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Extract from the Register of European Patents

EP About this file: EP1073121

EP1073121 - Semiconductor memory device and method for manufacturing the same [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  22.06.2007
Database last updated on 20.09.2024
Most recent event   Tooltip22.06.2007Application deemed to be withdrawnpublished on 25.07.2007  [2007/30]
Applicant(s)For all designated states
FUJITSU LIMITED
1-1, Kamikodanaka 4-chome, Nakahara-ku Kawasaki-shi
Kanagawa 211-8588 / JP
[N/P]
Former [2001/05]For all designated states
FUJITSU LIMITED
1-1, Kamikodanaka 4-chome, Nakahara-ku
Kawasaki-shi, Kanagawa 211-8588 / JP
Inventor(s)01 / Hashimoto, Hiroshi, c/o Fujitsu Limited
1-1, Kamikodanaka 4-chome, Nakahara-ku
Kawasaki-shi, Kanagawa 211-8588 / JP
 [2001/05]
Representative(s)Joly, Jean-Jacques, et al
Cabinet Beau de Loménie
158, rue de l'Université
75340 Paris cedex 07 / FR
[N/P]
Former [2001/05]Joly, Jean-Jacques, et al
Cabinet Beau de Loménie 158, rue de l'Université
75340 Paris Cédex 07 / FR
Application number, filing date00402175.428.07.2000
[2001/05]
Priority number, dateJP1999021560129.07.1999         Original published format: JP 21560199
[2001/05]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1073121
Date:31.01.2001
Language:EN
[2001/05]
Type: A3 Search report 
No.:EP1073121
Date:29.10.2003
[2003/44]
Search report(s)(Supplementary) European search report - dispatched on:EP15.09.2003
ClassificationIPC:H01L27/115, H01L21/8247
[2001/05]
CPC:
H10B69/00 (EP,US); H01L27/10 (KR); H10B41/30 (EP,US)
Designated contracting statesDE,   FR [2004/30]
Former [2001/05]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Halbleiterspeicherbauelement und dessen Herstellungsverfahren[2001/05]
English:Semiconductor memory device and method for manufacturing the same[2001/05]
French:Dispositif de mémoire à semi-conducteur et son procédé de fabrication[2001/05]
Examination procedure19.11.2003Examination requested  [2004/03]
29.04.2004Loss of particular rights, legal effect: designated state(s)
20.08.2004Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, GB, GR, IE, IT, LU, MC, NL, PT, SE
31.01.2007Despatch of a communication from the examining division (Time limit: M04)
01.02.2007Application deemed to be withdrawn, date of legal effect  [2007/30]
09.03.2007Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2007/30]
Fees paidRenewal fee
25.07.2002Renewal fee patent year 03
26.06.2003Renewal fee patent year 04
02.07.2004Renewal fee patent year 05
09.06.2005Renewal fee patent year 06
Penalty fee
Penalty fee Rule 85a EPC 1973
04.06.2004AT   M01   Not yet paid
04.06.2004BE   M01   Not yet paid
04.06.2004CH   M01   Not yet paid
04.06.2004CY   M01   Not yet paid
04.06.2004DK   M01   Not yet paid
04.06.2004ES   M01   Not yet paid
04.06.2004FI   M01   Not yet paid
04.06.2004GB   M01   Not yet paid
04.06.2004GR   M01   Not yet paid
04.06.2004IE   M01   Not yet paid
04.06.2004IT   M01   Not yet paid
04.06.2004LU   M01   Not yet paid
04.06.2004MC   M01   Not yet paid
04.06.2004NL   M01   Not yet paid
04.06.2004PT   M01   Not yet paid
04.06.2004SE   M01   Not yet paid
Additional fee for renewal fee
31.07.200607   M06   Not yet paid
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Documents cited:Search[A]JP3171664  ;
 [A]US5270240  (LEE ROGER R [US]);
 [YA]EP0712163  (COMMISSARIAT ENERGIE ATOMIQUE [FR]);
 [XY]US5679591  (LIN RUEI-LING [TW], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.