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Extract from the Register of European Patents

EP About this file: EP1041619

EP1041619 - System and method for the real time determination of the in situ emissivity of a workpiece during processing [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  24.07.2009
Database last updated on 16.11.2024
Most recent event   Tooltip07.05.2010Lapse of the patent in a contracting state
New state(s): GB
published on 09.06.2010  [2010/23]
Applicant(s)For all designated states
Axcelis Technologies, Inc.
55 Cherry Hill Drive
Beverly, MA 01915-1053 / US
[2008/38]
Former [2000/40]For all designated states
Axcelis Technologies, Inc.
55 Cherry Hill Drive
Beverly, MA 01915 / US
Inventor(s)01 / Hebb, Jeffrey Paul
240 Heath Street
Jamaica Plain, Massachusetts 01230 / US
02 / Shajii, Ali
26 Standish Drive
Canton, Massachusetts 02021 / US
[2000/40]
Representative(s)Burke, Steven David, et al
R.G.C. Jenkins & Co 26 Caxton Street
London SW1H 0RJ / GB
[N/P]
Former [2000/40]Burke, Steven David, et al
R.G.C. Jenkins & Co. 26 Caxton Street
London SW1H 0RJ / GB
Application number, filing date00302508.728.03.2000
[2000/40]
Priority number, dateUS1999028030829.03.1999         Original published format: US 280308
[2000/40]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1041619
Date:04.10.2000
Language:EN
[2000/40]
Type: A3 Search report 
No.:EP1041619
Date:15.01.2003
[2003/03]
Type: B1 Patent specification 
No.:EP1041619
Date:17.09.2008
Language:EN
[2008/38]
Search report(s)(Supplementary) European search report - dispatched on:EP28.11.2002
ClassificationIPC:H01L21/66, G01J5/00
[2003/03]
CPC:
H01L22/26 (EP,US); B65D43/021 (KR); B65D85/50 (KR);
G01J5/0003 (EP,US); H01L2924/0002 (EP,US)
C-Set:
H01L2924/0002, H01L2924/00 (EP,US)
Former IPC [2000/40]H01L21/66
Designated contracting statesDE,   FR,   GB,   IT,   NL [2003/40]
Former [2000/40]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:System und Methode zur Echtzeiterfassung der in-situ Emission eines Werkstückes bei der Bearbeitung[2000/40]
English:System and method for the real time determination of the in situ emissivity of a workpiece during processing[2000/40]
French:Systéme et methode en temps reel de la emissivité in-situ d'une pièce pendant d'usinage[2000/40]
Examination procedure08.07.2003Examination requested  [2003/36]
30.11.2006Despatch of a communication from the examining division (Time limit: M06)
02.05.2007Reply to a communication from the examining division
28.11.2007Communication of intention to grant the patent
14.05.2008Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time
18.07.2008Fee for grant paid
18.07.2008Fee for publishing/printing paid
Opposition(s)18.06.2009No opposition filed within time limit [2009/35]
Request for further processing for:The application is deemed to be withdrawn due to failure to fulfill actions required for granting the patent
18.07.2008Request for further processing filed
Fees paidRenewal fee
04.03.2002Renewal fee patent year 03
05.03.2003Renewal fee patent year 04
04.03.2004Renewal fee patent year 05
04.03.2005Renewal fee patent year 06
06.03.2006Renewal fee patent year 07
05.03.2007Renewal fee patent year 08
10.03.2008Renewal fee patent year 09
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Lapses during opposition  TooltipNL17.09.2008
GB28.03.2009
[2010/23]
Former [2009/25]NL17.09.2008
Documents cited:Search[A]US5326173  (EVANS DAN [CA], et al) [A] 1,6,19,20 * abstract *;
 [A]US5601366  (PARANJPE AJIT P [US]) [A] 1,19* column 6, lines 14-24; claim 1 *;
 [A]US5823681  (CABIB DARIO [IL], et al) [A] 1-3,19-21 * column 3, line 55 - column 4, line 25; figures 1,8 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.