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EP1344242
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EP About this file: EP1344242
| EP1344242 - IN-PROCESS WAFER CHARGE MONITOR AND CONTROL SYSTEM FOR ION IMPLANTER [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 19.11.2010 Database last updated on 03.09.2024 | Most recent event Tooltip | 19.11.2010 | Application deemed to be withdrawn | published on 22.12.2010 [2010/51] | Applicant(s) | For all designated states Axcelis Technologies, Inc. 55 Cherry Hill Drive Beverly, MA 01915-1053 / US | [N/P] |
| Former [2003/38] | For all designated states Axcelis Technologies, Inc. 55 Cherry Hill Drive Beverly, MA 01915 / US | Inventor(s) | 01 /
HALLING, Alfred, Michael 15 Juniper street Wenham, MA 01984 / US | [2003/46] |
| Former [2003/38] | 01 /
HALLING, Alfred, Michael 36R Clark Street Danvers, MA 01923 / US | Representative(s) | Burke, Steven David, et al R.G.C. Jenkins & Co 26 Caxton Street London SW1H 0RJ / GB | [2009/48] |
| Former [2003/38] | Burke, Steven David, et al R.G.C. Jenkins & Co. 26 Caxton Street London SW1H 0RH / GB | Application number, filing date | 01272081.9 | 18.12.2001 | [2003/38] | WO2001GB05625 | Priority number, date | US20000748735 | 22.12.2000 Original published format: US 748735 | [2003/38] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO02052612 | Date: | 04.07.2002 | Language: | EN | [2002/27] | Type: | A2 Application without search report | No.: | EP1344242 | Date: | 17.09.2003 | Language: | EN | The application published by WIPO in one of the EPO official languages on 04.07.2002 takes the place of the publication of the European patent application. | [2003/38] | Search report(s) | International search report - published on: | EP | 17.10.2002 | Classification | IPC: | H01J37/317, H01J37/304, H01J37/02 | [2003/38] | CPC: |
H01J37/304 (EP,US);
H01J37/36 (KR);
H01J2237/31701 (EP,US)
| Designated contracting states | DE, FR, GB [2004/21] |
| Former [2003/38] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | VORRICHTUNG ZUR ÜBERWACHUNG DER WAFER-CHARGE WÄHREND DES PROZESSES UND STEUERSYSTEM FÜR EINE IONENIMPLANTATIONSVORRICHTUNG | [2003/38] | English: | IN-PROCESS WAFER CHARGE MONITOR AND CONTROL SYSTEM FOR ION IMPLANTER | [2003/38] | French: | SYSTEME CONTROLEUR ET LIMITEUR DE CHARGE DE PLAQUETTES EN COURS D'IMPLANTATION POUR IMPLANTEUR IONIQUE | [2003/38] | Entry into regional phase | 15.07.2003 | National basic fee paid | 15.07.2003 | Designation fee(s) paid | 15.07.2003 | Examination fee paid | Examination procedure | 19.07.2002 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 15.07.2003 | Examination requested [2003/38] | 23.03.2007 | Despatch of a communication from the examining division (Time limit: M06) | 15.01.2008 | Reply to a communication from the examining division | 01.07.2010 | Application deemed to be withdrawn, date of legal effect [2010/51] | 06.08.2010 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2010/51] | Request for further processing for: | The application is deemed to be withdrawn due to failure to reply to the examination report | 15.01.2008 | Request for further processing filed | 15.01.2008 | Full payment received (date of receipt of payment) Request granted | 29.01.2008 | Decision despatched | Fees paid | Renewal fee | 03.12.2003 | Renewal fee patent year 03 | 03.12.2004 | Renewal fee patent year 04 | 05.12.2005 | Renewal fee patent year 05 | 05.12.2006 | Renewal fee patent year 06 | 05.12.2007 | Renewal fee patent year 07 | 08.12.2008 | Renewal fee patent year 08 | Penalty fee | Additional fee for renewal fee | 31.12.2009 | 09 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [Y]JPH1027566 ; | [DY]EP0964426 (EATON CORP [US]) [DY] 1,4,9,12,15 * paragraph [0039] - paragraph [0043]; figure 2 *; | [A]EP0522962 (SONY CORP [JP]) [A] 1,9,15 * column 4, line 16 - column 5, line 54; figures 1,3 *; | [A]JPH06203789 ; | [A]US4904902 (TAMAI TADAMOTO [JP], et al) [A] 1,9,15 * column A; figure - * | [Y] - PATENT ABSTRACTS OF JAPAN, (19980430), vol. 1998, no. 05, & JP10027566 A 19980127 (NISSIN ELECTRIC CO LTD) [Y] 1,4,9,12,15 * abstract * | [A] - PATENT ABSTRACTS OF JAPAN, (19941020), vol. 018, no. 551, Database accession no. (E - 1619), & JP06203789 A 19940722 (SONY CORP) [A] 1,9,15 * abstract * | Examination | US4628209 |