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Extract from the Register of European Patents

EP About this file: EP1119032

EP1119032 - A method for producing a semiconductor device [Right-click to bookmark this link]
Former [2001/30]A method and an apparatus for producing a semiconductor device
[2007/14]
StatusNo opposition filed within time limit
Status updated on  17.10.2008
Database last updated on 07.10.2024
Most recent event   Tooltip17.10.2008No opposition filed within time limitpublished on 19.11.2008  [2008/47]
Applicant(s)For all designated states
DENSO CORPORATION
1-1, Showa-cho Kariya-city
Aichi-pref. 448-8661 / JP
[N/P]
Former [2007/50]For all designated states
Denso Corporation
1-1, Showa-cho Kariya-city
Aichi-pref. 448-8661 / JP
Former [2001/30]For all designated states
Denso Corporation
1-1, Showa-cho
Kariya-city, Aichi-pref., 448-8661 / JP
Inventor(s)01 / Fukada, Tsuyoshi
1-1870, Harukishiratsuchi, Togo-cho
Aichi-gun, Aichi-ken 470-01 / JP
02 / Yoshino, Yoshimi, c/o Intellectual Prop. Dept.
Denso Corp., 1-1, Showa-cho, Kariya-city
Aichi-pref. 448-8661 / JP
03 / Tanizawa, Yukihiko, c/oIntellectual Prop. Dept.
Denso Corp., Showa-cho, Kariya-city
Aichi-pref. 448-8661 / JP
 [2001/48]
Former [2001/30]01 / Fukada, Tsuyoshi
1-1870, Harukishiratsuchi, Togo-cho
Aichi-gun, Aichi-ken 470-01 / JP
02 / Yoshino, Yoshimi
62, Kachibemae
Inuyama-shi, Aichi-ken 484 / JP
03 / Tanizawa, Yukihiko
26-1, Jinai, Kamishigehara-cho
Chiryu-shi, Aichi-ken 472 / JP
Representative(s)Winter, Brandl - Partnerschaft mbB
Alois-Steinecker-Straße 22
85354 Freising / DE
[N/P]
Former [2001/30]Winter, Brandl, Fürniss, Hübner, Röss, Kaiser, Polte Partnerschaft
Patent- und Rechtsanwaltskanzlei Alois-Steinecker-Strasse 22
85354 Freising / DE
Application number, filing date01107622.120.04.1993
[2001/30]
Priority number, dateJP1992010309122.04.1992         Original published format: JP 10309192
JP1992013536127.05.1992         Original published format: JP 13536192
JP1992015833117.06.1992         Original published format: JP 15833192
JP1992016123519.06.1992         Original published format: JP 16123592
JP1992025016218.09.1992         Original published format: JP 25016292
JP1992025016318.09.1992         Original published format: JP 25016392
[2001/30]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1119032
Date:25.07.2001
Language:EN
[2001/30]
Type: A3 Search report 
No.:EP1119032
Date:17.10.2001
[2001/42]
Type: B1 Patent specification 
No.:EP1119032
Date:12.12.2007
Language:EN
[2007/50]
Type: B8 Corrected title page of specification 
No.:EP1119032
Date:19.03.2008
[2008/12]
Search report(s)(Supplementary) European search report - dispatched on:EP05.09.2001
ClassificationIPC:H01L21/3063, H01L21/78, G01P15/12, G01P15/08, G01L9/00
[2001/42]
CPC:
B81C1/00888 (EP,US); B81C1/00158 (EP,US); G01L9/0055 (EP,US);
G01P15/0802 (EP,US); G01P15/123 (EP,US); H01L21/3063 (EP,US);
H01L21/78 (EP,US); B81B2201/0235 (EP,US); B81C2201/0114 (EP,US);
B81C2201/053 (EP,US); Y10S148/028 (EP); Y10S148/159 (EP);
Y10S438/977 (EP) (-)
Former IPC [2001/30]H01L21/306
Designated contracting statesDE,   FR,   GB [2001/30]
TitleGerman:Verfahren zum Erzeugen einer Halbleitervorrichtung[2007/49]
English:A method for producing a semiconductor device[2007/51]
French:Méthode pour la production d'un dispositif semi-conducteur[2007/14]
Former [2001/30]Ein Verfahren und eine Vorrichtung zum Erzeugen einer Halbleiteranordnung
Former [2001/30]A method and an apparatus for producing a semiconductor device
Former [2001/30]Méthode et un appareillage pour la production d'un dispositif semi-conducteur
Examination procedure27.03.2001Examination requested  [2001/30]
09.04.2002Amendment by applicant (claims and/or description)
06.10.2003Despatch of a communication from the examining division (Time limit: M04)
09.02.2004Reply to a communication from the examining division
25.01.2006Despatch of a communication from the examining division (Time limit: M06)
31.07.2006Reply to a communication from the examining division
22.06.2007Communication of intention to grant the patent
17.10.2007Fee for grant paid
17.10.2007Fee for publishing/printing paid
Parent application(s)   TooltipEP93106391.1  / EP0567075
Opposition(s)15.09.2008No opposition filed within time limit [2008/47]
Fees paidRenewal fee
27.03.2001Renewal fee patent year 03
27.03.2001Renewal fee patent year 04
27.03.2001Renewal fee patent year 05
27.03.2001Renewal fee patent year 06
27.03.2001Renewal fee patent year 07
27.03.2001Renewal fee patent year 08
12.04.2001Renewal fee patent year 09
12.04.2002Renewal fee patent year 10
14.04.2003Renewal fee patent year 11
15.04.2004Renewal fee patent year 12
13.04.2005Renewal fee patent year 13
17.03.2006Renewal fee patent year 14
12.04.2007Renewal fee patent year 15
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Documents cited:Search[X]US5095349  (FUJII TETSUO [JP], et al) [X] 1,2 * the whole document *;
 [A]EP0470003  (NISSAN MOTOR [JP]) [A] 1,2 * the whole document *;
 [A]US4706374  (MURAKAMI KOICHI [JP]) [A] 1,2 * the whole document *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.