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EP1096553
European procedure
Extract from the Register of European Patents
EP About this file: EP1096553
| EP1096553 - ANISOTROPIC ETCHING METHOD [Right-click to bookmark this link] | |||
| Former [2001/18] | ANISOTROPIC ETCHING METHOD AND APPARATUS | ||
| [2010/30] | Status | No opposition filed within time limit Status updated on 04.11.2011 Database last updated on 29.07.2024 | Most recent event Tooltip | 04.11.2011 | No opposition filed within time limit | published on 07.12.2011 [2011/49] | Applicant(s) | For all designated states Mitsubishi Materials Silicon Corporation 5-1, Otemachi 1-chome Chiyoda-ku Tokyo / JP | [2010/52] |
| Former [2001/18] | For all designated states Mitsubishi Materials Silicon Corporation 5-1, Otemachi 1-chome Chiyoda-ku, Tokyo / JP | Inventor(s) | 01 /
OI, Hiroyuki Mitsubishi Materials Silicon Corp. 5--1, Otemachi 1-chome Chiyoda-ku Tokyo 100-0005 / JP | [2001/18] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [2001/18] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 99925400.6 | 22.06.1999 | [2001/18] | WO1999JP03298 | Priority number, date | JP19980178630 | 25.06.1998 Original published format: JP 17863098 | JP19980178631 | 25.06.1998 Original published format: JP 17863198 | [2001/18] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO9967814 | Date: | 29.12.1999 | Language: | EN | [1999/52] | Type: | A1 Application with search report | No.: | EP1096553 | Date: | 02.05.2001 | Language: | EN | The application published by WIPO in one of the EPO official languages on 29.12.1999 takes the place of the publication of the European patent application. | [2001/18] | Type: | B1 Patent specification | No.: | EP1096553 | Date: | 29.12.2010 | Language: | EN | [2010/52] | Search report(s) | International search report - published on: | JP | 29.12.1999 | (Supplementary) European search report - dispatched on: | EP | 12.02.2007 | Classification | IPC: | H01L21/306 | [2001/18] | CPC: |
H01L21/30608 (EP);
H01L21/306 (KR);
H01L21/67086 (EP)
| Designated contracting states | DE [2001/18] | Title | German: | VERFAHREN ZUR ANISOTROPEN CHEMISCHEN ÄTZUNG | [2010/30] | English: | ANISOTROPIC ETCHING METHOD | [2010/30] | French: | PROCEDE D'ATTAQUE CHIMIQUE ANISOTROPE | [2010/30] |
| Former [2001/18] | VERFAHREN UND VORRICHTUNG ZUR ANISOTROPEN CHEMISCHEN ÄTZUNG | ||
| Former [2001/18] | ANISOTROPIC ETCHING METHOD AND APPARATUS | ||
| Former [2001/18] | PROCEDE ET APPAREIL D'ATTAQUE CHIMIQUE ANISOTROPE | Entry into regional phase | 20.12.2000 | Translation filed | 20.12.2000 | National basic fee paid | 20.12.2000 | Search fee paid | 20.12.2000 | Designation fee(s) paid | 20.12.2000 | Examination fee paid | Examination procedure | 13.12.1999 | Request for preliminary examination filed International Preliminary Examining Authority: JP | 20.12.2000 | Examination requested [2001/18] | 12.06.2007 | Despatch of a communication from the examining division (Time limit: M04) | 28.09.2007 | Reply to a communication from the examining division | 11.06.2010 | Date of oral proceedings | 06.07.2010 | Communication of intention to grant the patent | 06.07.2010 | Minutes of oral proceedings despatched | 08.11.2010 | Fee for grant paid | 08.11.2010 | Fee for publishing/printing paid | Opposition(s) | 30.09.2011 | No opposition filed within time limit [2011/49] | Fees paid | Renewal fee | 19.06.2001 | Renewal fee patent year 03 | 26.06.2002 | Renewal fee patent year 04 | 23.06.2003 | Renewal fee patent year 05 | 25.06.2004 | Renewal fee patent year 06 | 29.06.2005 | Renewal fee patent year 07 | 28.06.2006 | Renewal fee patent year 08 | 26.06.2007 | Renewal fee patent year 09 | 26.06.2008 | Renewal fee patent year 10 | 25.06.2009 | Renewal fee patent year 11 | 29.06.2010 | Renewal fee patent year 12 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US5511569 (MUKOGAWA YASUKAZU [JP]) [X] 2,3 * figure 1; example 1 * * figure 7; example 5 *; | [A]JPH10151403 (DAINIPPON SCREEN MFG) [A] 3 * paragraphs [0012] - [0014]; figure 1 * | International search | [A]JPH05198555 (HITACHI LTD, et al); | [X]JPH0566714U ; | [X]JPH09266193 (SHINETSU HANDOTAI KK, et al) |