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EP1157595
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EP About this file: EP1157595
| EP1157595 - METHOD OF GENERATING EXTREMELY SHORT-WAVE RADIATION, METHOD OF MANUFACTURING A DEVICE BY MEANS OF SAID RADIATION, EXTREMELY SHORT-WAVE RADIATION SOURCE UNIT AND LITHOGRAPHIC PROJECTION APPARATUS PROVIDED WITH SUCH A RADIATION SOURCE UNIT [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 18.04.2008 Database last updated on 15.11.2024 | Most recent event Tooltip | 18.04.2008 | Application deemed to be withdrawn | published on 21.05.2008 [2008/21] | Applicant(s) | For all designated states Koninklijke Philips Electronics N.V. Groenewoudseweg 1 5621 BA Eindhoven / NL | [N/P] |
| Former [2001/48] | For all designated states Koninklijke Philips Electronics N.V. Groenewoudseweg 1 5621 BA Eindhoven / NL | Inventor(s) | 01 /
BISSCHOPS, Theodorus, H., J. Prof. Holstlaan 6 NL-5656 AA Eindhoven / NL | [2001/48] | Representative(s) | Duijvestijn, Adrianus Johannes, et al Philips Intellectual Property & Standards High Tech Campus 5 5656 AE Eindhoven / NL | [N/P] |
| Former [2004/13] | Duijvestijn, Adrianus Johannes, et al Philips Intellectual Property & Standards P.O. Box 220 5600 AE Eindhoven / NL | ||
| Former [2001/48] | Cobben, Louis Marie Hubert, et al INTERNATIONAAL OCTROOIBUREAU B.V., Prof. Holstlaan 6 5656 AA Eindhoven / NL | Application number, filing date | 00981363.5 | 11.12.2000 | [2001/48] | WO2000EP12525 | Priority number, date | EP19990204500 | 23.12.1999 Original published format: EP 99204500 | [2001/48] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO0149085 | Date: | 05.07.2001 | Language: | EN | [2001/27] | Type: | A1 Application with search report | No.: | EP1157595 | Date: | 28.11.2001 | Language: | EN | The application published by WIPO in one of the EPO official languages on 05.07.2001 takes the place of the publication of the European patent application. | [2001/48] | Search report(s) | International search report - published on: | EP | 05.07.2001 | Classification | IPC: | H05G2/00 | [2001/48] | CPC: |
H05G2/001 (EP,US);
B82Y10/00 (EP,US);
G03F7/70033 (EP,US)
| Designated contracting states | DE, FR, GB, IT, NL [2004/21] |
| Former [2001/48] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | VERFAHREN ZUR ERZEUGUNG VON EXTREM-KURZWELLEN-STRAHLUNG, VERFAHREN ZUR HERSTELLUNG EINER VORRICHTUNG DURCH DIESE STRAHLUNG, EXTREM-KURZWELLEN-STRAHLUNGSQUELLENEINHEIT | [2001/48] | English: | METHOD OF GENERATING EXTREMELY SHORT-WAVE RADIATION, METHOD OF MANUFACTURING A DEVICE BY MEANS OF SAID RADIATION, EXTREMELY SHORT-WAVE RADIATION SOURCE UNIT AND LITHOGRAPHIC PROJECTION APPARATUS PROVIDED WITH SUCH A RADIATION SOURCE UNIT | [2001/48] | French: | PROCEDE PERMETTANT DE GENERER DES RAYONNEMENTS D'EXTREMEMENT COURTES LONGUEURS D'ONDE, PROCEDE DE FABRICATION D'UN DISPOSITIF AU MOYEN DE CES RAYONNEMENTS, UNITE DE SOURCE DE RAYONNEMENTS D'EXTREMEMENT COURTES LONGUEURS D'ONDE ET APPAREIL DE PROJECTION LITHOGRAPHIQUE DOTE D'UNE TELLE UNITE | [2001/48] | Entry into regional phase | 24.09.2001 | National basic fee paid | 07.01.2002 | Designation fee(s) paid | 07.01.2002 | Examination fee paid | Examination procedure | 07.01.2002 | Examination requested [2002/12] | 08.05.2007 | Despatch of a communication from the examining division (Time limit: M06) | 20.11.2007 | Application deemed to be withdrawn, date of legal effect [2008/21] | 02.01.2008 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2008/21] | Fees paid | Renewal fee | 02.01.2003 | Renewal fee patent year 03 | 02.01.2004 | Renewal fee patent year 04 | 03.01.2005 | Renewal fee patent year 05 | 02.01.2006 | Renewal fee patent year 06 | 02.01.2007 | Renewal fee patent year 07 | Penalty fee | Additional fee for renewal fee | 31.12.2007 | 08 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [XAY]US4860328 (FRANKEL ROBERT D [US], et al) [X] 1,5,10,14 * column 6, line 60 - column 7, line 48 * * column 11, line 15 - column 12, line 24 * * figures 5,6,12 * [A] 8 [Y] 20; | [YA]EP0957402 (ASM LITHOGRAPHY BV [NL]) [Y] 20 * page 7, line 1 - line 11 * * figures 1,2 * [A] 9; | [A]JPH11250842 ; | [A]JPH05119199 ; | [A]JPH1140480 ; | US6069937 [ ] (OSHINO TETSUYA [JP], et al) [ ] * column 5, line 55 - column 6, line 25 * * claims 1-3 *; | [A]US4952145 (KWIATKOWSKI KURT VON [DE], et al) [A] 6,7 * column 6, line 45 - line 54 * * figure 1 *; | [PX]JP2000299196 | [A] - PATENT ABSTRACTS OF JAPAN, (19991222), vol. 1999, no. 14, & JP11250842 A 19990917 (AGENCY OF IND SCIENCE &TECHNOL; TOMIE TOSHIHISA) [A] 1,2,10,11 * abstract * | [A] - PATENT ABSTRACTS OF JAPAN, (19930831), vol. 017, no. 481, Database accession no. (P - 1604), & JP05119199 A 19930518 (NIKON CORP) [A] 2,11 * abstract * | [A] - PATENT ABSTRACTS OF JAPAN, (19990531), vol. 1999, no. 05, & JP11040480 A 19990212 (NIKON CORP) [A] 1-3,5,11,12,14,20 | [PX] - DATABASE WPI, 1, Derwent World Patents Index, vol. 2001, no. 04, Database accession no. 2001-029175, XP002162344 & JP2000299196 A 20001024 (AGENCY OF IND SCI & TECHNOLOGY) [PX] 1 * abstract * |