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EP About this file: EP1043763

EP1043763 - VAPOR GROWTH APPARATUS FOR SEMICONDUCTOR WAFERS WITH DOPANT GAS FEED ASSEMBLY [Right-click to bookmark this link]
Former [2000/41]	SEMICONDUCTOR WAFER AND VAPOR GROWTH APPARATUS
	[2010/26]
Status	No opposition filed within time limit Status updated on 11.11.2011 Database last updated on 16.09.2024
Most recent event Tooltip	16.12.2011	Lapse of the patent in a contracting state	published on 18.01.2012 [2012/03]
Applicant(s)	For all designated states Shin-Etsu Handotai Co., Ltd. 6-2, Ohtemachi 2-chome Chiyoda-ku Tokyo / JP
	[2009/17]
Former [2000/41]	For all designated states Shin-Etsu Handotai Co., Ltd 4-2 Marunouchi 1-chome, Chiyoda-ku Tokyo 100-0005 / JP
Inventor(s)	01 / OSE, Hiroki c/o Shin-Etsu Handotai Co., Ltd. Isobe Plant, 2-13-1, Isobe Annaka-shi, Gumma 379-0196 / JP
	[2011/01]
Former [2000/41]	01 / OSE, Hiroki Shin-Etsu Handotai Co., Ltd. Isobe Plant 2-13-1, Isobe Annaka-shi, Gumma 379-0196 / JP
Representative(s)	Merkle, Gebhard, et al Ter Meer Steinmeister & Partner Patentanwälte mbB Mauerkircherstrasse 45 81679 München / DE
	[N/P]
Former [2000/41]	Merkle, Gebhard, et al TER MEER STEINMEISTER & PARTNER GbR, Patentanwälte, Mauerkircherstrasse 45 81679 München / DE
Application number, filing date	99952798.9	28.10.1999
	[2000/41]
	WO1999JP05968
Priority number, date	JP19980326034	29.10.1998 Original published format: JP 32603498
	[2000/41]
Filing language	JA
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO0026948
	Date:	11.05.2000
	Language:	EN
	[2000/19]
	Type:	A1 Application with search report
	No.:	EP1043763
	Date:	11.10.2000
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 11.05.2000 takes the place of the publication of the European patent application.
	[2000/41]
	Type:	B1 Patent specification
	No.:	EP1043763
	Date:	05.01.2011
	Language:	EN
	[2011/01]
Search report(s)	International search report - published on:	JP	11.05.2000
	(Supplementary) European search report - dispatched on:	EP	05.07.2006
Classification	IPC:	H01L21/205, H01L21/22, C30B23/02, C30B23/04, C30B23/06, C30B23/08, C23C16/44	[2000/41]
	CPC:	C23C16/45563 (EP,US); C23C16/45574 (EP,KR,US); C23C16/45561 (EP,KR,US); C30B25/14 (EP,KR,US); C30B29/06 (EP,KR,US); H01L21/02381 (EP,KR,US); (+) H01L21/02579 (EP,KR,US); H01L21/0262 (EP,KR,US); H01L21/02532 (EP,US); Y10T428/12528 (EP,US); Y10T428/21 (EP,US); Y10T428/31 (EP,US) (-)
Designated contracting states	DE, FR, GB, IT [2004/20]
Former [2000/41]	AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE
Title	German:	VORRICHTUNG ZUR GASPHASENABSCHEIDUNG FÜR HALBLEITERSCHEIBEN MIT DOTIERGAS-ZUFUHREINRICHTUNG	[2010/34]
	English:	VAPOR GROWTH APPARATUS FOR SEMICONDUCTOR WAFERS WITH DOPANT GAS FEED ASSEMBLY	[2010/26]
	French:	DISPOSITIF DE CROISSANCE EN PHASE VAPEUR POUR PLAQUETTES SEMICONDUCTRICES AVEC SYSTEME D'ALIMENTATION EN GAZ DOPANT	[2010/26]
	Former [2000/41]	HALBLEITERSCHEIBE UND ABSCHEIDUNGSAPPARAT FÜR ABSCHEIDUNGEN AUS DER GAS-PHASE
	Former [2000/41]	SEMICONDUCTOR WAFER AND VAPOR GROWTH APPARATUS
	Former [2000/41]	PLAQUETTE A SEMI-CONDUCTEUR ET DISPOSITIF DE CRISTALLISATION EN PHASE VAPEUR
Entry into regional phase	27.06.2000	Translation filed
	28.06.2000	National basic fee paid
	28.06.2000	Search fee paid
	28.06.2000	Designation fee(s) paid
	28.06.2000	Examination fee paid
Examination procedure	28.06.2000	Examination requested [2000/41]
	16.03.2009	Despatch of a communication from the examining division (Time limit: M04)
	07.07.2009	Reply to a communication from the examining division
	04.08.2010	Communication of intention to grant the patent
	22.11.2010	Fee for grant paid
	22.11.2010	Fee for publishing/printing paid
Opposition(s)	06.10.2011	No opposition filed within time limit [2011/50]
Fees paid	Renewal fee
	18.10.2001	Renewal fee patent year 03
	15.10.2002	Renewal fee patent year 04
	15.10.2003	Renewal fee patent year 05
	18.10.2004	Renewal fee patent year 06
	20.10.2005	Renewal fee patent year 07
	17.10.2006	Renewal fee patent year 08
	19.10.2007	Renewal fee patent year 09
	23.10.2008	Renewal fee patent year 10
	22.10.2009	Renewal fee patent year 11
	25.10.2010	Renewal fee patent year 12
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition Tooltip	IT	05.01.2011
	[2012/03]
Documents cited:	Search	[YA]JPS61101020 ;
		[PX]JPH11238688 ;
		[XY]EP0637058 (APPLIED MATERIALS INC [US]) [X] 7,9 * column 1, line 18 - column 2, line 5; figure 1 * * column 6, line 6 - line 20; figure 6 * * column 7, line 23 - line 52; figure 7 * * column 7, line 53 - column 8, line 12; figure 8 * [Y] 8,11;
		[YA]US5487358 (OHTA YUTAKA [JP], et al) [Y] 1-6,11 * column 1, line 15 - line 33; figure 7 * * column 4, line 26 - column 5, line 19; figure 1 * * column 5, line 35 - line 63 * * column 6, line 15 - line 42; figures 5,6 * * column 6, line 54 - line 59 * [A] 7-9;
		[Y]EP0784106 (TOSHIBA CERAMICS CO [JP], et al) [Y] 1-6 * examples 2-5; table 1 *;
		[XY]DE19801439 (SEH AMERICA INC [US]) [X] 7,9 * page 2, line 3 - line 6 * * page 2, line 47 - line 67 * * page 3, line 6 - line 18 * * page 3, line 47 - page 4, line 6; figure 1 * * page 5, line 1 - line 28; figure 4 * * page 6, line 48 - line 66; figure 7 * [Y] 1-6,8,11
		[YA] - PATENT ABSTRACTS OF JAPAN, (19860926), vol. 010, no. 283, Database accession no. (E - 440), & JP61101020 A 19860519 (HITACHI LTD) [Y] 8 * abstract * [A] 7,9-11
		[PX] - PATENT ABSTRACTS OF JAPAN, (19991130), vol. 1999, no. 13, & JP11238688 A 19990831 (SHIN ETSU HANDOTAI CO LTD) [PX] 1-6 * abstract * * paragraph [0033] - paragraph [0035] * * paragraph [0032] - paragraph [0035] *
	International search	[A]JPS5936927 (HITACHI LTD);
		[A]JPH05226263 (NEC CORP);
		[A]EP0784106 (TOSHIBA CERAMICS CO [JP], et al);
		[A]US5755878 (HABUKA HITOSHI [JP], et al)

The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.

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