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Extract from the Register of European Patents

EP About this file: EP1098328

EP1098328 - Method of manufacturing a sintered anode unit for a solid electrolytic capacitor, continuous sintering apparatus and method of manufacturing secondary particles of a valve-action metal powder [Right-click to bookmark this link]
Former [2001/19]Method of manufacturing solid electrolytic capacitors
[2007/37]
StatusNo opposition filed within time limit
Status updated on  29.05.2009
Database last updated on 31.08.2024
Most recent event   Tooltip29.05.2009No opposition filed within time limitpublished on 01.07.2009  [2009/27]
Applicant(s)For all designated states
Nec Tokin Corporation
7-1, Koriyama 6-chome, Taihaku-ku Sendai-shi
Miyagi / JP
[2008/30]
Former [2002/37]For all designated states
Nec Tokin Corporation
7-1, Koriyama 6-chome, Taihaku-ku
Sendai-shi, Miyagi / JP
Former [2001/19]For all designated states
NEC CORPORATION
7-1, Shiba 5-chome, Minato-ku
Tokyo / JP
Inventor(s)01 / Satou, Hideaki
NEC Tokin Corporation, 7-1, Koriyama 6-chome
Taihaku-ku, Sendai-shi Miyagi / JP
02 / Ida, Yoshio
NEC Tokin Corporation, 7-1, Koriyama 6-chome
Taihaku-ku, Sendai-shi Miyagi / JP
 [2007/46]
Former [2001/19]01 / Satou, Hideaki
NEC Corporation, 7-1, Shiba 5-chome
Minato-ku, Tokyo / JP
02 / Ida, Yoshio
NEC Corporation, 7-1, Shiba 5-chome
Minato-ku, Tokyo / JP
Representative(s)Glawe, Delfs, Moll
Partnerschaft mbB von
Patent- und Rechtsanwälten
Postfach 26 01 62
80058 München / DE
[N/P]
Former [2001/19]Glawe, Delfs, Moll & Partner
Patentanwälte Postfach 26 01 62
80058 München / DE
Application number, filing date00123870.802.11.2000
[2001/19]
Priority number, dateJP1999031333904.11.1999         Original published format: JP 31333999
[2001/19]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1098328
Date:09.05.2001
Language:EN
[2001/19]
Type: A3 Search report 
No.:EP1098328
Date:31.05.2006
[2006/22]
Type: B1 Patent specification 
No.:EP1098328
Date:23.07.2008
Language:EN
[2008/30]
Search report(s)(Supplementary) European search report - dispatched on:EP13.04.2006
ClassificationIPC:H01G9/052, H01G9/15
[2006/22]
CPC:
H01G9/052 (EP,US)
Former IPC [2001/19]H01G9/15
Designated contracting statesDE,   GB [2007/06]
Former [2001/19]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Verfahren zur Herstellung einer gesinterten Anodeneinheit für einen Festelektrolytkondensator, kontinuierliches Sinterapparat und Verfahren zur Herstellung von sekundären Partikeln eines Ventilmetallpulvers[2007/44]
English:Method of manufacturing a sintered anode unit for a solid electrolytic capacitor, continuous sintering apparatus and method of manufacturing secondary particles of a valve-action metal powder[2007/37]
French:Méthode de fabrication d'une unité d'anode frittée pour condensateur à électrolyte solide, appareil de frittage en continu et méthode de fabrication de particules secondaires d'une poudre de métal à action de valve[2007/37]
Former [2001/19]Herstellungsverfahren von Festelektrolytkondensatoren
Former [2001/19]Method of manufacturing solid electrolytic capacitors
Former [2001/19]Méthode de fabrication de condensateurs à électrolyte solide
Examination procedure21.04.2006Examination requested  [2006/23]
22.12.2006Despatch of a communication from the examining division (Time limit: M06)
02.07.2007Reply to a communication from the examining division
15.10.2007Communication of intention to grant the patent
25.02.2008Fee for grant paid
25.02.2008Fee for publishing/printing paid
02.04.2008Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time
Opposition(s)24.04.2009No opposition filed within time limit [2009/27]
Request for further processing for:The application is deemed to be withdrawn due to failure to fulfill actions required for granting the patent
02.06.2008Request for further processing filed
02.06.2008Full payment received (date of receipt of payment)
Fees paidRenewal fee
21.11.2002Renewal fee patent year 03
20.11.2003Renewal fee patent year 04
23.11.2004Renewal fee patent year 05
21.11.2005Renewal fee patent year 06
21.11.2006Renewal fee patent year 07
26.11.2007Renewal fee patent year 08
28.03.2008Renewal fee patent year 09
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Documents cited:Search[A]JPH08162372  ;
 [A]JPS5839703  ;
 [DA]JPH02310301  ;
 [DA]JPH0239417  ;
 [A]US4534935  (AMBROSE JOHN [CA], et al) [A] 1-3,5,6,8-10,12 * example -; claim - *;
 [A]US5448447  (CHANG HONGJU [US]) [A] 1-3,5-12 * example -; claim - *;
 [A]US5456878  (TADOKORO HIROKAZU [JP], et al) [A] 1,5,6,8,9 * claim - *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19961031), vol. 1996, no. 10, & JP08162372 A 19960621 (NEC CORP) [A] 1,2,6,8,10 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19830528), vol. 007, no. 124, Database accession no. (M - 218), & JP58039703 A 19830308 (NEC CORP) [A] 1,6,8-10 * abstract *
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19910308), vol. 015, no. 097, Database accession no. (M - 1090), & JP02310301 A 19901226 (SHOWA KIYABOTSUTO SUUPAA METAL KK) [DA] 1,2,6,8,10 * abstract *
 [DA]  - PATENT ABSTRACTS OF JAPAN, (19900418), vol. 014, no. 190, Database accession no. (E - 0918), & JP02039417 A 19900208 (MARCON ELECTRON CO LTD) [DA] 1,6 * abstract *
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