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EP1120690
European procedure
Extract from the Register of European Patents
EP About this file: EP1120690
| EP1120690 - EUV reticle thermal management [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 19.06.2009 Database last updated on 31.08.2024 | Most recent event Tooltip | 04.07.2014 | Lapse of the patent in a contracting state New state(s): IT | published on 06.08.2014 [2014/32] | Applicant(s) | For all designated states ASML Holding N.V. De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2008/28] | For all designated states ASML Holding N.V. De Run 6501 5504 DR Veldhoven / NL | ||
| Former [2001/31] | For all designated states SVG LITHOGRAPHY SYSTEMS, INC. 77 Danbury Road Wilton, Connecticut 06897-0877 / US | Inventor(s) | 01 /
McCullough, Andrew W. 20 Aunt Park Lane Newtown, Connecticut 06470 / US | [2001/31] | Representative(s) | van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/08] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2001/31] | Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München / DE | Application number, filing date | 00128004.9 | 20.12.2000 | [2001/31] | Priority number, date | US19990473259 | 27.12.1999 Original published format: US 473259 | [2001/31] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1120690 | Date: | 01.08.2001 | Language: | EN | [2001/31] | Type: | A3 Search report | No.: | EP1120690 | Date: | 15.12.2004 | [2004/51] | Type: | B1 Patent specification | No.: | EP1120690 | Date: | 13.08.2008 | Language: | EN | [2008/33] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.11.2004 | Classification | IPC: | G03F7/20 | [2001/31] | CPC: |
G03F7/70866 (EP,US);
H01L21/027 (KR)
| Designated contracting states | DE, FR, GB, IT, NL [2005/36] |
| Former [2001/31] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Wärmeverwaltung für EUV-Retikel | [2001/31] | English: | EUV reticle thermal management | [2001/31] | French: | Gestion thermique de réticule pour l'ultraviolet extrême | [2001/31] | Examination procedure | 04.03.2005 | Examination requested [2005/18] | 03.06.2005 | Despatch of a communication from the examining division (Time limit: M04) | 13.10.2005 | Reply to a communication from the examining division | 06.10.2006 | Despatch of a communication from the examining division (Time limit: M04) | 16.02.2007 | Reply to a communication from the examining division | 04.02.2008 | Cancellation of oral proceeding that was planned for 06.02.2008 | 04.02.2008 | Minutes of oral proceedings despatched | 06.02.2008 | Date of oral proceedings | 06.02.2008 | Date of oral proceedings (cancelled) | 14.02.2008 | Communication of intention to grant the patent | 20.06.2008 | Fee for grant paid | 20.06.2008 | Fee for publishing/printing paid | Opposition(s) | 14.05.2009 | No opposition filed within time limit [2009/30] | Fees paid | Renewal fee | 27.12.2002 | Renewal fee patent year 03 | 03.12.2003 | Renewal fee patent year 04 | 07.12.2004 | Renewal fee patent year 05 | 13.12.2005 | Renewal fee patent year 06 | 12.12.2006 | Renewal fee patent year 07 | 13.12.2007 | Renewal fee patent year 08 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | GB | 20.12.2008 | IT | 20.12.2008 | [2014/32] |
| Former [2010/01] | GB | 20.12.2008 | Documents cited: | Search | [XY]JPH05291117 ; | [XAY]JPH06177003 ; | [Y]JPS63194332 ; | [XAY]US5390228 (NIIBE MASAHITO [JP], et al) [X] 1-3 * abstract * * figure 8 * * column 4, lines 35-37 * * column 10, lines 9-19,25-36 * [A] 5,6 [Y] ; | [A]US5390227 (MIZUSAWA NOBUTOSHI [JP], et al) [A] 1-23* the whole document * | [XY] - PATENT ABSTRACTS OF JAPAN, (19940208), vol. 018, no. 077, Database accession no. (E - 1504), & JP05291117 A 19931105 (HITACHI LTD) [X] 4,15,17,20,21 * abstract * * paragraphs [0009] , [0015] * * figures 1,3 * [Y] 5,6,8,11,12,16,18 | [XAY] - PATENT ABSTRACTS OF JAPAN, (19940922), vol. 018, no. 507, Database accession no. (E - 1609), & JP06177003 A 19940624 (HITACHI LTD) [X] 23 * abstract * * figures 2,3 * * paragraph [0017] * * claim 7 * [A] 13 [Y] 8,11,16,18 | [Y] - PATENT ABSTRACTS OF JAPAN, (19881212), vol. 012, no. 474, Database accession no. (E - 692), & JP63194332 A 19880811 (CANON INC) [Y] 12 * abstract * * figures 1,3 * |