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Extract from the Register of European Patents

EP About this file: EP1059566

EP1059566 - Lithographic projection apparatus [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  29.06.2007
Database last updated on 11.09.2024
Most recent event   Tooltip21.12.2007Change - lapse in a contracting state
State(s) deleted from list of lapses: IT
published on 23.01.2008  [2008/04]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/39]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2002/34]For all designated states
ASML Netherlands B.V.
De Run 1110
5503 LA Veldhoven / NL
Former [2000/50]For all designated states
ASM LITHOGRAPHY B.V.
De Run 1110
5503 LA Veldhoven / NL
Inventor(s)01 / Van Empel, Tjarko Adriaan Rudolf
St. Wilfriedstraat 1
5643 SC Eindhoven / NL
02 / Jansen, Hans
Zuidewijn 33
5653 PP Eindhoven / NL
[2000/50]
Representative(s)Leeming, John Gerard, et al
J A Kemp
14 South Square
Gray's Inn
London WC1R 5JJ / GB
[N/P]
Former [2000/50]Leeming, John Gerard, et al
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5LX / GB
Application number, filing date00304667.901.06.2000
[2000/50]
Priority number, dateEP1999020186111.06.1999         Original published format: EP 99201861
[2000/50]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1059566
Date:13.12.2000
Language:EN
[2000/50]
Type: A3 Search report 
No.:EP1059566
Date:18.09.2002
[2002/38]
Type: B1 Patent specification 
No.:EP1059566
Date:23.08.2006
Language:EN
[2006/34]
Search report(s)(Supplementary) European search report - dispatched on:EP02.08.2002
ClassificationIPC:G03F7/20
[2000/50]
CPC:
G03F7/707 (EP)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2003/23]
Former [2000/50]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Lithographischer Projektionsapparat[2000/50]
English:Lithographic projection apparatus[2000/50]
French:Appareil de projection lithographique[2000/50]
Examination procedure14.03.2003Examination requested  [2003/20]
15.04.2005Despatch of a communication from the examining division (Time limit: M06)
24.10.2005Reply to a communication from the examining division
21.03.2006Communication of intention to grant the patent
10.07.2006Fee for grant paid
10.07.2006Fee for publishing/printing paid
Opposition(s)24.05.2007No opposition filed within time limit [2007/31]
Fees paidRenewal fee
23.05.2002Renewal fee patent year 03
27.05.2003Renewal fee patent year 04
01.06.2004Renewal fee patent year 05
13.06.2005Renewal fee patent year 06
12.06.2006Renewal fee patent year 07
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  Tooltipdeleted
[2008/04]
Former [2007/35]IT23.08.2006
Documents cited:Search[X]JPH10233433  ;
 [A]US5324012  (AOYAMA MASAAKI [JP], et al) [A] 1 * column 5 - column 8; figures 1-8 *;
 [PX]US5923408  (TAKABAYASHI YUKIO [JP]) [PX] 1,2,6,7* column 6, line 40 - line 55; figure 8 *
 [X]  - PATENT ABSTRACTS OF JAPAN, (19981231), vol. 1998, no. 14, & JP10233433 A 19980902 (CANON INC) [X] 1,2,6,7 * abstract *
ExaminationUS5325180
 WO9924869
 EP1031877
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.