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Extract from the Register of European Patents

EP About this file: EP1041406

EP1041406 - Microstructure array, and methods of fabricating a microstructure array, a mold for forming a microstructure array, and a microlens array [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  02.09.2005
Database last updated on 20.09.2024
Most recent event   Tooltip27.07.2007Lapse of the patent in a contracting state
New state(s): IT
published on 29.08.2007  [2007/35]
Applicant(s)For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
[N/P]
Former [2000/40]For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
Inventor(s)01 / Teshima, Takayuki, c/o Canon Kabushiki Kaisha
30-2, Shimomaruko 3-chome
Ohta-ku, Tokyo / JP
02 / Yagi, Takayuki, c/o Canon Kabushiki Kaisha
30-2, Shimomaruko 3-chome
Ohta-ku, Tokyo / JP
[2000/40]
Representative(s)TBK
Bavariaring 4-6
80336 München / DE
[N/P]
Former [2005/34]TBK-Patent
Bavariaring 4-6
80336 München / DE
Former [2000/40]Leson, Thomas Johannes Alois, Dipl.-Ing., et al
Patentanwälte Tiedtke-Bühling-Kinne & Partner, Bavariaring 4
80336 München / DE
Application number, filing date00106860.030.03.2000
[2000/40]
Priority number, dateJP1999009443601.04.1999         Original published format: JP 9443699
[2000/40]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1041406
Date:04.10.2000
Language:EN
[2000/40]
Type: B1 Patent specification 
No.:EP1041406
Date:27.10.2004
Language:EN
[2004/44]
Search report(s)(Supplementary) European search report - dispatched on:EP05.07.2000
ClassificationIPC:G02B3/00, B29D11/00
[2004/20]
CPC:
B81C1/00 (KR); G02B3/0012 (EP,US); G02B3/0031 (EP,US);
G02B3/0056 (EP,US)
Former IPC [2000/40]G02B3/00
Designated contracting statesCH,   DE,   FR,   GB,   IT,   LI [2001/25]
Former [2000/40]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Mikrostrukturanordnung und Verfahren, Gerät und Form zur Erzeugung der Mikrostrukturanordnung[2000/40]
English:Microstructure array, and methods of fabricating a microstructure array, a mold for forming a microstructure array, and a microlens array[2000/40]
French:Arrangement de microstructure & dispositif, procédé et moule de fabrication de l'arrangement de microstructure[2000/40]
Examination procedure14.02.2001Examination requested  [2001/15]
30.10.2002Despatch of a communication from the examining division (Time limit: M06)
30.04.2003Reply to a communication from the examining division
21.05.2003Despatch of a communication from the examining division (Time limit: M04)
25.09.2003Reply to a communication from the examining division
05.11.2003Despatch of a communication from the examining division (Time limit: M04)
08.03.2004Reply to a communication from the examining division
14.04.2004Communication of intention to grant the patent
23.08.2004Fee for grant paid
23.08.2004Fee for publishing/printing paid
Opposition(s)28.07.2005No opposition filed within time limit [2005/42]
Fees paidRenewal fee
27.03.2002Renewal fee patent year 03
31.03.2003Renewal fee patent year 04
31.03.2004Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipCH27.10.2004
FR27.10.2004
IT27.10.2004
LI27.10.2004
GB30.03.2005
[2007/35]
Former [2006/32]CH27.10.2004
FR27.10.2004
LI27.10.2004
GB30.03.2005
Former [2006/13]CH27.10.2004
LI27.10.2004
GB30.03.2005
Former [2005/25]CH27.10.2004
LI27.10.2004
Documents cited:Search[DA]JPH08258051  ;
 [DA]JPH01261601  ;
 [DA]JPH05303009  ;
 [A]US5466926  (SASANO NOBUSUKE [JP], et al) [A] 1,11 * column 3, line 26 - line 48 *;
 [A]EP0450780  (MATSUSHITA ELECTRIC IND CO LTD [JP]) [A] 1,11 * column 2, line 25 - column 3, line 15 *;
 [A]US5536455  (AOYAMA SHIGERU [JP], et al) [A] 1,11 * column 3, line 11 - column 4, line 40 *
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19970228), vol. 1997, no. 02, & JP08258051 A 19961008 (VICTOR CO OF JAPAN LTD) [DA] 1,11 * abstract *
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19900112), vol. 014, no. 015, Database accession no. (P - 989), & JP01261601 A 19891018 (OMRON TATEISI ELECTRON CO) [DA] 1,11 * abstract *
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19940221), vol. 018, no. 106, Database accession no. (P - 1697), & JP05303009 A 19931116 (DAINIPPON PRINTING CO LTD) [DA] 1,11 * abstract *
ExaminationJPS6054819
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.