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EP1159583
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EP About this file: EP1159583
| EP1159583 - METHOD OF MEASURING WAVINESS OF SILICON WAFERS [Right-click to bookmark this link] | |||
| Former [2001/49] | METHOD AND SYSTEM OF MEASURING WAVINESS IN SILICON WAFERS | ||
| [2004/03] | Status | The application is deemed to be withdrawn Status updated on 22.10.2004 Database last updated on 11.04.2026 | Most recent event Tooltip | 22.10.2004 | Application deemed to be withdrawn | published on 08.12.2004 [2004/50] | Applicant(s) | For all designated states MEMC Electronic Materials, Inc. 501 Pearl Drive (O'Fallon) P.O. Box 8 St. Peters, Missouri 63376 / US | [N/P] |
| Former [2001/49] | For all designated states MEMC Electronic Materials, Inc. 501 Pearl Drive (O'Fallon) P.O. Box 8 St. Peters, Missouri 63376 / US | Inventor(s) | 01 /
WITTE, Dale A., MEMC Electronic Materials, Inc. 501 Pearl Drive, P.O. Box 8 St. Peters, MO 63376 / US | [2001/49] | Representative(s) | Maiwald GmbH Elisenhof Elisenstraße 3 80335 München / DE | [N/P] |
| Former [2001/49] | Maiwald Patentanwalts GmbH Elisenhof Elisenstrasse 3 80335 München / DE | Application number, filing date | 00914535.0 | 07.02.2000 | [2001/49] | WO2000US03078 | Priority number, date | US19990264230 | 05.03.1999 Original published format: US 264230 | [2001/49] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO0052420 | Date: | 08.09.2000 | Language: | EN | [2000/36] | Type: | A1 Application with search report | No.: | EP1159583 | Date: | 05.12.2001 | Language: | EN | The application published by WIPO in one of the EPO official languages on 08.09.2000 takes the place of the publication of the European patent application. | [2001/49] | Search report(s) | International search report - published on: | EP | 08.09.2000 | Classification | IPC: | G01B21/30 | [2001/49] | CPC: |
G01B21/30 (EP,KR,US);
H10P74/203 (EP,US)
| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE [2001/49] | Title | German: | VERFAHREN ZUR MESSUNG DER WELLIGKEIT VON SILIZIUMSCHEIBEN | [2004/03] | English: | METHOD OF MEASURING WAVINESS OF SILICON WAFERS | [2004/03] | French: | PROCEDE DE MESURE DU VOILAGE DE PLAQUETTES DE SILICIUM | [2004/03] |
| Former [2001/49] | VERFAHREN UND SYSTEM ZUR MESSUNG DER WELLIGKEIT VON SILIZIUMSCHEIBEN | ||
| Former [2001/49] | METHOD AND SYSTEM OF MEASURING WAVINESS IN SILICON WAFERS | ||
| Former [2001/49] | PROCEDE ET SYSTEME DE MESURE DU VOILAGE DE PLAQUETTES DE SILICIUM | Entry into regional phase | 09.08.2001 | National basic fee paid | 09.08.2001 | Designation fee(s) paid | 09.08.2001 | Examination fee paid | Examination procedure | 28.07.2000 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 09.08.2001 | Examination requested [2001/49] | 25.11.2002 | Despatch of a communication from the examining division (Time limit: M04) | 20.03.2003 | Reply to a communication from the examining division | 21.01.2004 | Communication of intention to grant the patent | 02.06.2004 | Application deemed to be withdrawn, date of legal effect [2004/50] | 07.07.2004 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2004/50] | Fees paid | Renewal fee | 13.02.2002 | Renewal fee patent year 03 | 12.02.2003 | Renewal fee patent year 04 | 12.02.2004 | Renewal fee patent year 05 |
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