-
EP1168426
European procedure
- EP About this file
- EP Legal status
- EP Federated register
- EP Event history
- EP Citations
- EP Patent family
- EP All documents
Extract from the Register of European Patents
EP About this file: EP1168426
| EP1168426 - Method of plasma depositing a low dielectric constant insulating film [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 11.11.2005 Database last updated on 01.01.2025 | Most recent event Tooltip | 11.11.2005 | Application deemed to be withdrawn | published on 28.12.2005 [2005/52] | Applicant(s) | For all designated states CANON SALES CO., INC. 11-28, Mita 3-chome, Minato-ku Tokyo 108-0073 / JP | For all designated states SEMICONDUCTOR PROCESS LABORATORY CO., LTD. 13-29, Konan 2-chome Minato-ku Tokyo 108-0075 / JP | [N/P] |
| Former [2002/01] | For all designated states Canon Sales Co., Inc. 11-28, Mita 3-chome Minato-ku, Tokyo 108-0073 / JP | ||
| For all designated states Semiconductor Process Laboratory Co., Ltd. 13-29, Konan 2-chome Minato-ku, Tokyo 108-0075 / JP | Inventor(s) | 01 /
Yamamoto, Youichi Canon Sales Co., Inc., 11-28, Mita 3-chome Minato-ku, Tokyo 108-0073 / JP | 02 /
Ikakura, Hiroshi Canon Sales Co., Inc., 11-28, Mita 3-chome Minato-ku, Tokyo 108-0073 / JP | 03 /
Suzuki, Tomomi Canon Sales Co., Inc., 11-28, Mita 3-chome Minato-ku, Tokyo 108-0073 / JP | 04 /
Kotake, Yuichiro Alcan-Tech Co., Inc., 13-29, Konan 2-chome Minato-ku, Tokyo 108-0075 / JP | 05 /
Shioya, Yoshimi Semiconductor Process Lab. Co., Ltd, 2-13-29 Konan Minato-ku, Tokyo 108-0075 / JP | 06 /
Ohira, Kouichi Semiconductor Process Lab. Co., Ltd, 2-13-29 Konan Minato-ku, Tokyo 108-0075 / JP | 07 /
Ohgawara, Shoji Canon Sales Co., Inc., 11-28, Mita 3-chome Minato-ku, Tokyo 108-0073 / JP | 08 /
Maeda, Kazuo Semiconductor Process Lab. Co., Ltd, 2-13-29 Konan Minato-ku, Tokyo 108-0075 / JP | [2002/01] | Representative(s) | SSM Sandmair Patentanwälte Rechtsanwalt Partnerschaft mbB Joseph-Wild-Straße 20 81829 München / DE | [N/P] |
| Former [2002/01] | Schwabe - Sandmair - Marx Stuntzstrasse 16 81677 München / DE | Application number, filing date | 01112991.3 | 08.06.2001 | [2002/01] | Priority number, date | JP20000188287 | 22.06.2000 Original published format: JP 2000188287 | [2002/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1168426 | Date: | 02.01.2002 | Language: | EN | [2002/01] | Type: | A3 Search report | No.: | EP1168426 | Date: | 18.12.2002 | [2002/51] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 31.10.2002 | Classification | IPC: | H01L21/316, C23C16/40, H01L21/768 | [2002/01] | CPC: |
C23C16/401 (EP,KR,US);
H01L21/02126 (EP,KR,US);
H01L21/02216 (EP,KR,US);
H01L21/31612 (US);
H01L21/02274 (EP,US);
H01L21/3122 (US)
| Designated contracting states | DE, FR, GB, NL [2003/37] |
| Former [2002/01] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Vefahren zur Plasmaabscheidung einer Isolierschicht mit niedriger Dielektrizitätskonstante | [2002/01] | English: | Method of plasma depositing a low dielectric constant insulating film | [2002/01] | French: | Méthode de dépôt par plasma d'un film isolant à constante diélectrique faible | [2002/01] | Examination procedure | 12.02.2003 | Examination requested [2003/16] | 19.06.2003 | Loss of particular rights, legal effect: designated state(s) | 13.11.2003 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, GR, IE, IT, LU, MC, PT, SE, TR | 01.02.2005 | Despatch of a communication from the examining division (Time limit: M04) | 14.06.2005 | Application deemed to be withdrawn, date of legal effect [2005/52] | 20.07.2005 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2005/52] | Fees paid | Renewal fee | 27.05.2003 | Renewal fee patent year 03 | 01.06.2004 | Renewal fee patent year 04 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 13.08.2003 | AT M01 Not yet paid | 13.08.2003 | BE M01 Not yet paid | 13.08.2003 | CH M01 Not yet paid | 13.08.2003 | CY M01 Not yet paid | 13.08.2003 | DK M01 Not yet paid | 13.08.2003 | ES M01 Not yet paid | 13.08.2003 | FI M01 Not yet paid | 13.08.2003 | GR M01 Not yet paid | 13.08.2003 | IE M01 Not yet paid | 13.08.2003 | IT M01 Not yet paid | 13.08.2003 | LU M01 Not yet paid | 13.08.2003 | MC M01 Not yet paid | 13.08.2003 | PT M01 Not yet paid | 13.08.2003 | SE M01 Not yet paid | 13.08.2003 | TR M01 Not yet paid | Additional fee for renewal fee | 30.06.2005 | 05 M06 Not yet paid |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XY]EP0664560 (CANON SALES CO INC [JP], et al); | [XY]DE19654737 (TOSHIBA KAWASAKI KK [JP]); | [XY]WO9941423 (APPLIED MATERIALS INC [US]); | [E]EP1113489 (CANON SALES CO INC [JP], et al); | [E]EP1148539 (APPLIED MATERIALS INC [US]) |