster City, CA 94404 / US
[2000/08]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstrasse 4
80802 München / DE
[N/P]
Former [2000/08]Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
Maximilianstrasse 58
80538 München / DE
Application number, filing date99912742.619.03.1999
[2000/08]
WO1999US06093
Priority number, dateUS1998004549020.03.1998         Original published format: US 45490
[2000/08]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO9947978
Date:23.09.1999
Language:EN
[1999/38]
Type: A1 Application with search report 
No.:EP0980541
Date:23.02.2000
Language:EN
The application published by WIPO in one of the EPO official languages on 23.09.1999 takes the place of the publication of the European patent application.
[2000/08]
Search report(s)International search report - published on:EP23.09.1999
ClassificationIPC:G03F7/20, H01J37/317
[2000/08]
CPC:
B82Y10/00 (EP,US); G03F7/2059 (KR); H01J37/3177 (EP,US);
B82Y40/00 (EP,US); G03F7/2063 (KR); G03F7/704 (KR);
G03F7/70508 (KR); H01J37/3174 (KR) (-)
Designated contracting statesDE,   GB,   NL [2000/08]
TitleGerman:VERFAHREN UND GERÄT ZUM DIREKTEN BESCHREIBEN EINER HALBLEITERSCHEIBE MITTELS EINER VIELZAHL VON MIKRO-STRAHLUNGSQUELLEN[2000/08]
English:METHOD AND APPARATUS FOR DIRECT WRITING OF SEMICONDUCTOR DIE USING MICROCOLUMN ARRAY[2000/08]
French:PROCEDE ET APPAREIL DE GRAVURE DIRECTE DE PUCES DE SEMICONDUCTEUR A L'AIDE D'UN GROUPEMENT DE MICROCOLONNES[2000/08]
Entry into regional phase16.12.1999National basic fee paid 
16.12.1999Designation fee(s) paid 
16.03.2000Examination fee paid 
Examination procedure16.03.2000Examination requested  [2000/20]
01.10.2002Application deemed to be withdrawn, date of legal effect  [2003/16]
05.11.2002Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2003/16]
Fees paidRenewal fee
29.03.2001Renewal fee patent year 03
Penalty fee
Additional fee for renewal fee
31.03.200204   M06   Not yet paid
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Cited inInternational search[Y]US4694178  (HARTE KENNETH J [US]) [Y] 1-5,7,9,11,13-17,19,23 * figure 1 *;
 [YD]  - CHANG T H P ET AL, "ELECTRON-BEAM MICROCOLUMNS FOR LITHOGRAPHY AND RELATED APPLICATIONS", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, (19961101), vol. 14, no. 6, ISSN 0734-211X, pages 3774 - 3781, XP000721110 [YD] 1-5,7,9,11,13-17,19,23 * the whole document *

DOI:   http://dx.doi.org/10.1116/1.588666
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.