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Extract from the Register of European Patents

EP About this file: EP1209728

EP1209728 - Method of depositing organosilicate layers [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  14.04.2006
Database last updated on 31.08.2024
Most recent event   Tooltip14.04.2006Application deemed to be withdrawnpublished on 31.05.2006  [2006/22]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[N/P]
Former [2002/22]For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, California 95054 / US
Inventor(s)01 / Yieh, Elli
5888 Pistoia Way
San Jose, CA 95138 / US
02 / Gaillard, Frederic
rue des tallifardieres
38500 Voiron / FR
03 / Xia, Li-Qun
868 Leith Avenue
CA - 95054 Santa Clara / US
 [2002/22]
Representative(s)Kirschner, Klaus Dieter
Puschmann Borchert Bardehle
Patentanwälte Partnerschaft
Postfach 10 12 31
80086 München / DE
[N/P]
Former [2002/22]Kirschner, Klaus Dieter, Dipl.-Phys.
Schneiders & Behrendt Rechtsanwälte - Patentanwälte Sollner Strasse 38
81479 München / DE
Application number, filing date01124607.115.10.2001
[2002/22]
Priority number, dateUS2000072388627.11.2000         Original published format: US 723886
[2002/22]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1209728
Date:29.05.2002
Language:EN
[2002/22]
Type: A3 Search report 
No.:EP1209728
Date:27.10.2004
[2004/44]
Search report(s)(Supplementary) European search report - dispatched on:EP09.09.2004
ClassificationIPC:H01L21/312, H01L21/316, H01L21/027, C23C16/30, C23C16/40
[2004/31]
CPC:
C23C16/30 (EP,US); H01L21/20 (KR); H01L21/02126 (EP,US);
C23C16/401 (EP,US); H01L21/02216 (EP,US); H01L21/02274 (EP,US);
H01L21/0276 (EP,US); H01L21/3121 (US); H01L21/3122 (US);
H01L21/31633 (US); H01L21/02211 (EP); H01L21/3086 (EP,US);
H01L21/31144 (EP,US); H01L21/31612 (US); H01L21/31629 (US);
H01L21/32139 (EP,US); H01L21/76807 (EP,US) (-)
Former IPC [2002/22]H01L21/312
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   TR [2005/29]
Former [2002/22]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Methode, eine organische Silikatschicht abzuscheiden[2002/22]
English:Method of depositing organosilicate layers[2002/22]
French:Méthode de depôt d'une couche organique de silicate[2002/22]
Examination procedure18.04.2005Examination requested  [2005/25]
04.07.2005Despatch of a communication from the examining division (Time limit: M04)
15.11.2005Application deemed to be withdrawn, date of legal effect  [2006/22]
02.01.2006Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2006/22]
Fees paidRenewal fee
06.10.2003Renewal fee patent year 03
06.10.2004Renewal fee patent year 04
07.10.2005Renewal fee patent year 05
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Documents cited:Search[XA]EP0826791  (MATSUSHITA ELECTRIC IND CO LTD [JP]) [X] 1,2,6,16,18,19,22,29 * page 3, line 27 - page 9, line 35; figures 3A-3D * [A] 23-28,30;
 [XA]GB2326168  (NEC CORP [JP]) [X] 1,2,6,16-20,22 * page 33 - page 42 *[A] 23-28;
 [XY]EP0935283  (ASM JAPAN [JP]) [X] 1,2,16-20,22,29,32 * paragraph [0023] - paragraph [0049] * [Y] 21;
 [XY]DE19904311  (NAT SEMICONDUCTOR CORP [US]) [X] 1,2,16,18-20,22,29,32 * column 2, line 35 - column 6, line 23; claims 1-3,11,12 * [Y] 21
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.