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Extract from the Register of European Patents

EP About this file: EP1054297

EP1054297 - PHOTORESIST STRIPPER AND METHOD OF STRIPPING [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  18.07.2008
Database last updated on 15.06.2024
Most recent event   Tooltip15.08.2008Change - representativepublished on 17.09.2008  [2008/38]
Applicant(s)For all designated states
AZ Electronic Materials USA Corp.
70 Meister Avenue
Somerville, NJ 08876 / US
[2005/06]
Former [2001/29]For all designated states
Clariant Finance (BVI) Limited
Citco Building, Wickhams Cay
Road Town, Tortola / VG
Former [2000/47]For all designated states
Clariant International Ltd.
Rothausstrasse 61
4132 Muttenz 1 / CH
Inventor(s)01 / TAKEDA, Takashi Clariant (Japan) K.K.
3810, Chihama Daitocho
Ogasa-gun Shizuoka 437-1496 / JP
02 / ARANO, Akio
Daisan Monseribah 201, 18-8, Segawa 2-chome
Minoo-shi, Osaka 562-0045 / JP
[2000/47]
Representative(s)Isenbruck, Günter, et al
Patentanwälte
Isenbruck Bösl Hörschler PartG mbB
Eastsite One
Seckenheimer Landstrasse 4
68163 Mannheim / DE
[N/P]
Former [2008/38]Isenbruck, Günter, et al
Isenbruck, Bösl, Hörschler, Wichmann, Huhn Patentanwälte Theodor-Heuss-Anlage 12
68165 Mannheim / DE
Former [2005/06]Isenbruck, Günter, et al
Isenbruck, Bösl, Hörschler, Wichmann, Huhn, Patentanwälte Theodor-Heuss-Anlage 12
68165 Mannheim / DE
Former [2000/47]Hütter, Klaus, Dr., et al
Clariant GmbH Patente, Marken, Lizenzen Am Unisys-Park 1
65843 Sulzbach / DE
Application number, filing date99957400.701.12.1999
[2000/47]
WO1999JP06728
Priority number, dateJP1998034408903.12.1998         Original published format: JP 34408998
[2000/47]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO0033139
Date:08.06.2000
Language:EN
[2000/23]
Type: A1 Application with search report 
No.:EP1054297
Date:22.11.2000
Language:EN
The application published by WIPO in one of the EPO official languages on 08.06.2000 takes the place of the publication of the European patent application.
[2000/47]
Search report(s)International search report - published on:JP08.06.2000
(Supplementary) European search report - dispatched on:EP04.03.2002
ClassificationIPC:G03F7/42, H01L21/027
[2000/47]
CPC:
G03F7/425 (EP,KR); G03F7/0392 (KR); G03F7/091 (KR);
G03F7/34 (KR); G03F7/422 (KR); G03F7/426 (EP,KR)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2000/47]
TitleGerman:PHOTORESISTENTSCHICHTUNGSMITTEL UND ENTSCHICHTUNGSVERFAHREN[2000/47]
English:PHOTORESIST STRIPPER AND METHOD OF STRIPPING[2000/47]
French:AGENT DE DECOLLEMENT DE PHOTORESIST, ET PROCEDE DE DECOLLEMENT ASSOCIE[2000/47]
Entry into regional phase27.07.2000Translation filed 
04.09.2000National basic fee paid 
04.09.2000Search fee paid 
08.12.2000Designation fee(s) paid 
08.12.2000Examination fee paid 
Examination procedure08.12.2000Examination requested  [2001/05]
22.10.2007Despatch of a communication from the examining division (Time limit: M04)
04.04.2008Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2008/34]
01.07.2008Application deemed to be withdrawn, date of legal effect  [2008/34]
Fees paidRenewal fee
02.01.2002Renewal fee patent year 03
02.01.2003Renewal fee patent year 04
02.01.2004Renewal fee patent year 05
03.01.2005Renewal fee patent year 06
23.12.2005Renewal fee patent year 07
29.12.2006Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.12.200709   M06   Not yet paid
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Documents cited:Search   [ ] - No further relevant documents disclosed
International search[X]DE3828513  (MERCK PATENT GMBH [DE]);
 [A]JPH06250405  (HITACHI CHEMICAL CO LTD);
 [A]JPS491444
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.