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EP1110720
European procedure
Extract from the Register of European Patents
EP About this file: EP1110720
| EP1110720 - Method of making a lithographic printing plate [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 03.11.2006 Database last updated on 13.11.2024 | Most recent event Tooltip | 03.11.2006 | No opposition filed within time limit | published on 06.12.2006 [2006/49] | Applicant(s) | For all designated states AGFA-GEVAERT Septestraat 27 2640 Mortsel / BE | [2005/52] |
| Former [2002/08] | For all designated states Agfa-Gevaert Septestraat 27 2640 Mortsel / BE | ||
| Former [2001/26] | For all designated states AGFA-GEVAERT N.V. Septestraat 27 2640 Mortsel / BE | Inventor(s) | 01 /
Van Damme, Marc, c/o Agfa-Gevaert N.V. Corporate IP Department 3800, Septestraat 27 2640 Mortsel / BE | 02 /
Vermeersch, Joan, c/o Agfa-Gevaert N.V. Corporate IP Department 3800, Septestraat 27 2640 Mortsel / BE | [2001/26] | Application number, filing date | 00204064.0 | 17.02.1998 | [2001/26] | Priority number, date | US19970040408P | 11.03.1997 Original published format: US 40408 P | [2001/26] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1110720 | Date: | 27.06.2001 | Language: | EN | [2001/26] | Type: | A3 Search report | No.: | EP1110720 | Date: | 11.07.2001 | [2001/28] | Type: | B1 Patent specification | No.: | EP1110720 | Date: | 28.12.2005 | Language: | EN | [2005/52] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 29.05.2001 | Classification | IPC: | B41C1/10 | [2001/26] | CPC: |
B41C1/1016 (EP);
B41C2201/04 (EP);
B41C2210/02 (EP);
B41C2210/06 (EP);
B41C2210/14 (EP);
B41C2210/24 (EP);
B41C2210/262 (EP)
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| Designated contracting states | BE, DE, FR, GB [2001/26] | Title | German: | Verfahren zur Herstellung einer lithographischen Druckplatte | [2001/26] | English: | Method of making a lithographic printing plate | [2001/26] | French: | Procédé de préparation d'une plaque lithographique | [2001/26] | Examination procedure | 20.11.2000 | Request for accelerated examination filed | 11.01.2002 | Examination requested [2002/13] | 03.05.2002 | Despatch of communication of intention to grant (Approval: No) | 03.05.2002 | Decision about request for accelerated examination - accepted: Yes | 24.10.2002 | Despatch of a communication from the examining division (Time limit: M04) | 24.11.2002 | Despatch of communication of intention to grant (Approval: later approval) | 12.02.2003 | Reply to a communication from the examining division | 17.03.2003 | Despatch of a communication from the examining division (Time limit: M04) | 15.07.2003 | Reply to a communication from the examining division | 14.11.2003 | Despatch of communication that the application is refused, reason: substantive examination {1} | 04.02.2004 | Communication of intention to grant the patent | 14.05.2004 | Fee for grant paid | 14.05.2004 | Fee for publishing/printing paid | Appeal following examination | 24.11.2003 | Appeal received | 24.11.2003 | Statement of grounds filed | 04.02.2004 | Interlocutory revision of appeal | Parent application(s) Tooltip | EP98200496.2 / EP0864420 | Opposition(s) | 29.09.2006 | No opposition filed within time limit [2006/49] | Fees paid | Renewal fee | 20.03.2001 | Renewal fee patent year 03 | 20.03.2001 | Renewal fee patent year 04 | 28.02.2002 | Renewal fee patent year 05 | 28.02.2003 | Renewal fee patent year 06 | 01.03.2004 | Renewal fee patent year 07 | 28.02.2005 | Renewal fee patent year 08 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | BE | 28.12.2005 | [2006/36] | Documents cited: | Search | [DA]EP0720057 (KONISHIROKU PHOTO IND [JP]) |