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EP1081489
European procedure
Extract from the Register of European Patents
EP About this file: EP1081489
| EP1081489 - System for reticle inspection by photolithography simulation [Right-click to bookmark this link] | |||
| Former [2001/10] | Method and system for reticle inspection by photolithography simulation | ||
| [2004/29] | Status | No opposition filed within time limit Status updated on 21.10.2005 Database last updated on 11.09.2024 | Most recent event Tooltip | 21.10.2005 | No opposition filed within time limit | published on 07.12.2005 [2005/49] | Applicant(s) | For all designated states Applied Materials, Inc. P.O. Box 450A Santa Clara, California 95052 / US | [N/P] |
| Former [2001/10] | For all designated states Applied Materials, Inc. P.O. Box 450A Santa Clara, California 95052 / US | Inventor(s) | 01 /
Karpol, Avner 4g Nave Nir Nes Ziona / IL | 02 /
Kenan, Boaz 38 High Street Rehovot / IL | [2001/10] | Representative(s) | Zimmermann, Gerd Heinrich, et al Zimmermann & Partner Patentanwälte mbB Postfach 330 920 80069 München / DE | [N/P] |
| Former [2001/10] | Zimmermann, Gerd Heinrich, et al Zimmermann & Partner, P.O. Box 33 09 20 80069 München / DE | Application number, filing date | 00118878.8 | 31.08.2000 | [2001/10] | Priority number, date | US19990390503 | 03.09.1999 Original published format: US 390503 | [2001/10] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1081489 | Date: | 07.03.2001 | Language: | EN | [2001/10] | Type: | A3 Search report | No.: | EP1081489 | Date: | 15.05.2002 | [2002/20] | Type: | B1 Patent specification | No.: | EP1081489 | Date: | 15.12.2004 | Language: | EN | [2004/51] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 28.03.2002 | Classification | IPC: | G01N21/956 | [2001/10] | CPC: |
G01N21/95607 (EP,US);
G03F1/84 (EP,US);
G03F7/70125 (EP,US);
G03F7/70358 (EP,US);
G03F7/705 (EP,US);
G03F7/70591 (EP,US);
G03F7/70666 (EP,US)
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| Designated contracting states | DE [2003/06] |
| Former [2001/10] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Vorrichtung zur Photomaskeninspektion mittels Photolithographiesimulation | [2004/29] | English: | System for reticle inspection by photolithography simulation | [2004/29] | French: | Appareil pour l'inspection d'un réticule par simulation de photolithographie | [2004/29] |
| Former [2001/10] | Verfahren und Vorrichtung zur Photomaskinspektion mittels Photolithographiesimulation | ||
| Former [2001/10] | Method and system for reticle inspection by photolithography simulation | ||
| Former [2001/10] | Méthode et appareil pour l'inspection d'un réticule par simulation de photolithographie | Examination procedure | 22.10.2002 | Examination requested [2003/01] | 24.11.2003 | Despatch of a communication from the examining division (Time limit: M04) | 24.03.2004 | Reply to a communication from the examining division | 25.06.2004 | Communication of intention to grant the patent | 08.10.2004 | Fee for grant paid | 08.10.2004 | Fee for publishing/printing paid | Opposition(s) | 16.09.2005 | No opposition filed within time limit [2005/49] | Fees paid | Renewal fee | 29.08.2002 | Renewal fee patent year 03 | 06.08.2003 | Renewal fee patent year 04 | 06.08.2004 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [DA]US5563702 (EMERY DAVID G [US], et al) [DA] 1-3,10-12 * column 7, line 32 - column 9, line 46; figures 1,2 *; | [DA]EP0628806 (IBM [US]) [DA] 1-3,5-7,16,17 * column 4, line 16 - column 7, line 27; figure 2 *; | [A]US4595289 (FELDMAN MARTIN [US], et al) [A] 13,14 * abstract * |