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Extract from the Register of European Patents

EP About this file: EP1087437

EP1087437 - A multistep chamber cleaning process using a remote plasma that also enhances film gap fill [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  29.05.2009
Database last updated on 14.11.2024
Most recent event   Tooltip17.07.2009Lapse of the patent in a contracting state
New state(s): IE
published on 19.08.2009  [2009/34]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[N/P]
Former [2008/30]For all designated states
APPLIED MATERIALS, INC.
3050 Bowers Avenue
Santa Clara, California 95054 / US
Former [2001/13]For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, California 95054 / US
Inventor(s)01 / Xia, Li-Qun
868 Leith Avenue
Santa Clara, CA 95054 / US
02 / Yieh, Ellie
5888 Pistoia Way
San Jose, CA 95138 / US
 [2001/13]
Representative(s)Setna, Rohan P., et al
Boult Wade Tennant
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
[N/P]
Former [2004/34]Setna, Rohan P., et al
Boult Wade Tennant Verulam Gardens 70 Gray's Inn Road
London WC1X 8BT / GB
Former [2001/13]Allard, Susan Joyce, et al
BOULT WADE TENNANT, Verulam Gardens 70 Gray's Inn Road
London WC1X 8BT / GB
Application number, filing date00308252.621.09.2000
[2001/13]
Priority number, dateUS1999040033821.09.1999         Original published format: US 400338
[2001/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1087437
Date:28.03.2001
Language:EN
[2001/13]
Type: A3 Search report 
No.:EP1087437
Date:07.06.2006
[2006/23]
Type: B1 Patent specification 
No.:EP1087437
Date:23.07.2008
Language:EN
[2008/30]
Search report(s)(Supplementary) European search report - dispatched on:EP27.04.2006
ClassificationIPC:H01L21/762, H01L21/316, H01L21/311, H01L21/3065, H01L21/00
[2001/13]
CPC:
C23C16/401 (EP,US); H01L21/304 (KR); H01L21/31625 (US);
C23C16/4405 (EP,US); H01L21/02129 (EP,US); H01L21/02131 (EP,US);
H01L21/0228 (EP,US); H01L21/314 (US); H01L21/67069 (EP,US);
H01L21/67253 (EP,US); H01L21/67276 (EP,US); H01L21/02164 (EP,US);
H01L21/02274 (EP,US); H01L21/31051 (EP,US) (-)
Designated contracting statesBE,   DE,   GB,   IE,   NL [2007/07]
Former [2001/13]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Mehrschrittiges Verfahren zum Reinigen einer Prozesskammer unter Verwendung eines entfernt erzeugten Plasmas, das ebenfalls die Filmlückenfülleigenschaften verbessert[2001/13]
English:A multistep chamber cleaning process using a remote plasma that also enhances film gap fill[2001/13]
French:Procédé de nettoyage d'une chambre de traitement à étapes multiples utilisant un plasma à distance, ce procédé améliorant également le remplissage d'espace lors de la déposition subséquent d'un film[2007/30]
Former [2001/13]Procédé de nettoyage d'une chambre de traitement à étapes multiples utilisant un plasma à distance qui aussi améliore la capacité de remplissage des espaces de couche
Examination procedure22.11.2006Examination requested  [2007/01]
21.12.2006Despatch of a communication from the examining division (Time limit: M04)
19.04.2007Reply to a communication from the examining division
26.07.2007Communication of intention to grant the patent
11.01.2008Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time
20.03.2008Fee for grant paid
20.03.2008Fee for publishing/printing paid
Opposition(s)24.04.2009No opposition filed within time limit [2009/27]
Request for further processing for:The application is deemed to be withdrawn due to failure to fulfill actions required for granting the patent
20.03.2008Request for further processing filed
20.03.2008Full payment received (date of receipt of payment)
Request granted
09.05.2008Decision despatched
Fees paidRenewal fee
16.09.2002Renewal fee patent year 03
04.09.2003Renewal fee patent year 04
06.09.2004Renewal fee patent year 05
05.09.2005Renewal fee patent year 06
08.09.2006Renewal fee patent year 07
05.09.2007Renewal fee patent year 08
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Lapses during opposition  TooltipBE23.07.2008
NL23.07.2008
IE21.09.2008
[2009/34]
Former [2009/19]BE23.07.2008
NL23.07.2008
Former [2009/12]NL23.07.2008
Documents cited:Search[XA]EP0843348  (APPLIED MATERIALS INC [US]) [X] 11 * abstract * * page 27, line 1 - page 28, line 11 *[A] 1-10
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.