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Extract from the Register of European Patents

EP About this file: EP1088340

EP1088340 - FABRICATION OF GALLIUM NITRIDE SEMICONDUCTOR LAYERS BY LATERAL GROWTH FROM TRENCH SIDEWALLS [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  04.01.2019
Database last updated on 06.07.2024
FormerExamination is in progress
Status updated on  29.06.2018
Most recent event   Tooltip11.01.2019Change - classificationpublished on 13.02.2019  [2019/07]
Applicant(s)For all designated states
NORTH CAROLINA STATE UNIVERSITY
103 Holladay Hall, Campus Box 7003 Raleigh
North Carolina 27695-7003 / US
[N/P]
Former [2001/14]For all designated states
NORTH CAROLINA STATE UNIVERSITY
103 Holladay Hall, Campus Box 7003
Raleigh, North Carolina 27695-7003 / US
Inventor(s)01 / ZHELEVA, Tsvetanka
2109 Copeland Way
Chapel Hill, NC 27514 / US
02 / THOMSON, Darren, B.
312-D Bargate Drive
Cary, NC 27511 / US
03 / SMITH, Scott, A.
505 Crawley Run 101
Centerville, OH 45458 / US
04 / LINTHICUM, Kevin, J.
474 Crosslink Drive
Angier, NC 27501 / US
05 / GEHRKE, Thomas
116B Bim Street
Carrboro, NC 27510 / US
06 / DAVIS, Robert, F.
5705 Calton Drive
Raleigh, NC 27612 / US
 [2001/14]
Representative(s)HGF
1 City Walk
Leeds LS11 9DX / GB
[N/P]
Former [2011/16]Chalk, Anthony John, et al
Harrison Goddard Foote 106 Micklegate
York, Yorkshire YO1 6JX / GB
Former [2001/14]Sanderson, Nigel Paul
Harrison Goddard Foote, Tower House, Merrion Way
Leeds LS2 8PA / GB
Application number, filing date99928515.809.06.1999
[2001/14]
WO1999US12967
Priority number, dateUS19980088761P10.06.1998         Original published format: US 88761 P
US1999032713607.06.1999         Original published format: US 327136
[2001/50]
Former [2001/14]US19980088761P10.06.1998
US1999032713607.03.1999
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO9965068
Date:16.12.1999
Language:EN
[1999/50]
Type: A1 Application with search report 
No.:EP1088340
Date:04.04.2001
Language:EN
The application published by WIPO in one of the EPO official languages on 16.12.1999 takes the place of the publication of the European patent application.
[2001/14]
Search report(s)International search report - published on:EP16.12.1999
ClassificationIPC:H01L21/20, C30B25/04, C30B29/40
[2001/14]
CPC:
H01L21/0265 (EP,US); H01L21/18 (KR); H01L21/02378 (EP,US);
H01L21/02458 (EP,US); H01L21/0254 (EP,US); H01L21/0262 (EP,US);
H01L21/02639 (EP,US); H01L21/02647 (EP,US); H01S2304/12 (EP,US);
H01S5/021 (EP,US) (-)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2001/14]
TitleGerman:HERSTELLUNG VON GALLIUMNITRID-HALBLEITERSCHICHTEN MITTELS LATERALEM WACHSTUM, AUSGEHEND VON GRABEN-SEITENWÄNDEN[2001/14]
English:FABRICATION OF GALLIUM NITRIDE SEMICONDUCTOR LAYERS BY LATERAL GROWTH FROM TRENCH SIDEWALLS[2001/14]
French:FABRICATION DE COUCHES SEMI-CONDUCTRICES DE NITRURE DE GALLIUM PAR TIRAGE LATERAL A PARTIR DE PAROIS LATERALES DE TRANCHEE[2001/14]
Entry into regional phase10.01.2001National basic fee paid 
10.01.2001Designation fee(s) paid 
10.01.2001Examination fee paid 
Examination procedure18.11.1999Request for preliminary examination filed
International Preliminary Examining Authority: EP
10.01.2001Amendment by applicant (claims and/or description)
10.01.2001Examination requested  [2001/14]
23.05.2006Despatch of a communication from the examining division (Time limit: M04)
02.10.2006Reply to a communication from the examining division
25.02.2015Despatch of a communication from the examining division (Time limit: M04)
24.06.2015Reply to a communication from the examining division
19.06.2018Despatch of a communication from the examining division (Time limit: M02)
30.08.2018Application deemed to be withdrawn, date of legal effect  [2019/06]
26.09.2018Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2019/06]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  23.05.2006
Fees paidRenewal fee
27.06.2001Renewal fee patent year 03
12.06.2002Renewal fee patent year 04
12.06.2003Renewal fee patent year 05
14.06.2004Renewal fee patent year 06
14.06.2005Renewal fee patent year 07
14.06.2006Renewal fee patent year 08
14.06.2007Renewal fee patent year 09
25.06.2008Renewal fee patent year 10
26.06.2009Renewal fee patent year 11
25.06.2010Renewal fee patent year 12
27.06.2011Renewal fee patent year 13
26.06.2012Renewal fee patent year 14
27.06.2013Renewal fee patent year 15
30.06.2014Renewal fee patent year 16
29.06.2015Renewal fee patent year 17
27.06.2016Renewal fee patent year 18
27.06.2017Renewal fee patent year 19
27.06.2018Renewal fee patent year 20
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Cited inInternational search[A]EP0551721  (AMANO HIROSHI [JP], et al) [A] 1,3-5,7,10,13,14,16,18,21,26,29,30,32,35,36,41,43 * page 4, line 32 - page 6, line 22; figure 4 *;
 [DA]  - NAM O-H ET AL, "GROWTH OF GAN AND AL0.2GA0.8N ON PATTERENED SUBSTRATES VIA ORGANOMETALLIC VAPOR PHASE EPITAXY", JAPANESE JOURNAL OF APPLIED PHYSICS, (19970501), vol. 36, no. 5A, ISSN 0021-4922, pages L532 - L535, XP000728854 [DA] 1,10 * page L532 *

DOI:   http://dx.doi.org/10.1143/JJAP.36.L532
 [PXO]  - ZHELEVA T S ET AL, "Pendeo-epitaxy - A new approach for lateral growth of gallium nitride structures", MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH, 1999, Fall Meeting of the Materials Research Society, Boston, vol. 4S1, no. G3.38, ISSN 1092-5783, (19981130), URL: http://nsr.mij.mrs.org/4S1/G3.38, (19990928), XP002117241 [PXO] 1-21,26,29-36,41-45 * the whole document *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.