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EP1174763
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EP About this file: EP1174763
| EP1174763 - Method of fabricating a nickel etching mask [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 03.08.2007 Database last updated on 22.08.2024 | Most recent event Tooltip | 03.08.2007 | Application deemed to be withdrawn | published on 05.09.2007 [2007/36] | Applicant(s) | For all designated states Samsung Electronics Co., Ltd. 416, Maetan-dong Paldal-gu Suwon-City, Kyungki-do / KR | [N/P] |
| Former [2002/04] | For all designated states SAMSUNG ELECTRONICS CO., LTD. 416, Maetan-dong, Paldal-gu Suwon-City, Kyungki-do / KR | Inventor(s) | 01 /
Jung, Sun-Tae 416 Maetan-dong, Paldal-gu Suwon-city, Kyungki-do / KR | 02 /
Choi, Duk-Yong 416 Maetan-dong, Paldal-gu Suwon-city, Kyungki-do / KR | 03 /
Lee, Joo-Hoon 416 Maetan-dong, Paldal-gu Suwon-city, Kyungki-do / KR | [2002/04] | Representative(s) | Grünecker Patent- und Rechtsanwälte PartG mbB Leopoldstrasse 4 80802 München / DE | [N/P] |
| Former [2002/04] | Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München / DE | Application number, filing date | 01116405.0 | 06.07.2001 | [2002/04] | Priority number, date | KR20000040909 | 18.07.2000 Original published format: KR 2000040909 | [2002/04] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1174763 | Date: | 23.01.2002 | Language: | EN | [2002/04] | Classification | IPC: | G03F1/08, H01L21/027 | [2002/04] | CPC: |
H01L21/0332 (EP,US);
G02B6/122 (KR);
G02B6/136 (EP,US);
G03F7/20 (KR);
G02B2006/12061 (EP,US);
G02B2006/12173 (EP,US);
G02B2006/12176 (EP,US)
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| Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR [2002/04] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | Verfahren zur Herstellung einer Nickel-Ätzmaske | [2002/04] | English: | Method of fabricating a nickel etching mask | [2002/04] | French: | Procédé de fabrication d'un masque de gravure en nickel | [2002/04] | Examination procedure | 06.07.2001 | Examination requested [2002/04] | 01.03.2007 | Application deemed to be withdrawn, date of legal effect [2007/36] | 02.04.2007 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2007/36] | Fees paid | Renewal fee | 30.07.2003 | Renewal fee patent year 03 | 30.07.2004 | Renewal fee patent year 04 | 29.07.2005 | Renewal fee patent year 05 | Penalty fee | Additional fee for renewal fee | 31.07.2006 | 06 M06 Not yet paid |
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